|
Claims  |
|
|
We claim:
1. A charge-coupled device comprising a monocrystalline semiconductor body
having a layer-shaped region of the one conductivity type which adjoins a
major surface and is provided with: a charge transport channel for storing
and transporting supplied information in the form of charge packets;
electrical connection means for applying a voltage V.sub.BB to the
layer-shaped region; an input circuit comprising a zone (designated as an
input diode) of the second conductivity type, and supply means for
supplying a signal-dependent voltage to the input diode, characterized in
that the said supply means comprise a voltage divider having a junction
point which is coupled to the input diode and a first resistance element
connected between the junction point and a reference voltage and a second
resistance element connected between the junction point and V.sub.BB,
which second resistance element comprises an element arranged outside the
monocrystalline semiconductor body, and the second resistance element
comprises a resistance layer which is applied to an insulating layer
covering the surface of the semiconductor body.
2. A charge-coupled device as claimed in claim 1, characterized in that
there is present above the charge transport channel a row of clock
electrodes, which, viewed in the charge transport direction, each comprise
a transfer part and a storage part arranged consecutively, internal means
being provided by means of which, when the same voltage is applied to both
parts, a potential barrier for the charge carriers to be transported is
induced under the transfer part and a potential well is induced under the
storage part.
3. A charge-coupled device as claimed in claim 2, characterized in that the
first resistance element is also formed by a resistance layer deposited on
the insulating layer.
4. A charge-coupled device as claimed in claim 3, characterized in that the
resistance layer comprises a layer of polycrystalline silicon.
5. A charge-coupled device as claimed in claim 2, characterized in that the
resistance layer comprises a layer of polycrystalline silicon.
6. A charge-coupled device as claimed in claim 2, characterized in that the
reference voltage is a voltage V.sub.SS, for example earth potential, for
which it holds that .vertline.V.sub.SS .vertline.<.vertline.V.sub.BB
.vertline..
7. A charge-coupled device as claimed in claim 2, characterized in that
there is connected between the said reference voltage and the said
junction point (designated hereinafter as the first junction point) of the
said voltage divider (designated hereinafter as the first voltage divider)
a second voltage divider comprising a third resistance element connected
between the reference voltage and a second junction point and a fourth
resistance element connected between the second junction point and the
first junction point, and in that switching means are present, by means of
which the input diode is connected, depending upon the input signal, to
the first or the second junction point.
8. A charge-coupled device as claimed in claim 7, characterized in that the
said switching means comprise two insulated gate field effect transistors,
one of which is connected between the first junction point and the input
diode and the other of which is connected between the second junction
point and the input diode, and in that further means are provided, by
means of which the input signal can be supplied to the gate electrode of
one field effect transistor and the inverted input signal can be supplied
to the gate electrode of the other field effect transistor.
9. A charge-coupled device as claimed in claim 7, characterized in that the
third and the fourth resistance elements each comprise an insulated gate
field effect transistor.
10. A charge-coupled device as claimed in claim 9, characterized in that
the said switching means comprise two insulated gate field effect
transistors, one of which is connected between the first junction point
and the input diode and the other of which is connected between the second
junction point and the input diode, and in that further means are
provided, by means of which the input signal can be supplied to the gate
electrode of one field effect transistor and the inverted input signal can
be supplied to the gate electrode of the other field effect transistor.
11. A charge-coupled device as claimed in claim 1, characterized in that
the first resistance element is also formed by a resistance layer
deposited on the insulating layer.
12. A charge-coupled device as claimed in claim 11, characterized in that
the resistance layer comprises a layer of polycrystalline silicon.
13. A charge-coupled device as claimed in claim 1, characterized in that
the resistance layer comprises a layer of polycrystalline silicon.
14. A charge-coupled device as claimed in claim 1, characterized in that
the reference voltage is a voltage V.sub.SS, for example earth potential,
for which it holds that .vertline.V.sub.SS .vertline.<.vertline.V.sub.BB
.vertline..
15. A charge-coupled device as claimed in claim 1, characterized in that
there is connected between the said reference voltage and the said
junction point (designated hereinafter as the first junction point) of the
said voltage divider (designated hereinafter as the first voltage divider)
a second voltage divider comprising a third resistance element connected
brtween the reference voltage and a second junction point and a fourth
resistance element connected between the second junction point and the
first junction point, and in that switching means are present, by means of
which the input diode is connected, depending upon the input signal, to
the first or the second junction point.
