The invention relates to a semiconductor device in which a crossing connection is realized by using parts of a layer of refractory conductive material already present for masking as a part of a current conductor separated from a crossing conductor by an insulation layer. The mask of refractory material may also define the regions in which switching transistors are realized. The invention results in important advantages, in connection with density and crossing connections, in particular in I.sup.2 L-circuits.
An oxide layer is partially formed on an n-type region surrounded by a field oxide region. A base region of a switching transistor is formed in the n-type region using as a mask the oxide layer. Arsenic-doped polysilicon layers are selectively formed simultaneously on the surfaces of the oxide layer and the base region. Using the polysilicon layers as a mask, the emitter and collector regions of an injector transistor and the external base region of a switching transistor are formed in the n-type region and the base region respectively. Arsenic doped into the polysilicon layers is diffused into the base region, so that the collector regions of the switching transistor are self-aligned with the polysilicon layers.
The invention relates to a monolithically integrated semiconductor arrangement with at least one integrated injection logic (I.sup.2 L) structure including an injection zone and an inverting transistor, the injection zone, and lateral thereto, the transistor base zone of a same first conductivity type being arranged in a semiconductor layer of a second conductivity type, which forms the emitter zone of the transistor, the transistor being completed by a collector zone of the second conductivity type, which is formed in the base zone, and the I.sup.2 L structure being surrounded at least partly by a separating zone introduced at a predetermined spacing into the semiconductor layer. The injection zone and the transistor base zone in the region of their edges facing each other are extended up to or into the separating zone, while in the region of their remaining edges they are spaced therefrom at the predetermined distance. The invention further relates to a storage arrangement having storage cells including two such I.sup.2 L structures each which are cross-coupled in the manner of a flip-flop.
The basewidth of a lateral, bipolar transistor is markedly reduced by first forming a layer of polycrystalline silicon over an oxide coated substrate. By utilizing a process for doping the exposed edges of the patterned polysilicon layer, a narrower basewidth dimension is achieved than heretofore possible with photolithographic techniques.
