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Description  |
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FIELD OF THE INVENTION
The present invention relates to method and apparatus for state analysis
and, more particularly, to method and apparatus for state analysis
directed to a line analysis or a two-dimensional scanning image based on
elemental state data, such as the chemical bonding state, of elements
contained in specimens.
An Electron Probe Micro Analyzer (EPMA) or so is operated to apply electron
beam or X-rays as exciting source to the specimens, so that the intensity
of characteristic X-rays emitted from the specimens is measured to obtain
the elemental data.
DESCRIPTION OF THE PRIOR ART
Conventionally, the EPMA for analyzing the surface state of a specimen is
so operated that it irradiates electron beam to the surface of the
specimen and detects characteristic X-rays from micro area of about 1
.mu.m to obtain elemental analysis data of the specimen.
Basically, the EPMA is designed and constructed so as to analyze elements,
but not to directly analyze any compound. Therefore, even if a specimen
contains Fe metal, FeO, Fe.sub.3 O.sub.4, and Fe.sub.2 O.sub.3, all of
them are detected and equally treated in terms of Fe elemental spectra in
the EPMA. However, the spectrum of the characteristic X-rays detected by
the EPMA can be changed by the state (mainly, chemical bonding state) of
the respective elements in the specimen. Therefore, it may be possible to
carry out the state analysis by detecting the change of the spectrum of
the characteristic X-rays. Unfortunately, the degree of the spectra change
of the characteristic X-rays is normally too small to collect data
necessary for the state analysis even when the spectrometer is set in a
specific wavelength of the characteristic X-ray with scanning the electron
beams.
In view of this, the so-called "point analysis" is carried out wherein the
spectrometer is operated to respond to a plurality of wavelengths
emanating from a point in connection with an element to be analyzed so as
to obtain peak profiles and analyze the wavelength spectra.
Normally, a two-dimensional scanning image in only some specific chemical
bonding state cannot be obtained except for some peculiar cases such as in
sulfides and sulfuric acids, or CuO and Cu.sub.2 O. The reason is that in
the peculiar cases, different inherent peak can appear, being separated
depending on the chemical bonding state in L-emission band spectra of
sulfur, or Oxygen K-emission band spectra of copper oxides. In these
cases, when the spectrometer is set in either inherent peak wavelength,
the two-dimensional state distribution image can be given. Such a method,
however, is not applicable to the normal cases because the peaks inherent
to the element state can rarely appear in the ordinal wavelength of the
EPMA (about 1 through 100 .ANG.).
It may be possible in principle that a great number of point analyses are
carried out in connection with the respective measurement points of the
specimen to analyze their spectra, automatically with a computer. However,
in the case of line analysis and the two-dimensional scanning image, the
measurement points are about several hundreds to several tens of
thousands, so that the operation time and the memory capacity become vast.
SUMMARY OF THE INVENTION
Accordingly, it is an object of the present invention to provide improved
method and apparatus for performing a state analysis of elements.
It is another object of the present invention to provide improved method
and apparatus for carrying out a line analysis or obtaining a
two-dimensional scanning image in substantially real time.
It is a further object of the present invention to provide an improved
apparatus being capable of carrying out a line analysis or a
two-dimensional scanning image with apparatus of a simple construction.
Other objects and further scope of applicability of the present invention
will become apparent from the detailed description given hereinafter. It
should be understood, however, that the detailed description and specific
examples, while indicating preferred embodiments of the invention, are
given by way of illustration only, since various changes and modifications
within the spirit and scope of the invention will become apparent to those
skilled in the art from this detailed description.
To achieve the above objects, pursuant to embodiment of the present
invention, a state analysis method is characterized in that the intensity
or energy level (amplitude) of characteristic X-rays emitted from one or
more measurement points of a specimen is detected for two different
predetermined spectral wavelengths previously selected by a spectrometer
depending on a specific state of an element to be analyzed. The intensity
or amplitude values in a single spectrum (the number of photons) in
respect to different energy positions is obtained. If the intensity ratio
i.e. the ratio of the amplitude values of the respective X-ray energies
detected at the two selected wavelengths falls within a predetermined
range selected according to the specific state of the element in some
measurement points, state detection signals detected only at those
measurement points are outputted to display a line analysis or a
two-dimensional scanning image. According to the state analysis method of
the present invention, the spectral intensity ratio detected with the two
different wavelengths selected is used to detect the change of the
spectrum in order to determine the state.