16. A charge-coupled device as claimed in claim 15, characterized in that
the said switching means comprise two insulated gate field effect
transistors, one of which is connected between the first junction point
and the input diode and the other of which is connected between the second
junction point and the input diode, and in that further means are
provided, by means of which the input signal can be supplied to the gate
electrode of one field effect transistor and the inverted input signal can
be supplied to the gate electrode of the other field effect transistor.
17. A charge-coupled device as claimed in claim 15, characterized in that
the third and the fourth resistance elements each comprise an insulated
gate field effect transistor.
18. A charge-coupled device as claimed in claim 17, characterized in that
the said switching means comprise two insulated gate field effect
transistors, one of which is connected between the first junction point
and the input diode and the other of which is connected between the second
junction point and the input diode, and in that further means are
provided, by means of which the input signal can be supplied to the gate
electrode of one field effect transistor and the inverted input signal can
be supplied to the gate electrode of the other field effect transistor. |
|
|
|
|
Claims  |
|
|
Description  |
|
|
BACKGROUND OF THE INVENTION
The invention relates to a charge-coupled device (CCD) comprising a
monocrystalline semiconductor body having a layer-shaped region of the one
conductivity type, which adjoins a major surface and is provided with: a
charge transport channel for storing and transporting supplied information
in the form of charge packets; electrical connection means for applying a
voltage V.sub.BB to the layer-shaped region; an input circuit comprising a
zone (designated as an input diode) of the second conductivity type; and
supply means for supplying a signal-dependent voltage to the input diode.
Charge-coupled devices, in which the input signal is supplied as a voltage
to the input diode, are generally known. When a suitable voltage is
applied to the first storage-electrode (input gate), a potential well is
induced in the channel which can be filled with a charge packet. There is
arranged between the input diode and the first storage electrode, a
sampling gate, by means of which the input diode and the said charge
packet can be connected to each other and can be insulated from each
other. The size of the charge packet depends upon the potential of the
input diode and hence upon the input signal. In general, the zero level,
at least with surface CCD's, is chosen so that even with a "0" input
signal a certain amount of charge is introduced into the said potential
well (fat zero or reference charge). The maximum level depends upon the
depth of the potential well. When the charge packet and the input diode
are insulated from each other, the charge packet can be transported
further, for example, by applying to the next subsequent clock electrode,
a sufficiently high voltage, as a result of which there is formed under
this clock electrode a deeper potential well which receives the charge
packet.
It has been found in practice that with such an input circuit unexpectedly
large distortions of the signals frequently occur. These distortions may
even be so large that, for example, with digital information, in which
event only a "0" level and a "1" level (full bucket) are present, it is
difficult to discriminate these levels from each other at the output
because the "0" level (empty bucket) has filled substantially completely.
These distortions especially occur in charge-coupled devices in which the
clock electrodes comprise a transfer part and a storage part, means being
internally provided, such as a difference in doping concentration or a
difference in oxide thickness, to generate a difference in threshold
voltage. Such an electrode configuration occurs, for example, in a
two-phase CCD, in which a potential barrier with respect to the storage
part should be formed under the transfer part. Due to this asymmetrical
configuration, it is achieved, as is well known, that charge transport can
take place in only one direction.
SUMMARY OF THE INVENTION
The invention has for its object to provide a charge-coupled device of the
kind described in the opening paragraph, in which these distortions of the
signals are substantially completely avoided.
A charge-coupled device according to the invention is characterized in that
the said supply means comprise a voltage divider having a junction point
which is coupled to the input diode and having a first resistance element
between the junction point and a reference voltage and a second resistance
element between the junction point and V.sub.BB, which second resistance
element comprises an element arranged outside the monocrystalline
semiconductor body.
The invention is based inter alia on the recognition of the fact that the
leakage ocurrents which cause the signal distortions described here are
for the major part due to cross-talk between the semiconductor substrate
and the clock electrodes as a result of which the potential of the
substrate (or at least of the layer-shaped region of the substrate) at
least locally varies with the clock voltages. Due to these voltage
variations, pn junctions in the input circuit, more particularly of zones
which are brought to the substrate voltage V.sub.BB and are themselves
less sensitive to clock cross-talk than the substrate, can be periodically
biased in the forward direction and can inject charge into the substrate,
which charge is added at least in part to the signal charge. By the use of
a resistance element, for example a polycrystalline resistor, arranged
outside the semiconductor body, it is possible to avoid the presence of
zones which are biased at substrate voltage V.sub.BB and thus to prevent
the signal distortion described.
