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| United States Patent | 4138604 |
| Link to this page | http://www.wikipatents.com/4138604.html |
| Inventor(s) | Harmsen; Nils (Bruchkobel, DE);
Markhof; Horst (Bruchkobel, DE);
Reichelt; Walter (Hanau, DE);
Schiff; Klaus-Ludwig (Bruchkobel, DE);
Thiede; Horst (Bruchkobel, DE) |
| Abstract | To provide low contact resistance, long life, and resistance against
tarnishing under corrosive, particularly sulfur atmospheres, a substrate
carrier has a layer of palladium applied thereto, of a thickness between
0.5 and 5 .mu.m, preferably between 1 and 3 .mu.m, to which a coating of
gold is applied which is porous and has a thickness of only between 0.05
.mu.m and 0.1 .mu.m; the porous gold coating forms islands of gold on the
palladium which, in use and as the terminal is wiped against a counter
element, smears over the palladium, thus effectively covering the
palladium, preventing tarnishing, and maintaining low contact resistance
throughout the useful life of the terminal element. |
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Title Information  |
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Drawing from US Patent 4138604 |
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Electrical plug-type connector |
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| Publication Date |
February 6, 1979 |
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| Filing Date |
July 16, 1976 |
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| Priority Data |
Sep 13, 1975[DE]2540943 |
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Title Information  |
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Claims  |
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We claim:
1. Electrical plug-type terminal connector contact element adapted to be
wiped against a counter element comprising
a metal electrical plug-type termainal connector substrate and a gold
surfaced contact layer in direct contact with and covering at least a
portion of said metal plug-type terminal connector substrate, said contact
layer consisting essentially of (i) a layer of palladium between about 0.5
and 5 .mu. m thick which is coated with (ii) a thin and a porous surface
coating of hard gold having a thickness of between 0.05 .mu. m and 0.1
.mu. m.
2. Contact element according to claim 1, wherein the contact layer and the
gold layer completely surround the carrier.
3. Contact element according to claim 1, wherein said substrate is a
copper-base alloy.
4. Contact element according to claim 3, wherein the palladium layer has a
thickness of between 1 and 3 .mu. m.
5. Contact element according to claim 1, wherein the palladium layer is a
layer applied by rolling on, roll bonding, vapor deposition sputtering or
galvanic deposition.
6. Contact element according to claim 1, wherein the gold coating comprises
a coating applied by galvanic deposition, vacuum deposition including at
least one of: evaporation; sputtering; or by ion implantation.
7. Contact element according to claim 4 wherein said substrate is brass or
bronze. |
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Claims  |
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Description  |
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CROSS REFERENCE TO RELATED APPLICATIONS U.S. Ser. No. 705,918, filed July
16, 1976 (claiming priority of German Application P 25 40 956.7-34 of
Sept. 13, 1975); and U.S. Ser. No. 705,917, filed July 16, 1976 (claiming
priority of German Application P 25 36 985.1-34 of Aug. 20, 1975), all
assigned to the assignee of the present application.
The present invention relates to an electrical plug-type connector having a
contact surface which is gold coated. The contact resistance of electrical
plug-type connectors used in electronics and data processing equipment
must be as low as possible throughout its useful life, and retain its low
contact resistance without change. Low contact resistance means that the
contacts should, simultaneously, have high conductivity. Metals which have
especially high electrical conductivity such as silver, copper, gold,
aluminum, cannot all be used, and have different characteristics. Copper
and aluminum are not suitable because their surfaces readily form oxide
films or skins, or are subject to other corrosion layers. As a result, the
contact resistance of a non-permanent terminal changes by several orders
of magnitude. Gold can be used for plug-type connectors practically
without any limitation, but its price is high. Silver cannot be used in
some atmospheres, particularly in highly reactive atmospheres which also
include sulfur; silver sulfide layers form at the surface which are
insulating and interfere with good electrical contact. Because of the
formation of surface layers on practically all metals, except gold, gilded
contact layers were used for electrical terminals in large quantity, by
applying a gold skin or thin coating which is applied directly or
indirectly on a substrate or carrier forming the body of the terminal.
Gold is much more expensive than silver -- several times as much -- and it
has therefore frequently been tried to coat silver with gold so that
silver will be more resistant to tarnishing and corrosion in the presence
of sulfur or hydrogen sulfide. Gold is, however, subject to deterioration
when in contact with silver sulfide so that the coating of the gold
required a thickness of from 2 to 3 .mu. m. It has been believed that thin
porous coatings of gold on a silver surface do not provide sufficient
protection against tarnishing; see, for example, "Reid & Goldie": "Gold
Plating Technology", 1974, page 492.
It is an object of the present invention to provide an electrical terminal
or connector, and particularly a plugtype connector terminal for use in
electronics and data processing which provides a uniform, low contact
resistance without use of massive gold or thicker gold layers, which
retains the good contact characteristics of gold without, however, using
much of this precious metal. The chemical resistance and particularly
resistance against attack in corrosive and sulfur-containing atmospheres
should be good.
SUBJECT MATTER OF THE PRESENT INVENTION
Briefly, the electrical terminal has a gilded contact layer; the gilded
contact layer comprises metallic palladium which is coated with a thin,
porous surface layer of gold having a thickness of between 0.05 .mu. m and
0.1 .mu. m; said palladium preferably being between about 1 and 3 .mu. m.
The invention will be described by way of example with reference to the
accompanying drawings, wherein the single FIGURE is a schematic
cross-sectional view through a contact blade.
A support or substrate for a projecting terminal prong 1, for example of
brass, bronze, or other suitable carrier material, is coated with a thin
layer 2 of palladium in the region or zone where contact is to be made; an
extremely thin, porous layer 3 of gold is applied thereto.
The terminal has surprisingly excellent electrical characteristics; it is
believed that this is due to the discontinuous porous gold layer which
results in low contact resistance when the terminal is new. In use, and as
the terminal is wiped against a counter element, the islands of gold are
smeared over the entire surface of the contact terminal to effect a
continuous gold layer which is thinner than the original one, but more
uniform. Experiments have shown that, surprisingly, the contact resistance
as measured does not deviate essentially from solid gold contacts, or from
contacts which have a substantially thicker and continuous solid layer of
gold at the contact surface. Even if the contact pressure is low, the
contact resistance does not rise substantially. The distribution of the
gold from the islands of gold over the entire surface of the contact
appears to occur even after a few connecting and disconnecting movements.
Thus, the terminal is well protected against tarnishing or other
corrosion.
The present invention is specifically directed to terminal elements which
are in mass production so that the cost of making an individual terminal
should be as low as possible. The terminals are highly resistant against
chemical attacks, particularly when used in corrosive atmospheres or in
atmospheres containing sulfur.
The terminal layer may entirely surround the contact carrier, or may be
applied only to that portion or side which actually engages a counter
terminal. The thickness of the palladium layer 2 is between 0.5 and 5 .mu.
m, preferably between 1 and 3 .mu. m; the thickness of the gold layer,
which is porous, is thinner by about an order of magnitude, and between
0.05 to 0.1 .mu. m.
The palladium layer can be applied to the substrate carrier by a suitable
mechanical process, for example by rolling on a thin sheet, by a roll
bonding process, by vapor deposition sputtering, or by galvanic
deposition. The gold layer is then applied on the palladium layer, for
example by galvanic deposition or vacuum deposition, such as evaporation
or sputtering, or by ion implantation. The porous surface of gold may be
hard gold.
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Description  |
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