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Protection of semiconductor substrates during epitaxial growth processes
   
Document Number
US Patent 4601888
Issued Date
July 22, 1986
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Inventors
Nelson; Ronald J. (Berkeley Heights, NJ)
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Abstract
Thermal degradation of compound single crystal substrates (e.g., InP) containing a relatively volatile element (e.g., P) prior to LPE growth has been virtually eliminated by an improved protection technique. A partial pressure of the volatile element is provided by a solution (e.g., Sn-In-P) localized inside a chamber which is external to the LPE boat and which surrounds substrate prior to growth, thereby preventing thermal damage to the substrate surface. Applicability of the technique to other epitaxial growth processes (e.g., VPE and MBE) is also discussed.
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Protection of semiconductor substrates during epitaxial growth processes - US Patent 4601888 Drawing
Drawing from US Patent 4601888
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Number of Claims:
3
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Owner
AT&T Bell Laboratories (Murray Hill, NJ)
Published
July 22, 1986
Application Number
06/617,491
Filed
June 5, 1984
US Classification
422/253   117/906
Int'l Classification
C30B   25/18   (20060101)   C30B   19/00   (20060101)   C30B   19/12   (20060101)   C30B   19/06   (20060101)  
Attorney/Law Firm
Parent Case
This is a division of application Ser. No. 392,065, filed June 25, 1982, now U.S. Pat. No. 4,482,423.
USPTO Field of Search
156/622   156/DIG.89   422/253   118/412  
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