|
|
|
| United States Patent | 4812631 |
| Link to this page | http://www.wikipatents.com/4812631.html |
| Inventor(s) | Hiramatsu; Keiji (Tokyo, JP) |
| Abstract | A conventional bar code and a method of reading the same are so adapted
that rays are irradiated on the bar code formed on a semiconductor wafer,
and that reflected rays from the bar code are read out by a bar code
reader to sense the bar code so that a misreading rate is increased by
means of reflection of the surface of a wafer and due to the surface
profile of the bar code. In contrast, according to a bar code and a method
of reading the same in accordance with the present invention, the bar code
is formed of a film or the like of aluminum or the like on the
semiconductor wafer, and infrared rays are irradiated on the bar code,
penetrated infrared rays from the semiconductor wafer being read out by
the bar code reader so that a bar code reading may be effectively made
without being influenced by reflection of the wafer surface and surface
profile with a better S/N ratio and at a lower misreading rate. |
|
|
|
Title Information  |
|
|
|
|
|
Drawing from US Patent 4812631 |
|
|
Bar code and read-out method thereof |
|
|
|
|
|
| Publication Date |
March 14, 1989 |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
Title Information  |
|
|
|
|
|
| Market Size |
|
Estimate the gross annual revenues of the relevant market
sector:
|
| | |
| |
|
|
| Market Share |
|
Estimate the percentage of the relevant market sector this invention will capture:
|
| | |
| |
|
|
| Reasonable Royalty |
|
What percentage of gross sales should the inventor or assignee be paid?
|
| | |
| |
|
|
|
Public's "Guesstimation" of Royalty Value
|
| Market Size | N/A | [No votes] | | x | Market Share | N/A | [No votes] | | x | Reasonable Royalty | N/A | [No votes] |
| | N/A | |
| |
|
|
|
|
|
|
|
|
|
|
|
|
Market Review  |
|
|
Description  |
|
|
BACKGROUND OF THE INVENTION
This invention relates to a bar code which utilizes penetrability of
infrared rays and a method of reading the bar code. A semiconductor wafer
thus theretofore been adapted to record the bar code on its surface and to
then read it thereby establishing a product control.
FIG. 1 is a view showing the general manner in which a bar code 2 formed on
a semiconductor wafer 1 is read. According to this manner, the bar code 2
recorded on the lower portion of the semiconductor wafer 1 in a disc form
is optically read by a reflector type bar code reader 10 positioned so as
to face the semiconductor wafer 1. A semiconductor laser 11 which serves
as a light source, is disposed within the bar code reader 10 and emits
laser beams LK to then irradiate it through an optical lens 12 on a
rotating mirror 12. The laser beams are scanned by the rotation of the
rotating mirror 13 and irradiated on the bar code 2 on the semiconductor
wafer 1. Reflected beams FK from the bar code 2 are incident to the
interior of the bar code reader 10 and are received or sensed through a
lens 14 by a photodetector 15 so that a bar code data BD which has been
converted to an electrical signal is outputted.
In the aforementioned reading method, the surface of the semiconductor
wafer 1 is generally mirror processed or finished, and the wafer 1 has
been chemically processed in a step of a manufacturing process and is
always subjected to variations in its surface profile. This is also the
case with the surface profile of the bar code 2 if the latter is directly
marked on the wafer. Under such circumstances, the aforementioned
reflector type bar code reader 10 is likely to show a lower S/N ratio of
the photodetector 15 due to the influence of the reflection of beam on the
surface of the semiconductor wafer 1 and variation of the surface profile
of the bar code 2 resulting in increase of a rate of misreading of the bar
code 2. This will be of no use for the desired end, and its solution has
been desired.
SUMMARY OF THE INVENTION
The present invention is provided to solve the aforementioned problems. It
is an object of the invention to provide a bar code and a method for
reading the same which utilizes penetrability of infrared rays with
respect to a semiconductor wafer and which is capable of reading the bar
code at a tight speed with accuracy and at a lower misreading rate.
According to one aspect of this invention, for achieving the objects
described above, there is provided a bar code characterized in that said
bar code is formed of a member for reflecting or absorbing infrared rays
on a semiconductor wafer which is penetrated with said infrared rays.
According to another aspect of this invention, there is provided a method
of reading a bar code characterized in that said bar code which is formed
of a member for reflecting or absorbing infrared rays on a semiconductor
wafer is irradiated by infrared rays, and that penetrated infrared rays
from said semiconductor wafer is read out by an optical sensor.
The nature, principle and utility of the invention will become more
apparent from the following detailed description when read in conjunction
with the accompanying drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
In the accompanying drawings:
FIG. 1 is a view showing the conventional manner in which a bar code is
read;
FIG. 2 is a perspective view of semiconductor wafer used in the present
invention;
FIG. 3 is a representation showing the bar code of the invention and the
principle of reading the same;
FIG. 4 is a view showing the manner in which the bar code of the invention
is read;
FIG. 5 is a representation showing another manner in which the bar code of
the invention is read; and
FIG. 6 is a view showing a method of manufacturing another bar code of the
invention.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
A semiconductor wafer (Si in this instance) used in the present invention
is in a disc form as shown in FIG.2. The semiconductor wafer 20 is
provided on its surface and downwardly thereof with a bar code in a
predetermined pattern. The bar code 21 is obtained in such a manner that
an oxide film (S.sub.i O.sub.2) 22 is formed on a base material (S.sub.i)
23 for the semiconductor wafer 20, and that an aluminum film 24 is formed
by deposition and the like thereon, and a photoresist is then applied, and
that exposure developping, and etching of the bar code 21 are made.
