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Test validation method for a semiconductor memory device    
United States Patent5309446   
Link to this pagehttp://www.wikipatents.com/5309446.html
Inventor(s)Cline; Danny R. (Plano, TX); Loh; Wah K. (Richardson, TX); Hyslop; Adin E. (Dallas, TX); McAdams; Hugh P. (Houston, TX); Hung; Chok Y. (Singapore, SG)
AbstractA test validation process for a semiconductor device applies signals indicating a test mode to the semiconductor device. The device produces output signals and the output signals are read to determine whether the device is in the indicated test mode. The test mode is conducted by operating the device. The output signals are read upon completion of the test mode to determine if the device is still in the indicated test mode. The test validation method is useful for memory chips and particularly Dynamic Random Access Memory, DRAM, devices that are burn-in stress tested.
   














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Drawing from US Patent 5309446
Test validation method for a semiconductor memory device - US Patent 5309446 Drawing
Test validation method for a semiconductor memory device
Inventor     Cline; Danny R. (Plano, TX); Loh; Wah K. (Richardson, TX); Hyslop; Adin E. (Dallas, TX); McAdams; Hugh P. (Houston, TX); Hung; Chok Y. (Singapore, SG)
Owner/Assignee     Texas Instruments Incorporated (Dallas, TX)
Patent assignment
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Publication Date     May 3, 1994
Application Number     07/927,557
PAIR File History     Application Data   Transaction History
Image File Wrapper   Patent Term   Fees
Litigation
Filing Date     August 6, 1992
US Classification     714/718 365/201
Int'l Classification     G01R 031/28
Examiner     Atkinson; Charles E.
Assistant Examiner    
Attorney/Law Firm     Holland; Robby T. Bassuk; Lawrence J. , Havill; Richard B. ,
Address
Parent Case     This application is a continuation of application Ser. No. 07/560,982, filed Jul. 31, 1990, now abandoned.
Priority Data    
USPTO Field of Search     371/21.1 371/21.4 324/158 R 365/201
Patent Tags     test validation semiconductor memory
   
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What is claimed is:

1. A process of validating a test of a semiconductor device where the device is capable of operating in plural internal test modes, the process comprising:

A. applying to the device signals that indicate that the device should enter at least one of the internal test modes;

B. producing from the device output signals that indicate the test mode entered by the device in response to the applied signals;

C. reading the output signals to determine whether the device entered the indicated test mode;

D. operating the device to conduct the indicated test; and

E. reading the output signals to determine whether the device remained in the indicated test mode during the indicated test.

2. The process of claim 1 in which the applying signals includes applying a Write signal low with a CAS signal low before a RAS signal low in conjunction with certain overvoltage signals and a valid address key occurring an address signals A6, A2, A1 and A0.

3. The process of claim 1 in which the at least one internal test mode is a burn in detection test and the producing the output signals to indicate that the device has entered the burn in detection test includes producing high impedance signals on the data outputs of the device.

4. The process of claim 1 in which the reading the output signals from the device to determine whether the device remained in the indicated test mode through completion of the indicated test includes reading high impedance signals from the device to indicate that the device successfully remained in the indicated test mode through completion of the indicated test, and includes reading logic one signals from the device to indicate that the device failed to remain in the indicated test mode through completion of the indicated test.

5. The process of claim 1 in which the device is a memory device.

6. The process of claim 1 in which the device is a dynamic random access memory device.

7. The process of claim 1 in which operating the device includes completing the indicated test and in which the reading the output signals from the device to determine whether the device remained in the indicated test mode during conduction of the indicated test includes reading the output signals from the device after completing the indicated test.
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CROSS-REFERENCE TO RELATED APPLICATIONS

This application cross-references and incorporates by reference the following simultaneously filed, co-pending and co-assigned applications of Texas Instruments Incorporated:

______________________________________ Serial No. Title ______________________________________ 560,983 filed July 31, 1990, now U.S. A Counter Circuit 5,131,018 560,961 filed July 31, 1990, now A Configuration Selection abandoned Circuit for a Semi- conductor Device 560,962 filed July 31, 1990, pending A Pulse Generation Circuit 560,541 filed July 31, 1990, pending A CMOS Single Input Buffer for Multiplexed Inputs 560,523 filed July 31, 1990 abandoned, A Voltage Reference now 840,680 filed February 21, 1992 Initialization Circuit 560,934 filed July 31, 1990 abandoned, A Power up Detection now 892,388 filed May 27, 1992 Circuit 561,536 filed July 31, 1990 A Power Up Reset Circuit 560,662 filed July 31, 1990 A Substrate Bias Generator System 560,542 filed July 31, 1990 abandoned, A Voltage Level now 908,633 filed July 2, 1992 Detection Circuit 560,720 filed July 31, 1990 abandoned, A Circuit and Method now 933,972 filed August 24, 1992 for Two Stage Redundancy Decoding 560,935 filed July 31, 1990 abandoned, A Method for Initalizing now 892,390 filed May 27, 1992 Redundant Circuitry 560,646 filed July 31, 1990 A Voltage Driver Circuit ______________________________________

FIELD OF THE INVENTION

This invention is in the field of integrated circuits, and is more specifically related to memory devices.

