A shaped polyphosphazene article having a modified surface portion thereof and exhibiting a desired property and/or performance comprises a polyphosphazene polymer having at least 50 molar % or more of repeating units of the formula (I): ##STR1## wherein R.sup.1 and R.sup.2 in the first and second side chains --OR.sup.1 and --OR.sup.2 respectively represent, independently from each other, an aliphatic, cycloaliphatic or aromatic radical, and having at least a portion of a surface portion thereof in which at least 5 molar % of the first and second side chains are converted to one or more types of third side chains --OR.sup.3 wherein R.sup.3 represents an aliphatic, cycloaliphatic or aromatic radical and which are different from --OR.sup.1 and --OR.sup.2.
This invention relates to novel radiation sensitive compositions. More particularly the invention relates to photoresists containing phosphorus and nitrogen linked polymers; i.e., polyphosphazenes, useful in the preparation of a relief pattern on a substrate; e.g., a silicon wafer or aluminum plate. The polyphosphazenes of in this invention can be synthesized by the condensation of N-trimethylsilylalkoxyphosphorimides. Radiation sensitive positive photoresist compositions of the invention can be developed in aqueous base developer or organic solvent developer The base developer dissolution properties of the composition can be controlled by incorporating carboxylate groups into the polyphosphazene. The polyphosphazenes utilized in this invention have good solubility properties in various organic solvents and also have good mechanical, electrical, adhesion and thermal properties.
A method for the alkylsulfonation of polymeric and cyclic trimer phosphazenes that includes reacting the phosphazene with a sultone. This method can be used to prepare sulfonated phosphazenes that are useful as biomedical materials, membranes, reversibly cross-linkable polymers, surfactants, and polyelectrolytes.
A number of new poly(organophosphazenes) have been synthesized which bear 2-butenoxy or 4-allyloxyphenylphenoxy side groups. Co-substituent groups included trifluoroethoxy, phenoxy, or benzyloxyphenoxy groups. Species with 4-allyloxyphenylphenoxy units underwent Si--H coupling to linear silanes or siloxanes to extend the side groups and form hybrid phosphazene/organosilicon polymers. A number of these polymers are rubbery elastomers which are readily cross-linked by heat or light. Seven of the mixed-substituent, cross-linked polymers were incorporated into interpenetrating polymer networks (IPN's) with polystyrene, poly(methyl methacrylate), polyacrylonitrile, poly(acrylic acid) and poly(dimethylsiloxane). The phase compatibility characteristics of the IPN's were assessed by DSC, TEM, FT-IR spectroscopy, and 1H and 31P NMR spectroscopy data.
A process for producing a phosphonitrilic acid ester. The process comprises using a specific compound as a catalyst to react phosphonitrile dichloride with at least one member selected among phenol compounds and/or alcohol compounds in the presence of a reaction solvent. Alternatively, the process comprises reacting a liquid reaction mixture obtained in a first stage with at least one member selected among phenol compounds and/or alcohol compounds without isolating phosphonitrile dichloride from the mixture.
