|
Claims  |
|
|
We claim:
1. A cleaning composition consisting essentially of 92 to 95 weight percent
of 1,1,2-trichloro-1,2,2-trifluoroethane, 5 to 7 weight percent of
methanol and 0.05 to 1 weight percent of methyl acetate.
2. A cleaning composition as claimed in claim 1 consisting essentially of
93.5 weight percent 1,1,2-trichloro-1,2,2-trifluoroethane, 6.3 weight
percent methanol and 0.2 weight percent methyl acetate.
3. A cleaning composition as claimed in claim 1 or claim 2 in which there
is also incorporated 0.2 to 1 weight percent nitromethane.
4. A cleaning composition as claimed in claim 1 or claim 2 in which there
is also incorporated about 0.05 weight percent nitromethane.
5. A cleaning composition as claimed in claim 1 or claim 2 consisting
essentially of 93.5 weight percent 1,1,2-trichloro-1,2,2-trifluoroethane,
6.5 weight percent methanol, 0.03 weight percent methyl acetate and 0.06
weight percent nitromethane.
6. A method of cleaning contaminated articles by contacting the
contaminated articles with a cleaning composition according to claim 1 or
claim 3. |
|
|
|
|
Claims  |
|
|
Description  |
|
|
This invention relates to an improved cleaning composition comprising
trichlorotrifluoroethane.
It is well known that azeotropic mixtures of solvents or mixtures
approximating thereto can be employed as cleaning liquids especially for
the removal of contaminants from synthetic organic polymers or plastic
materials. Such mixtures often comprise
1,1,2-trichloro-1,2,2-trifluoroethane as primary solvents and one or more
cosolvents. The latter may be selected from a very large number of
solvents including, by way of example, methylene chloride, acetonitrile,
methyl acetate, methylal, acetone, 1,1-dichloroethane,
trans-dichloroethylene and lower aliphatic alcohols.
Much time and effort have been expended in attempts to obtain cleaning
compositions having the desired characteristics. The chosen solvent
mixtures may not however be capable to cleaning the articles to a
sufficient high degree. For example they may not be able to remove the
modern active-resin soldering fluxes sufficiently well and the treated
material may not have a high degree of surface finish.
According to the present invention we provide a cleaning composition
comprising 92 to 95 weight percent of
1,1,2-trichloro-1,2,2-trifluoroethane, 5 to 7 weight percent of methanol
and 0.05 to 1 weight percent of methyl acetate.
The proportions by weight of the components of the above described
composition do not materially change on boiling in the liquid or vapour
state.
A particularly useful composition is the azeotrope containing 93.5 weight
percent 1,1,2-trichloro-1,2,2-trifluoroethane, 6.3 weight percent methanol
and 0.2 weight percent methyl acetate (b.pt 39.8.degree. C. at 763mm.Hg).
Preferably both these compositions contain a small amount of nitromethane
for example 0.02 to 1 weight percent, for instance 0.05 weight percent. In
fact a very useful quaternary azeotrope contains 93.5 weight percent
1,1,2-trichloro-1,2,2,-trifluoroethane, 6.5 weight percent methanol, 0.03
percent methyl acetate and 0.06 weight percent nitromethane
(b.pt.39.1.degree. C. at 751mm Hg).
The components of the composition may be pure or contain small amounts of
impurities associated with commercially available sources of the
components.
The solvent mixtures may if desired contain a small amount of other
adjuvents for example, a small amount of surface active agent.
The cleaning compositions of the present invention may be used in
conventional operating techniques. Preferably the composition is employed
at the boil. The contaminated article may be immersed in the cleaning
composition or jetted with a spray of the composition. The article after
treatment with the cleaning composition may be rinsed with the same
solvent composition containing said trichlorotrifluoroethane, methanol,
methyl acetate and preferably nitromethane. More preferably the azeotropes
are employed in the cleaning and rinsing operations. The compositions are
useful in a wide range of cleaning applications. They are also useful in
the removal of water from contaminated articles.
The present invention includes within its scope a process of incorporating
methanol, methyl acetate and preferably nitromethane into said
1,1,2-trichloro-1,2,2-trifluoroethane. The invention also includes within
its scope a process of cleaning when using the present cleaning
compositions.
The following Examples illustrate the invention. Where percentages are
mentioned they are by weight.
EXAMPLE 1
Into a vacuum jacketed, twenty five plate, Oldershaw still were placed 300
mls 1,1,2-trichloro-1,2,2trifluoroethane, 50 mls methanol, and 50 mls
methyl acetate.
The solvent mixture was heated at high reflux ratio for six hours. Samples
were taken from the top of the column, condensed and analysed by gas
liquid chromatography.
The samples were found to be a constant boiling mixture (b.pt 39.8.degree.
C. at 763 mm Hg) consisting of 93.5%
1,1,2-trichloro-1,2,2-trifluoroethane, 6.3% methanol and 0.2% methyl
acetate.
EXAMPLE 2
The general procedure of Example 1 was used except that in the still there
were also placed 50 mls nitromethane.
The samples taken from the top of the column were found to be a constant
boiling mixture (b.pt 39.1.degree. C. at 751 mm Hg) consisting of 93.5%
1,1,2-trichloro-1,2,2-trichloroethane, 6.5% methanol, 0.03% methyl acetate
and 0.06% nitromethane.
EXAMPLE 3
A conventional, stainless steel degreasing unit was employed having a
cleaning compartment and a rinsing compartment and a condenser running
round the upper portion of the walls of the unit. The cleaning and rinsing
compartments were both 25 cms long by 15 cms wide. Into the cleaning
compartment there was placed to a depth of 10 cms a cleaning composition
consisting approximately of 93.5% 1,1,2-trichloro-1,2,2-,trifluoroethane,
6.3% methanol, and 0.2% methyl acetate. Into the rinsing compartment a
similar mixture was placed to a depth of 20 cms. The compositions in both
compartments were heated to boiling, the vapours were condensed and the
condensate fed to the rinsing compartment. There was an overflow of
cleaning composition from rinsing to cleaning compartment.
Printed circuit boards (size 5 cms by 2 cms) having a substrate of epoxy
resin glass mat and contaminated with a flux known as Fry's R 8 were
dipped for periods of from 30 seconds to 1 minute both in the cleaning
compartment and the rinsing compartment.
The treated boards were all found to be perfectly clean.
EXAMPLE 4
The apparatus and procedure of Example 3 was utilised except that the
cleaning composition consisted of 93.5%
1,1,2-trichloro-1,2,2-trifluoroethane, 6.5% methanol, 0.03% methyl acetate
and 0.06% nitromethane.
The treated boards were all found to be perfectly clean.
COMPARISON
By way of comparison the procedure of Example 3 was repeated but using the
azeotropic mixture of 1,1,2-trichloro-1,2,2trifluoroethane (87.5%) and
methyl acetate (12.5%) as cleaning and rinse mixtures.
After treatment the boards were still found to have flux adhering to them.
* * * * *
|
|
|
|
|
Description  |
|