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Method of performing contactless photolithography
   
Document Number
US Patent 4088406
Issued Date
May 9, 1978
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Inventors
Ollendorf; Joel (West Orange, NJ)
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Abstract
A semiconductor wafer vacuum chuck used as part of a photographic wafer-alignment machine for performing contactless photolithography has integral spacer means disposed on a substantially planar surface thereof for mechanically maintaining a fixed distance between portions of a wafer positioned adjacent the spacer means and the surface of the wafer chuck, whereby a controlled separation is provided between a surface of the wafer and a photographic mask overlying the surface of the wafer upon the application of a vacuum to the surface of the wafer chuck.
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Method of performing contactless photolithography - US Patent 4088406 Drawing
Drawing from US Patent 4088406
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Number of Claims:
2
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Owner
RCA Corporation (New York, NY)
Published
May 9, 1978
Application Number
05/742,069
Filed
November 15, 1976
US Classification
355/132  
Int'l Classification
B25B   11/00   (20060101)  
Examiner
Attorney/Law Firm
Parent Case
This is a division, of application Ser. No. 568,716, filed Apr. 16, 1975 and now U.S. Pat. No. 4,006,909 issued Feb. 8, 1977.
USPTO Field of Search
279/3   355/18   355/91   355/73   355/77   355/78   355/132   355/133  
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7224450 - Method and apparatus for position-dependent optical metrology calibration - Owned by Tokyo Electron Limited (Tokyo,JP)

A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference.

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Description
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