A self contained circuit board and housing therefore adapted to be positioned within a telephone network interface housing in which provision is made for variance in the dimensions of a pair of retaining slots in the interface housing of different manufacture. The circuit board housing includes a pair of oppositely disposed side walls, each having a laterally extending flange include a resilient component which flexed to accommodate for differences in clearances between the retaining slots.

A shipping container for silicone semiconductor wafers including an elongate receptacle with lid with interior wafer-locating ribs and resilient arcuately curved wafer supports positioned beneath and over the edges of the wafers and resiliently clamping such wafers in fixed position.

A film holder which is disclosed herein includes a inner frame defining a photo-sensitive plate insert slot between a partition plate, and outer frames each defining a dark slide insert groove between said inner frame. In this film holder, a plurality of stopper springs are formed on the peripheral sides of a body which is comprised of the partition plate and the inner frame. A plurality of hooks are formed on each the outer frames which are overlaid on the body to define the dark slide insert slot. These stopper springs and hooks are in the corresponding relationship, respectively, so that they are engaged with each other to lock the body and outer frames together in an overlaid relationship.

Flat glass sheets having a rectangular shape are stacked on a piece of corrigated fiberboard cut and scored to form a closed shipping container when folded. A corner pad that (1) absorbs shock; (2) is compressible; and (3) is resilient is provided at each corner of the stack. The height of the corner pads is greater than inside depth of the container when folded so that the corner pads are compressed between the top and bottom surfaces of the container.

The present invention relates to a case for a photomask to prevent generation of dust which might attach to and stain a photomask or the photomask pellicle. In a case for a photomask comprising a case main unit with an upper opening for accommodating the photomask and a lid for the opening of the case main unit, cushion materials are provided on the inner bottom of the case main unit and on the inner ceiling of the lid. The photomask is elastically squeezed between the cushion materials when accommodated. Thus, shaking and rattling during transportation are prevented to minimize the generation of dust. As the cushion material, a rubber material having a smooth surface on one side and a coarse surface on the other side is used.