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| United States Patent | 4835423 |
| Link to this page | http://www.wikipatents.com/4835423.html |
| Inventor(s) | de Ferron; Gerard S. (Fuveau, FR);
Fruhauf; Serge (Peynier, FR) |
| Abstract | A voltage switch-over circuit, depending on a switch-over signal, delivers
either a first voltage Vpp or a second voltage Vcc at its output, the
voltage Vpp being greater than the voltage Vcc. The said circuit consists
of a first MOS transistor with one of its electrodes connected to the
voltage Vcc and a set of two series-connected MOS transistors with one of
their electrodes connected to the voltage Vpp and with their two gates
connected together so as to create a floating node at the common point
between the two MOS transistors, the other electrode of the first MOS
transistor and the other electrode of the set of two MOS transistors being
connected together, and the gates of the first MOS transistor and those of
the set of two MOS transistors respectively receiving the switch-over
signal and the reverse switch-over signal. |
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Title Information  |
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Drawing from US Patent 4835423 |
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MOS technology voltage switch-over circuit |
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| Publication Date |
May 30, 1989 |
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| Filing Date |
November 19, 1987 |
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| Priority Data |
Nov 21, 1986[FR]86 16256 |
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Title Information  |
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Description  |
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BACKGROUND OF THE INVENTION
1. 1. Field of the Invention
The present invention pertains to a voltage switch-over circuit in MOS
technology. It pertains more particularly to a voltage switch-over circuit
in MOS technology which, depending on a switch-over signal, delivers
either a first voltage Vpp or a second voltage Vcc at its output, the
voltage Vpp being greater than the voltage Vcc.
2. Description of the Prior Art
This type of switch-over circuit is used especially to program or read
EPROM or EEPROM type memories, the memory cell of which is formed by a
floating-gate MOS transistor. Thus, as shown in FIG. 1 which pertains to
an EPROM memory, the memory cell 1 of which consists of a SAMOS (stacked
gate avalanche injection MOS) type floating-gate transistor, each
floating-gate transistor 1 has two main electrodes, 2 and 3 respectively,
and a control gate 5 stacked on the floating gate 4. In the case of a
memory, the floating-gate transistors 1 which constitute the memory cells
are connected in matrix form. Thus, a first main electrode 2 or source, in
the technology used, is connected to the ground while the other electrode
3 or drain is connected by a bit line (not shown) and a MOS transistor
forming a switch 8 to a column address decoder 9. The control gate 5 is
connected by another connection, called a word line (not shown), to a row
address decoder 7.
More specifically, the column address decoder 9 is connected to the gate of
the transistor 8, which has its source connected to the electrode 3 of the
floating-gate MOS transistor 1 while its other electrode or drain is
connected by a load line, consisting of the MOS transistors 11 and 12, to
the programming voltage Vpp. The load line consists of a depleted MOS
transistor 12 which has its drain connected to Vpp and its source
connected to the drain of an enhanced MOS transistor 11, the two gates of
the transistors 11 and 12 being connected to each other and to the write
control circuit 13. Furthermore, the node N between the MOS transistor 11
and the drain of the MOS transistor 8 is connected to a read amplifier
represented by the block 10.
Similarly, the row address decoder 7 is connected to the gate of the switch
MOS transistor 6 which has one of its main electrodes connected to the
control gate 5 of the floating-gate MOS transistor 1 while its other main
electrode is connected to the output of a voltage switch-over circuit.
As shown in FIG. 1 the voltage switch-over circuit, which is used to switch
over the voltage at the output S either to the voltage Vpp or to the
voltage Vcc, consists essentially of two depleted MOS transistors 14 and
15, mounted between the supply voltage Vcc and the programming voltage
Vpp. More specifically, the drain of the depleted transistor 14 is
connected to Vpp. Its source is connected to the source of the depleted
transistor 15 wich has its drain connected to the voltage Vcc. The output
of the switch-over circuit is made at the midpoint S between the two
depleted MOS transistors 14 and 15. Furthermore, the gates of the two
depleted transistors 14 and 15 are respectively connected to the outputs Q
and Q of an RS flip-flop 16. This flip-flop 16 is made, for example, by
means of two cross-coupled NOR gates 27 and 28, i.e. one of the inputs of
the NOR gate 27 is connected to the output of the NOR gate 28, and one of
the inputs of the NOR gate 28 is connected to the output of the NOR gate
27. Furthermore, the NOR gate 27 is supplied by the supply voltage Vcc
while the NOR gate 28 is supplied by the programming voltage Vpp. The
other inputs of the NOR gates 27 and 28 are respectively connected to the
programming control signal PGM and the inverted programming control signal
PGM obtained at the output of the inverter 19.
To read a memory cell of the type shown in FIG. 1, a voltage equal to the
supply voltage Vcc should be applied to the control gate 5. This voltage
comes from the switch-over circuit. Consequently, the signal at the output
S is at the voltage Vcc. Now the supply voltage Vcc is generally chosen as
being equal to 5 volts while the programming voltage Vpp is most usually
equal to 21 volts in the technology used, but must bear voltages equal to
at least 23 volts. The result of this is that the voltage strength of the
MOS transistor 14 should be equal to at least Vpp-Vcc, i.e. it should be
greater than 18 volts. Now, with currently used technologies, it is
difficult to make MOS transistors having this degree of voltage strength.