A state analysis apparatus of the present invention comprises two
wavelength dispersive spectrometers and a comparator. The two wavelength
dispersive spectrometers are set to different wavelengths of
characteristic X-rays to meet with specific state of the element to be
analyzed. The comparator is operated to compare the intensity or energy
level (amplitude) of the characteristic X-rays detected at the two
wavelengths by the spectrometers with each other and determines whether
the intensity ratio of the amplitude values falls within a predetermined
range. Only when the intensity ratio falls within the range, the
comparator outputs state detection signals.
Further, according to the present invention, one wavelength dispersive
spectrometer comprises a wavelength dispersion crystal and a position
sensitive detector (PSD) for detecting characteristic X-rays dispersed by
the wavelength dispersion crystal. The characteristic X-rays are detected
at different positions previously defined by the PSD. A comparator is
provided for comparing the intensity of the characteristic X-rays detected
at the two positions of PSD with each other. Only if the intensity ratio
is within a predetermined range selected depending on the specific state
of the element, the comparator outputs state detection signals.
BRIEF DESCRIPTION OF THE DRAWINGS
The present invention will become more fully understood from the detailed
description given hereinbelow and the accompanying drawings which are
given by way of illustration only, and thus are not limitative of the
present invention and wherein:
FIGS. 1 through 4 are graphs of spectra of characteristic X-rays used for
explaining a method of the present invention;
FIG. 5 is a schematic arrangement of a state analysis apparatus according
to a first preferred embodiment of the present invention.
FIGS. 6 through 8 are block diagrams of the state analysis apparatus of
FIG. 5 to process state detection signals;
FIG. 9 is a schematic arrangement of a state analysis apparatus according
to a second preferred embodiment of the present invention; and
FIG. 10 is a block diagram of the state analysis apparatus of FIG. 9 to
process state detection signals.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
FIGS. 1 through 4 are graphs of spectra of characteristic X-rays are
helpful in explaining a method of the present invention.
FIG. 1 shows spectra of characteristic X-ray of elements Si or SiO.sub.2,
for example, contained in the specimen. The changing from Si to SiO.sub.2
enables the shift of the peak wavelength in the spectrum of the
characteristic X-rays. When the element of Si is in a first state i.e.
metallic Si, it provides spectrum 1 of FIG. 1 as the inherent
characteristic X-rays. In the spectrum 1, the peak wavelength value is
.lambda..sub.1. A wavelength value far from .lambda..sub.1, at about a
half of half width (at most at the peak half width) is .lambda..sub.2.
Since the values of .lambda..sub.1 and .lambda..sub.2 are previously known
depending on an element to be analyzed, two spectrometers are set to the
wavelengths .lambda..sub.1 and .lambda..sub.2, respectively. When the two
spectrometers detect the spectrum, the intensity detected is given to be
I.sub.1 and I.sub.2. It is assumed that they satisfy the following
relation.
I.sub.1 .gtoreq..alpha..beta..sub.1 I.sub.2 (1)
.alpha. is an inherent factor so that the sensitivity of a first
spectrometer for measuring the intensity I.sub.1 at the wavelength
.lambda..sub.1 becomes equal to that of a second spectrometer for
measuring the intensity I.sub.2 at the wavelength .lambda..sub.2. The
factor .alpha. is defined according to the spectrometers. .beta..sub.1 is
a factor representative of the wavelength shift amount in the
characteristic X-ray spectra, the factor being defined with corresponding
to the specific state of the element to be analyzed.
In a second state of the Si element, it is the compound of, for example,
SiO.sub.2. The spectra of the Si element in this second state is shifted
toward the shorter wavelengths due to the effect of oxygen to be spectrum
2 and displaced from spectrum 1. The peak wavelength value of the spectra
2 is thereby shifted toward the shorter wavelengths.
When the two spectrometers set to the wavelengths .lambda..sub.1 and
.lambda..sub.2 are used to detect the spectral characteristic X-rays in
the second state, the intensity I.sub.1 and I.sub.2 satisfy the following
relation.
