June 25, 1991

The present invention involves the use of organocalcium precursors for the chemical vapor deposition of thin CaF.sub.2 films under exceptionally mild conditions. This method is based on utilizing an organocalcium compound and a source of fluorine in a chemical vapor deposition reaction to form CaF.sub.2.

29

June 25, 1991

07/379,016

July 11, 1989

427/255.11   427/255.39

C23C   16/30   (20060101)  

427/255   427/255.2   427/255.1   423/497   423/490   156/613   156/614