Consequently, a problem of breakdown is frequently observed, and this
problem makes the switch-over circuit unusable.
An object of the present invention, therefore, is to remove this
disadvantage by proposing a new voltage switch-over circuit in MOS
technology.
3. Summary of the Invention
Thus, an object of the present invention is a voltage switch-over circuit
in MOC technology which, depending on a switch-over signal, delivers
either a first voltage Vpp or a second voltage Vcc at its output, the
voltage Vpp being greater than the voltage Vcc, the said circuit
comprising a first MOS transistor having one of its electrodes connected
to the voltage Vcc and a set of two series-connected MOS transistors which
has one of its electrodes connected to the voltage Vpp and has its two
gates connected together, so as to create a floating node at the common
point between the two MOS transistors, the other electrode of the first
MOS transistor and the other similar electrode of the set of two MOS
transistors being connected together, and the gates of the first MOS
transistoor and those of the set of two MOS transistors respectively
receiving the switch-over signal and the reserved switch-over signal.
BRIEF DESCRIPTION OF THE DRAWINGS
Other characteristics and advantages of the present invention will emerge
from the following description of an embodiment, made with reference to
the appended drawings, of which,:
FIG. 1, already described, is a prior art schematic drawing of an
electrically programmable non-volatile memory comprising a voltage
switch-over circuit;
FIG. 2 is a schematic drawing of an embodiment of the voltage switch-over
circuit according to the present invention.
To simplify the description, the same elements have the same references in
the figures. Furthermore, the description has been made with reference to
an NMOS technology and to a switch-over circuit made by means of depleted
MOS transistors. However, it is obvious to the specialist that the present
invention can be made using other technologies and other types of MOS
transistors, in particular enhanced MOS transistors.
DESCRIPTION OF A PREFERRED EMBODIMENT
As shown in FIG. 2, the voltage switch-over circuit according to the
present invention comprises, instead of the depleted MOS transistor 14
connected to the voltage Vpp, a set of two depleted MOS transistors 17 and
18. More specifically, the switch-over circuit of the present invention
comprises the set of two MOS transistors 18 and 17 which are
series-connected, with the electrode 18a or drain of the MOS transistor 18
connected to the programming voltage Vpp and a depleted MOS transistor 15.
The electrode 15a or drain of the said depleted MOS transistor 15 is
connected to the supply voltage Vcc and the other electrode 15b or source
of the said depleted MOS transistor 15 is connected to the electrode 17b
or source of the depleted MOS transistor 17. Furthermore, the drain 17a of
the transistor 17 is connected to the source 18b of the MOS transistor 18
by providing a floating node N1, because the gates 17c and 18c of the set
of two MOS transistors are connected together. Moreover, the gates 17c and
18c are connected to the output Q of the flip-flop 16 while the gate 15c
of the MOS transistor 15 is connected to the output Q of the flip-flop 16.
In a known way, the output S of the switch-over circuit is connected by a
switch MOS transistor 6, controlled by the row address decoder 7, to the
control gate 5 of a floating-gate MOS transistor 1 which constitutes a
memory cell of an EPROM memory for example.
The following explanation of the working of the switch-over circuit
according to the present invention will also serve to show its advantages.
Thus, in read mode, the output Q of the RS flip-flop is positioned at the
logic level "1". Consequently, the depleted MOS transistor 15 is on and
the voltage at the point S is positioned at Vcc. Consequently, the set of
two depleted MOS transistors 18 and 17 should have a voltage strength
equal to at least Vpp-Vcc. Now, since the node N1 between the two
transistors 18 and 17 is a floating node, the voltage at this node is
automatically adjusted to Vpp--the breakdown voltage of the MOS transistor
18. Similarly, the voltage at the node N1 may be equal to Vcc+ the
breakdown voltage of the depleted MOS transistor 17. Consequently, the
switch-over circuit thus made makes it possible to raise the breakdown
voltage of the entire device. For, with the above circuit, Vpp can be
equal to Vcc+ wo breakdown voltages.
Another advantage of the switch-over circuit of the present invention lies
in the fact that is pushes back the breakdown voltage point and, hence,
increases the value of Vpp by making use of the following phenomenon:
during breakdown the charges trapped in the oxide are replaced by
electrons which will make the unwanted NPN transistor conductive, so that
the said transistor goes into negative resistance. The same phenomenon is
undergone by the transistor 18 with the circuit of the present invention,
since the source of the said transistor is floating. However, in this
case, the source 18b picks up the electrons and therefore does not make
the unwanted transistor conductive. Since the transistor 18 does not break
down, the above-described phenomenon can be used to advantage.
According to another characteristic of the present invention, the two MOS
transistors 17 and 18 may have identical or different W/L ratios.
Furthermore, to obtain a switch-over circuit with the same characteristics
as the switch-over circuit of FIG. 1, the MOS transistors 17 and 18 must
have an area which is about twice the area of the MOS transistor 14.
Similarly, the MOS transistors 15, 17 and 18 may be of the same type as in
the embodiment, whether shown or not.
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Description  |
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