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PROCESSING APPARATUS
   
Document Number
US Patent 3823685
Issued Date
July 16, 1974
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Abstract
The present invention relates to a processing apparatus for growing and annealing a silicon dioxide insulator layer to obtain a mobile positive ion free silicon dioxide insulator layer. A mobile positive ion free silicon dioxide insulator layer is required in order to make a stable insulated gate field effect transistor. The processing apparatus comprises a non-oxidizing, high-melting-point platinum metal film coated quartz furnace tube, potential means for placing a positive potential upon the platinum metal film coating of the platinum metal film coated quartz furnace tube to repel mobile ions therefrom, heater means for heating the interior of the quartz furnace tube, and gas means for passing oxygen gas through the platinum metal film coated quartz furnace tube. A silicon wafer may be oxidized in said processing apparatus to form a relatively mobile positive ion free silicon dioxide insulator layer of an insulated gate field effect transistor upon the silicon wafer. The silicon dioxide insulator layer is relatively uncontaminated by mobile positive ions which exist to the outside of the platinum metal film coated quartz furnace tube. A silicon wafer which previously has been coated by a silicon dioxide insulator layer may be processed to remove mobile ions within the silicon dioxide insulator layer. Mobile positive ions are repelled by the positive potential applied to the platinum metal film away from the outside of the quartz furnace tube, and mobile positive ions of the silicon dioxide insulator layer within the platinum metal film coated quartz tube are removed by the flowing oxygen gas due to the low vapor pressure of the mobile positive ions.
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PROCESSING APPARATUS - US Patent 3823685 Drawing
Drawing from US Patent 3823685
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Number of Claims:
4
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Published
July 16, 1974
Application Number
05/408,700
Filed
October 23, 1973
US Classification
118/715   257/E21.285 373/137
Int'l Classification
F27D   11/00   (20060101)   F27D   11/02   (20060101)   H01L   21/02   (20060101)   H01L   21/316   (20060101)   H05B   3/00   (20060101)  
Examiner
Parent Case
CROSS REFERENCE TO RELATED APPLICATIONS This application is a continuation of co-pending application Ser. No. 169,545 filed on Aug. 5, 1971 now abandoned, which prior application is a division of application Ser. No. 866,185 filed on Oct. 14, 1969, and issued as U.S. Pat. No. 3,645,695 on Feb. 29, 1972, all assigned to the same assignee.
USPTO Field of Search
118/48   118/49.5   117/106   117/107.2   117/93.1   117/93.1CD   117/93.1GD   13/35   148/174   148/175  
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Description
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