The bar code 21 obtained by the aforementioned manner is subjected to
irradiation of infrared rays of wavelength of more than 1000 nm by means
of a light source 50 such as incandescent lamp or the like to allow
infrared rays SK to penetrate a zone 25 each of the oxide film (S.sub.i
O.sub.2) 22 and the base material (S.sub.i) 23, which is defined by the
alminum film 24 so that penetrated infrared rays TK are outputted whereas
another zone covered with the aluminum film 24 is little penetrated with
the infrared rays SK. Now, the penetrated infrared rays TK are read by a
bar code reader. Thus read the bar code 21 formed on the semiconductor
wafer 20. In this connection, it is noted that the bar code 21 may be read
out without being influenced by reflection of the infrared rays SK on the
surface of the semiconductor wafer 20.
FIG.4 shows a method of reading out the bar code 21 to which the
aforementioned principle is applied. The semiconductor wafer 20 which
carries the bar code 21 is disposed centrally of a system as shown in
FIG.4. A light source is arranged leftwardly of the semiconductor wafer 20
and comprises an incandescent lamp 33 and a diffusion plate 34 to emit
uniform infrared rays SK. On the other hand, a bar code reader 30 is
disposed rightwardly (back of the bar code 21) of the semiconductor wafer
20 and on the surface in opposition to the bar code 21 and comprises an
optical system 31 for focussing the penetrated infrared rays TK and a
linear and one dimensonal CCD image sensor 32 which is adapted to receive
the focussed and penetrated infrared rays TK to output a bar code data
BD1.
With this arrangement, the infrared rays SK generated from the light source
are diffused and irradiated on the whole of the bar code 21 on the
semiconductor wafer 10. The wafer 20 is penetrated with the infrared rays
TK from its back. At the sometime, the whole of the penetrated infrared
rays TK are received by the one-dimensionally arranged image sensor 32
within the bar code reader 30 to output the photoelectrically transduced
bar code date BD1.
FIG.5 is a view showing another method of reading out of the bar code 21
which the aforementioned principle is applied, wherein laser beams in an
infrared region is used as the infrared rays. As shown, a light source is
located leftwardly of the semiconductor wafer 20 and comprises a
semiconductor laser source 43 for outputting laser beams of wavelength of
1200.about.1400 nm, used for an optical fiber communication, an optical
system 44 for condensing the laser beams LK from the semiconductor laser
source 43 into a rotating mirror 45 for irradiation thereof, and the
rotating mirror 45 for scanning the laser beams LK on the bar code 21 on
the semiconductor wafer 20. A bar code reader 40 is positioned rightwardly
of the semiconductor wafer 20 (back of the bar code) and on the surface in
opposition to the bar code 21 and comprises an optical system 41 for
focussing the penetrated laser beams PK, and an photo sensor 42 such as a
photodiode or the like which is adapted to receive the focussed and
penetrated laser beams PK so as to output a bar code data BD2.
With this arrangement, the laser beams LK generated from the light source
are irradiated by the rotation of the rotating mirror 45 into the bar code
21 on the semiconductor wafer 20 and are scanned thereon.
The penetrated laser beams PK which have penetrated the semiconductor wafer
20 are focussed by the optical system 41 and then received by the photo
sensor 42 for outputting the bar code date BD2, electrical signal from the
bar codereader 40.
FIG.6 shows a method of manufacturing another form of the bar code, wherein
the oxide film (S.sub.i O.sub.2) 22 is formed on the base material
(S.sub.i) 23 for the semiconductor wafer 20, on the surface of which the
aluminum film 24 is formed by deposition and the like, the surface being
trimmed with laser beams (for example, pulse CO.sub.2 laser, YAG laser or
the like) to obtain the bar code 21A.
The bar code 21A obtained in the manner as above mentioned, is susceptible
of penetration of the infrared rays through a zone 26 each of the oxide
film (S.sub.i O.sub.2) 22 and the base material (S.sub.i). which is
defined by the aluminum film 24 whereas another zone covered with the
aluminum film 24 is not penetrated with the infrared rays so that the
aforementioned method of reading out the bar code may be applied as it is.
Although the embodiment has been described by taking S.sub.i for the
semiconductor wafer, this invention may, of course, be carried out by use
of another semiconductor wafer so far as the material is capable of
penetration of the infrared rays therethrough. In this instance, the
aluminum film is used for manufacturing the bar code, another material may
be, however, employed if it is capable of reflecting or absorbing the
infrared rays when it is formed on the wafer.
As set forth hereinbefore, according to the bar code and the method of
reading the bar code in accordance with the invention, in recognition that
the semiconductor wafer is not penetrated with the infrared rays when it
is partially or wholly covered with the film of aluminum or the like, the
infrared rays are irradiated on the bar code formed of the film of
aluminum or the like on the wafer, to read out the penetrated infrared
rays from the semiconductor wafer by the bar code reader so that a bar
code reading may be effectively made without being influenced by
reflection of the wafer surface and by surface profile.
It should be understood that many modifications and adaptations of the
invention will become apparent to those skilled in the art and it is
intended to encompass such obvious modifications and changes in the scope
of the claims appended hereto.
* * * * *
|
|
|
|
|
Description  |
|