Described herein is an improved target for use in a pulsed induced plasma X-ray lithography system. The target is formed as a disk shaped base having a series of concentric grooves formed on the side thereof incident to the focused laser beam. A plurality of small holes are fabricated through the base to the facing wall of the groove against which the laser beam is focused and a film, of a polyimide or silicon nitride material, covers the hole. A thin layer of metal target material is then placed on the film aligned with each hole. The thickness of the metal is selected to be sufficient to allow the complete ablation of the material during the existence of the X-ray emitting plasma. In this manner, a minimal amount of debris, either in the form of molten droplets or evaporated metal material, will be generated. The angle of the incident, or facing, side of the grooves is selected to be at an angle so that both the laser beam optical elements and the X-ray mask are positioned in an area where few, if any, molten droplets of debris are emitted. Such an angle may be 45.degree. with respect to the plane in which the target substrate is moved while placing different target areas in incident with the laser beam. Such a target also allows the angle at which the laser beam is focused at the target to be approximately 65.degree. from the alignment of the focal spot on the target and the vertical line to the mask. This angle, in turn, allows a slower lens and less optical coating to be used on the optical elements beyond the lens. pg,8
Method and apparatus for producing extreme ultra violet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10.sup.11 -10.sup.12 watts/cm.sup.2) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10-30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle.
A flat panel x-ray tube assembly is provided comprising a cathode assembly including a plurality of emitter elements. An anode substrate is included having a substrate upper surface facing the plurality of emitter elements and a substrate lower surface. The substrate upper surface is positioned parallel to the plurality of emitter elements. A plurality of target wells are formed in the substrate upper surface. Each of the plurality of target wells comprises a first angled side surface positioned at an acute angle relative to the substrate upper surface. A plurality of first target elements is applied to each to one of the first angled side surfaces. The first target elements generate x-rays in a direction perpendicular to the plurality of emitter elements in response to electrons received from one of the plurality of emitter elements.
An X-ray tube target assembly and method of manufacturing same is provided. The X-ray tube target assembly comprises an injection molded target disk. The injection molded target disk includes an injection molded hub member and an injection molded outer member. The injection molded outer member comprises a plurality of injection molded outer member segments that are removably attached together and removably attached to the hub member to form the injection molded target disk. A target track is formed on an outer surface on one side of an outer periphery of the injection molded outer member.