I.sub.1 <.alpha..beta..sub.1 I.sub.2 (2)
Therefore, the characteristic X-rays of the element to be analyzed are
detected based on the wavelengths .lambda..sub.1 and .lambda..sub.2
previously selected in order to compare the detected intensity data with
each other. To detect the first state of the element S.sub.1, state
detection signals are outputted in connection with only some measurement
points providing the intensity ratio for satisfying the relation (1), so
that a line analysis or a two-dimensional scanning image in the first
state can be displayed. To detect the second state of the combination of
Si with O, namely SiO.sub.2, state detection signals are outputted from
only some measurement points providing the intensity ratio for satisfying
the inequality (2), so that the line analysis or the two-dimensional
scanning image in the second state also be displayed.
FIG. 2 shows a graph of spectra of the characteristic X-rays where the
intensity ratio of the related peaks are changed depending on the specific
state such as the chemical bonding, for example, in the case of L.alpha.
and L.beta. of Fe or .alpha..sub.3 and .alpha..sub.4 of K satellites.
Two spectrometers are set to peak wavelengths .lambda..sub.3 and
.lambda..sub.4 of the two related peaks 3 and 4. In the first state, the
detected intensity data I.sub.1 and I.sub.2 of the characteristic X-rays
at the selected wavelengths .lambda..sub.3 and .lambda..sub.4 are assumed
to satisfy the following relation.
I.sub.1 .gtoreq..alpha..beta..sub.2 I.sub.2 (3)
In the second state, the intensity data I.sub.1 and I.sub.2 are assumed to
satisfy the following relation.
I.sub.1 <.alpha..beta..sub.2 I.sub.2 (4)
.beta..sub.2 is a factor representative of the intensity ratio of the
related peaks. The line analysis or the two-dimensional scanning image
specific to the states can be given by determining whether the spectra of
the characteristic X-rays at the measurement points belong to either of
the relations (3) and (4).
FIG. 3 shows a graph of the spectrum of the characteristic X-rays wherein
symmetry in the spectrum is changed depending on the change of the state
such as the chemical bonding states. The two spectrometers are set to
wavelengths .lambda..sub.5 and .lambda..sub.6, respectively, which are,
for example, about a half of the half width, at the longer and shorter
wavelength sides. Determined is whether the intensity data of the
characteristic X-rays at the selected wavelengths .lambda..sub.5 and
.lambda..sub.6 satisfy one of the following relations.
I.sub.1 >.alpha..beta..sub.3 I.sub.2 (5)
I.sub.1 =.alpha..beta..sub.3 I.sub.2 (6)
I.sub.1 <.alpha..beta..sub.3 I.sub.2 (7)
.beta..sub.3 is a factor representative of asymmetry in the spectrum of the
characteristic X-rays. By detecting one of the relations, the line
analysis or the two-dimensional scanning image specific to the state to
which the spectra belong can be obtained.
FIG. 4 shows a graph of spectrum of the characteristic X-rays where the
half width in the spectrum of the characteristic X-rays can be altered
depending on the changes of the state such as the chemical bonding state.
When it is assumed that the spectrum is altered as shown in spectra 5 and
6 depending on the changes of the state, the wavelengths of the two
spectrometers should be selected to be .lambda..sub.1 of the peak
wavelength and .lambda..sub.2 far from .lambda..sub.1 at about a half of
the half width as shown in FIG. 1. The line analysis or the
two-dimensional scanning image can be given in the same method as in FIG.
1 because the detected intensity ratio can be changed at the selected
wavelength if the peak half width of the spectra is changed.
FIG. 5 is a schematic representation of a state analysis apparatus
according to a first preferred embodiment of the present invention.
An electron beam 12 emitted from an electron gun 11 is incident upon a
measurement point on a sample 10 to be analyzed with a focusing lens 13
and an objective lens 14. A scanning coil 15 is provided for enabling the
scanning on the sample 10. In response to the application of the electron
beam 12, a characteristic X-ray 16 and secondary electrons are emitted
from the sample 10.
In the first preferred embodiment of the present invention, a first and
second wavelength dispersive spectrometers are provided to detect the
characteristic X-rays 16. The first wavelength dispersive spectrometer
comprises a spectroscopic crystal 17 as a wavelength dispersion means and
a detector 18. The second wavelength dispersive spectrometer comprises a
spectroscopic crystal 19 as a wavelength dispersion means and a detector
20. The two spectrometers with the same sensitivity can detect the
characteristic X-rays having the wavelengths specified in FIGS. 1 through
4; i.e., one of them is set to .lambda..sub.1, .lambda..sub.3, or
.lambda..sub.5, while another to .lambda..sub.2, .lambda..sub.4, or
.lambda..sub.6, respectively.