BRIEF DESCRIPTION OF THE DRAWINGS
The invention will be described more fully with reference to an embodiment
and the accompanying diagrammatic drawing, in which:
FIG. 1 is a sectional view of a charge-coupled device,
FIG. 2 shows the potential distribution which is induced at two instants
during operation in the part shown in FIG. 1 of the device;
FIG. 3 shows the clock voltages .phi..sub.1, .phi..sub.2, which are applied
to the device shown in FIG. 1, as a function of time t;
FIG. 4 shows an input circuit for the device shown in FIG. 1 according to
the invention;
FIG. 5 shows the circuit diagram of an inverter stage shown
diagrammatically in FIG. 4;
FIG. 6 is a plan view of a voltage divider used in FIG. 4;
FIG. 7 is a sectional view of this voltage divider taken on the line
VII--VII in FIG. 6.
DETAILED DESCRIPTION OF THE INVENTION
The invention will be explained with reference to an n-channel surface CCD.
However, it will be clear to those skilled in the art that the principle
of the invention may also be used in p-channel CCD's, in charge transfer
devices of the bucket brigade type or in charge-coupled devices of the
buried channel type.
FIG. 1 shows a known two-phase charge-coupled device. The device is
provided in a semiconductor body 2 of silicon, of which at least a region
4 adjoining the surface 3 is p-type conducting. Generally, the whole
semiconductor body 2 is p-type conducting. In the region 4 the charge
transport channel 5 is defined for storing and transporting information in
the form of charge packets of electrons. Above the channel 5 there is
formed a thin dielectric layer 6, which in this embodiment consists of an
approximately 30 nm thick oxide layer, but which of course may also
comprise other dielectric materials, such as silicon nitride, or
combinations of other materials. There are formed in a double-layer
metallization on the oxide layer 6 clock electrodes 7, 8 suitable for
two-phase operation, which have a storage part 7a and 8a, respectively,
and a transfer part 7b and 8b, respectively. The storage parts 7a, 8a are
provided in a first metallization layer, more particularly in a
polycrystalline silicon layer. The transfer parts 7b, 8b are made of Al,
but may of course also be made of polycrystalline silicon or of another
suitable conductive material. The clock electrodes 7, 8 are connected to a
clock voltage source, by means of which the clock voltages .phi..sub.1 and
.phi..sub.2, respectively, are applied. In order to define the direction
of the charge transport (from the lefthand side to the righthand side),
there are provided under the Al parts parts 7b, 8b p-zones 9 having a
higher doping than the region 3, which, as is known, ensure that, when the
same voltage is applied to the storage parts and to the transfer parts, a
potential barrier (for electrons) is induced under the transfer parts and
a potential well is induced under the storage parts. Instead of using
p-zones 9, this asymmetry may also be obtained by other known techniques,
such as, for example, by providing thicker oxide under the transfer parts
7b, 8b.
The input comprises an n-type surface zone 11 (designated hereinafter as
input diode), which is provided with an electrical connection 12 for
supplying input signals. The charge packets are formed under an input gate
13, to which is applied a direct voltage via the connection 14. The
connection between the storage region under the input gate 13 and the
input diode 11 can be established or interrupted by means of the gate 15
(sampling gate), to which the clock voltage .phi..sub.2 is applied. The
input gate electrode 13 and the sampling gate 15 are provided in the layer
of polycrystalline silicon and in the layer of Al, respectively. There is
formed under the sampling gate 15 a p-zone 9 identical to the zones 9
under the transfer parts 7b, 8b of the clock electrodes 7, 8.
The sampling gate 15 can be provided directly beside the input diode 11. In
the present embodiment, however, there is provided between the sampling
gate 15 and the input diode 11 an additional gate 17, to which is applied
a direct voltage and which offers a number of advantages. In the first
place, this gate prevents clock voltages from cross-talking to the input
diode. Moreover, this gate which is provided in the polycrystalline
silicon layer, has the advantage that the definition of the Al sampling
gate 15 is more accurate.
