The invention concerns an apparatus for depositing volatilizable non-thermosetting material on to a substrate. A cylindrical surface is rotated towards and away from the substrate and a feeder head spaced apart from the surface deposits the material thereover. Substantially the whole of the cylindrical surface is heated so that material deposited thereon and moved towards the substrate on rotation of the surface will be vaporized and deposited on the substrate.
A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.
A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.
A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.
A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.
In a method of application of a coating medium by use of a spray device onto a moving surface, which in the direct application method is the surface of a material web, specifically a paper or cardboard web, an atmosphere of back-moistening and/or moistening medium for the atomized coating medium is maintained in the area of the spray device.