The detectors 18 and 20 may be a proportional counter, position sensitive
detector, etc. It is preferable that both spectrometers are positioned
adjacently to each other to make a measurement condition similar.
The characteristic X-rays 16 emitted from the sample 10 are dispersed to
different wavelengths with the spectroscopic crystals 17 and 19 and are
detected by the detectors 18 and 20 at the same time or sequentially. It
is assumed that the detected spectral intensity of the two detectors 18
and 20 is I.sub.1 and I.sub.2, respectively. The intensity value I.sub.2
is changed to ".alpha..beta.I.sub.2 " with an .alpha. set means 21 and a
.beta.i (i=1, 2, or 3) set means 22 as FIG. 6 shows. A comparison means 23
is provided for comparing I.sub.1 with .alpha..beta.iI.sub.2 so as to
determine whether any specific state is specified. While a plurality of
measurement points are scanned with displaying the state detection in real
time on a display, a line analysis or a two-dimensional scanning image can
be displayed.
As FIG. 7 shows, the output signals from the detectors 18 and 20 are stored
in memories 24 and 25 in the form of the data I.sub.1 and
.alpha..beta.iI.sub.2, respectively, together with the position
information of the measurement point. Thereafter, a computer 26 is
operated to compare the data with each other. Otherwise, as FIG. 8 shows,
the intensity data I.sub.1 and I.sub.2 from the detectors 18 and 20 are
directly stored in memories 27 and 28 together with the position
information of the measurement point. Thereafter, a computer 29 is
operated to add the two coefficients .alpha. and .beta.i and compare the
resultant data with each other so as to display the result.
FIG. 9 is a schematic illustration of a state analysis apparatus according
to a second preferred embodiment of the present invention. The state
analysis apparatus of FIG. 9 is different from that of FIG. 5 in that a
single wavelength dispersive spectrometer is provided which comprises a
position sensitive detector 30 and a spectroscopic crystal 31 and that the
intensity data by the position sensitive detector 30 are detected at two
positions, respectively, corresponding to one selected wavelength
(.lambda..sub.1 for example) and another selected wavelength
(.lambda..sub.2 for example).
In case where the two independent spectrometers are provided for measuring
the intensity data at the two selected wavelengths .lambda..sub.1 and
.lambda..sub.2, each of them can be placed in a completely spectroscopic
condition. On the other hand, in case where only the single spectrometer
with the position sensitive detector is provided for simultaneously
measuring the intensity data at the positions corresponding to the
wavelengths .lambda..sub.1 and .lambda..sub.2, a spectroscopic condition
is approximated. This is, however, no problem in practice to compare the
intensity data between the adjacent wavelengths.
In the second preferred embodiment, as FIG. 10 shows, two portions of the
single position sensitive detector 30 provide the intensity data I.sub.1
and I.sub.2 in the two different selected wavelengths, simultaneously or
sequentially. In FIG. 10, the intensity data I.sub.1 and I.sub.2 are
processed in real time. Otherwise they are processed after being stored
within the memories 24, 25, 27, and 28 as shown in FIGS. 7 and 8. A line
analysis or a two-dimensional scanning image at the specific state can be
thereby displayed.
As described above, in accordance with the present invention, in case where
the state of an element contained in a specimen is altered depending on
the chemical bonding state, the characteristic X-ray spectra are
correspondingly altered in a condition in which a point analysis mode can
be applied to analyze the spectra. In such a case, the characteristic
X-ray spectra can be effectively separated and altered. A line analysis or
a two-dimensional scanning image of a composition distribution in the
specimen to be analyzed can be displayed, having the same real time as the
conventional case. The capability of the EPMA can be highly expanded
beyond the conventional capability only for analyzing the element, in that
according to the present invention, the EPMA can afford the important
information of the state analysis in analyzing a material.
The invention being thus described, it will be obvious that the same may be
varied in many ways. Such variations are not to be regarded as a departure
from the spirit and scope of the invention, and all such modifications are
intended to be included within the scope of the following claims.
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Description  |
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