During operation, a negative voltage V.sub.BB of, for example, -3.5 V, is
applied to the p-type semiconductor region 3 via the connection 18. The
clock electrodes 7, 8 have applied to them the clock voltage .phi..sub.1
and .phi..sub.2, respectively, which are shown in FIG. 3 as a function of
time t and which vary between a high level of, for example, 5 V and a low
level of, for example, 0 V (earth). The input gate 13 is connected to
earth and the gate 17 is connected to the (positive) supply source
V.sub.dd so that a conductive channel is always present under the gate 17.
The input diode 11 varies, depending upon the information to be supplied,
between a low level of, for example, -2.5 V (full charge packet)
corresponding to a logic "1" and a level of about 0.2 V (fat zero)
corresponding to a logic "0".
In FIGS. 2a, b, c, the potential profiles are represented, which are
induced in the part shown in FIG. 1 of the charge-coupled device at the
instants t.sub.1, t.sub.2 and t.sub.3, respectively, indicated in FIG. 3.
As usual, the positive potential is plotted in downward direction. The
level of the potential of the input diode 11 corresponding to a logic "1"
is indicated by the line 20. The level corresponding to a "0" is indicated
by the broken line 21. FIG. 2a shows the situation in which .phi..sub.1
=.phi..sub.2 =0 V after a .phi..sub.2 pulse (t.sub.1 in FIG. 3). The
information is now stored under the clock electrodes 8. The drawing shows
a small packet 22 representing a "0" and a large (full) packet 23
representing a "1". Simultaneously, there is formed under the input gate
13 a packet 24 which corresponds to a "1". The connection between this
packet 24 and the input diode 11 is cut off by the potential barrier under
the sampling gate 15. At t.sub.2 .phi..sub.1 is high, as a result of which
the charge packets 22-24 are transferred to potential wells under the
clock electrode 7a. This is shown in FIG. 2b. FIG. 2c shows the situation
in which at the occurrence of a .phi..sub.2 pulse (t.sub.3 in FIG. 3) the
charge packets are transferred to potential wells under the clock
electrodes 8a. Simultaneously, the potential barrier under the sampling
electrode 15 is eliminated, as a result of which charge can flow again
from the input diode into the potential well under the input gate 13.
For a satisfactory charge transport, the clock voltages .phi..sub.1,
.phi..sub.2 must be so large that the potential barriers under the
transfer parts 7b, 8b of the receiving clock electrodes are located
beneath the potential wells of the storage parts 7a, 8a of the other clock
electrodes, which are at the low level. Due to the large amplitudes of the
clock pulses, the potential of the surface region 4 can also vary with the
clock voltages .phi..sub.1 and .phi..sub.2 by capacitive cross-talk. FIG.
4 shows the circuit diagram of an input circuit according to the
invention, which is so constructed as to prevent pn junctions being biased
(due to the said cross-talk) in the forward direction and thus leading to
signal distortion. The circuit comprises for this purpose a voltage
divider 26 comprising two resistance elements 27 and 28 between a
reference voltage (earth) and a junction point 29 on the one hand and
between the junction 29 and a point at the substrate voltage V.sub.BB on
the other hand. The input diode 11 is connected to the conductor 12 and
through a switch 30 to the junction 29. According to the invention, the
element 28, which is connected to V.sub.BB, is constituted by an element
which is arranged outside the substrate 2. Due to the fact that the
element 28, which is connected to the lowest potential of all circuit
elements of the input circuit, is arranged outside the substrate 2
(surface region 4) and therefore does not form a pn junction with the
substrate, potential fluctuations in the substrate will not or at least
substantially not influence the element 28. Due to the fact that
furthermore the remaining circuit elements or parts thereof are applied to
a higher potential, pn junctions formed by these elements (or parts
thereof) with the substrate will always remain cut off even when potential
fluctuations occur in the substrate owing to clock cross-talk.
In practical embodiments, the voltage divider, or at least the element 28,
can be constituted by elements or an element arranged outside the envelope
in which the charge-coupled device is usually provided. In the present
embodiment, however, the resistance element 28 is arranged on top of the
semiconductor body 2, more particularly as a resistor of polycrystalline
silicon material. The resistance element 27 may comprise, if desired, a
conventional MOS transistor, which is formed in the body 2. However, in
the embodiment to be described here, the element 27 is also constituted by
a resistor of polycrystalline silicon. FIGS. 6 and 7 show a plan view and
a cross-section, respectively, of the voltage divider 26. The resistor is
provided on the comparatively thick oxide layer 32, which covers the parts
of the surface 4 lying outside the active parts. The resistors 27, 28 can
be made of the the same polycrystalline silicon layer as the clock
electrodes 7a, 8a. The sheet resistance of this layer is about 30.OMEGA..
