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DIHYDROCINNAMYL PHENOLS USEFUL AS ANTIMICROBIAL AGENTS
   
Document Number
US Patent 3867548
Issued Date
February 18, 1975
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Abstract
Substances which are subject to microbial spoilage are preserved by addition of a dihydrocinnamyl phenol, e.g., dihydro-2-cinnamyl-phenol, dihydro-4-cinnamyl-phenol, dihydro-2-cinnamyl-4-methylphenol, etc.
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Number of Claims:
2
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Published
February 18, 1975
Application Number
05/347,084
Filed
April 2, 1973
US Classification
514/720   514/733
Int'l Classification
A01N   31/08   (20060101)   A01N   31/00   (20060101)   A23L   3/3463   (20060101)   C11D   1/00   (20060101)  
Assistant Examiner
Parent Case
This is a division of our copending application, Ser. No. 257,031, filed May 25, 1972, issued Nov. 27, 1973, and U.S. Pat. No. 3,775,541.
USPTO Field of Search
424/341  
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4209581 - Soluble photosensitive resin composition - Owned by Tokyo Ohka Kogyo Kabushiki Kaisha (Kawasaki,JP)

A photocurable soluble resin suitable for manufacturing photosensitive resin plates obtained by polycondensing an alkylol derivative or an alkylated alkylol derivative of urea or thiourea with an N-alkylolacrylamide or N-alkylolmethacrylamide in the presence of an acid or an ammonium salt thereof or by reacting urea or thiourea with formaldehyde to form a linear polycondensation product and then grafting an N-alkylolacrylamide or N-alkylolmethacrylamide on the linear polycondensation product in the presence of an acid or an ammonium salt thereof. This soluble resin is incorporated with known soluble resins such as soluble nylon, photosensitizers and thermal polymerization inhibitors and mixed thoroughly to obtain a soluble photosensitive resin composition.

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