In microfocus X-ray equipment for enlarging radiographic short-time recordings, a focussed electron beam for the production of X-radiation (16) impinges on the retarding material of a target (23). In this case, the retarding material in the focal spot (22) passes over into the liquid aggregate state due to the high thermal loading. For this reason, the equipment is operated in pulsed operation, wherein the position of the focal spot (22) on the target (23) is, when each loading occurs, displaced relative to the previous position. The retarding material is arranged in a retarding layer (32) on a carrier layer (33) and the electron beam (16) impinges on the retarding layer (32) oriented perpendicularly to the electron beam (16). A control interrupts the irradiation at the latest when the carrier layer (33) starts to melt.

An X-ray generating apparatus generates X-rays from plasma formed by irradiating a laser beam to a target. The apparatus includes an X-ray transmitting film disposed at at least one side of the target with a predetermined gap provided therebetween. The X-ray transmitting film has a thickness such that the film is not broken due to an action in the X-ray generating process. The X-rays are taken out through the X-ray transmitting film. An X-ray microscope can employ such an X-ray generating apparatus, with the X-rays from the apparatus being guided to the sample, with the sample to be observed being disposed in the vicinity of the X-ray transmitting film, and with a detecting device for detecting an X-ray image formed by X-rays transmitted through the sample.

A proximity X-ray exposure apparatus for irradiating a reticle with X-rays generated from an X-ray source and irradiating a substrate with X-rays that have passed through the reticle. The apparatus includes a plasma X-ray source for generating X-rays by producing plasma, and a control device for controlling X-ray intensity distribution by controlling production of the plasma so that the plasma is produced at a plurality of positions in one irradiating operation of the substrate with the X-rays. The control device controls the X-ray intensity distribution in order to control the plurality of positions so that a required amount of defocusing, which is a size of a projection image corresponding to one point on the reticle formed by irradiating the reticle with X-rays generated at the plurality of positions, can be obtained.

Method and apparatus for generating X rays by laser impingement on a target in a vacuum enclosure to generate plasma, wherein the target comprises a first film made of a suitable metal and a second film made of an X-ray transmitting material and superimposed on one surface of the metal film, and with a space being formed between opposite parts of the first and second films, a laser beam is projected onto the part of the metal film which corresponds to the space, so that plasma is generated and confined in the space for a longer time than otherwise, thereby to increase the efficiency of X-ray generation.

An X-ray generating device employing a laser-excited plasma light source has a plurality of luminescent points, or a luminescent portion the form of which is variable in terms of the configuration, size, position and the number of luminescent points. An object such as a mask is illuminated by X-rays generated from the light source under Kohler's illumination conditions. Also disclosed are an X-ray generating method using such a device, as well as a method of producing a semiconductor device.