In order to obtain a sufficiently high resistance value within a
reasonable surface area, the resistor is folded, as a result of which a
meander-shaped structure is formed having an overall resistance lying
between 10 and 15 k.OMEGA.. The meander structure comprises three
connections, i.e. the connections 33 and 34 at the ends which are
connected to V.sub.BB and earth, respectively, and the connection 35 which
corresponds to the junction 29 in FIG. 4. The area of connection 29 can be
accurately determined from the ratio of the resistors 27 and 28. The poly
material can be coated, after the definition of the meander structure,
with thermal oxide 36 whilst simultaneously applying the oxide to the poly
electrodes 7a and 8a. Contact holes can be provided in this oxide layer at
the area of the connection surfaces 33-35, after which in known manner Al
contacts and Al conductor tracks can be formed.
The reference level for the "0" signal (fat zero) is generated by the
voltage divider 37, the reference voltage being derived from the junction
point 38 between the two resistance elements. The voltage divider 37,
which is connected between earth and the junction 29 may have a
construction similar to that of the voltage divider 26. In the present
embodiment, however, the voltage divider 37 comprises a third resistance
element 39 and a fourth resistance element 40 in the form of field effect
transistors, the transistor 39 being connected between earth and the
junction 38 and the transistor 40 being connected between the junction 38
and the junction 29. The gate electrodes of the transistors 39 and 40 are
connected to earth. The potential at point 38, for example -0.2 V, can be
adjusted in a simple manner by those skilled in the art by means of the
geometric ratio of the transistors 39 and 40.
The junction 38 is connected through a switch comprising a MOS transistor
41 and through the connection (conductor) 12 to the input diode 11. The
gates of the MOS transistors 30 and 41 are connected to the outputs of two
series-connected inverter circuits 42 and 43, respectively. The
information V.sub.in is supplied via the input terminal 44 of the inverter
circuit 43. When V.sub.in =1 (high), the output signal of the inverter
circuit 43 is low, as a result of which the transistor 41 is
non-conducting. The output signal of the inverter circuit 42 is high again
so that the transistor 30 is conducting and the input diode 11 is
connected through conductors 12 to the point 29. Conversely, with V.sub.in
=0 (low), the transistor 41 is conducting and the transistor 30 is
non-conducting, as a result of which the input diode 11 is connected to
the point 38. The inverter circuits 42, 43 may have a known construction
as shown in FIG. 5. The circuit arrangement comprises an inverter
transistor 45, whose source zone is connected to V.sub.SS (earth). The
input signals are supplied via the terminal 46 to the gate electrode of
the transistor 45. The drain of the transistor 45 is connected to the
source of a load transistor 47. The gate electrode of this
transistor--which is of the depletion type--is connected to its source.
The drain of the transistor 47 is connected to the positive supply source
V.sub.dd. The output signal of the inverter circuit can be derived at the
terminal V.sub.out.
It should be noted that the lowest potential occurring in the inverter
circuits 42, 43 is the earth potential V.sub.SS. Since this potential is
considerably higher than V.sub.BB, there will be no or substantially no
risk also in the inverter circuits 42, 43 that pn junctions in the
inverter circuits will be connected in the forward direction due to clock
cross-talk between the substrate and the clock electrodes.
It will be appreciated that the invention is not limited to the embodiment
described, but that many further modifications are possible for those
skilled in the art without departing from the scope of the invention. For
example, the invention may advantageously be used in other types of
charge-coupled devices than described herein, such as, for example, in 1
bit/electrode charge-coupled devices, in which in a group of m successive
electrodes (m-1) bits are stored and in which the transport takes place by
displacing the empty bucket in the direction opposite to the charge
transport direction. Furthermore, the resistance element 28 may
alternatively be constituted by a circuit element other than a resistor,
for example a MOS transistor formed in the polycrystalline silicon layer.
* * * * *
|
|
|
|
|
Description  |
|