BACKGROUND OF THE INVENTION

The development of VLSI semi-conductor devices of the Dynamic Random Access Memory (DRAM) type is well known. Over the years, the industry has steadily progressed from DRAMS of the 16K type (as shown in the U.S. Pat. No. 4,081,701 issued to White, McAdams and Redwine), to DRAMS of the 64K type (as shown in U.S. Pat. No. 4,055,444 issued to Rao) to DRAMS of the IMB type (as shown in U.S. Pat. No. 4,658,377 issued McElroy), and progressed to DRAMS of the 4 MB type. The 16 MB DRAM, wherein more than 16 million memory cells are contained on a single semiconductor chip is the next generation of DRAMs scheduled for production.

In designing VLSI semiconductor memory devices of the 16 MB DRAM type, designers are faced with numerous challenges. One area of concern is power consumption. The device must be able to power the increased memory cells and the supporting circuits. However, for commercial viability, the device must not use excessive power. The power supplies used and the burn in voltage for the part must also be compatible with the thin gate oxides in the device.

Another area of concern is the elimination of defects. The development of larger DRAMS has been fostered by the reduction in memory cell geometries, as illustrated in U.S. Pat. No. 4,240,092 to KUO (a planar capacitor cell) and as illustrated in U.S. Pat. No. 4,721,987 to Baglee et. al. (a trench capacitor cell). The extremely small geometries of the 16 MB DRAM will be manufactured using sub-micron technology. The reduction in feature size has meant that particles that previously did not cause problems in the fabrication process, now can cause circuit defects and device failures.

In order to ameliorate defects, redundancy schemes have been introduced. The redundancy schemes normally consist of a few extra rows and columns f memory cells that are placed within the memory array to replace defective rows and columns of memory cells. Designers need new and improved redundancy schemes in order to effectively and efficiently repair defects and thereby increase yields of 16 MB DRAM chips.

Another area of concern is testing. The device must have circuits to allow for the industry standards 16 X parallel tests. In addition, other circuits and test schemes are needed for internal production use to verify operability and reliability.

The options that the device should have is another cause for concern. For instance, some customers require a X1 device, while others require a X4 device. Some require an enhanced page mode of operation. Additionally, it is yet undecided whether the DRAM industry will maintain 4096-cycle refresh, or move towards a lower number of refresh cycles.

Another cause for concern is the physical layout of the chip. The memory cells and supporting circuits must fit on a semiconductor chip of reasonable size. The size of the packaged device must be acceptable to buyers.

New design strategies and circuits are required to meet the above concerns, and other concerns, relating to the development of the next generation, and to future generations, of Dynamic Random Access Memory devices.

It is an object of this invention therefore, to provide a method such that during testing of the memory devices it can easily be determined if the devices remain in the stress test.

Other objects and advantages of this invention will become apparent to those of ordinary skill in the art, having reference to the following specification, together with the drawings.

SUMMARY OF THE INVENTION

A test validation process for a semiconductor device applies signals indicating a test mode to the semiconductor device. The device produces output signals and the output signals are read to determine whether the device is in the indicated test mode. The test mode is conducted by operating the device. The output signals are read upon completion of the test mode to determine if the device is still in the indicated test mode. The test validation method is useful for memory chips and particularly Dynamic Random Access Memory, DRAM, devices that are burn-in stress tested.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 0.1 is a block system level drawing illustrating a 16 MB Dynamic Random Access Memory chip incorporating the preferred embodiment of the invention.

FIG. 0.11 is a graph orientation drawing illustrating how to connect FIGS. 0.11A1-0.11A5, FIGS. 0.11B1-0.11B5, FIGS. 0.11C1-0.11C5, FIGS. 0.11D1-0.11D5, FIGS. 0.11E1-0.11E5, FIGS. 0.11F1-0.11 F5, and FIGS. 0.11G1-0.11G5. The figures are oriented by lying the figures such that the A1-G5 reference characters of each figure is on the bottom left hand corner of the figure.

FIGS. 0.11A1-0.11A5, FIGS. 0.11B1-0.11B5, FIGS. 0.11C1-0.11C5, FIGS. 0.11D1-0.11D5, FIGS. 0.11E1-0.11E5, FIGS. 0.11F1-0.11 F5, and FIGS. 0.11G1-0.11G5, when connected together, form a block diagram drawing more particularly illustrating the DRAM of FIG. 0.1.

FIG. 0.2 is a top view drawing illustrating the pin designations of the packaged memory chip.

FIG. 0.3 is a three dimensional view of the packaged memory chip wherein the encapsulating material is rendered transparent.

FIG. 0.4 is an assembly view of FIG. 0.3.

FIG. 0.5 is a cross sectional view of FIG. 0.3

FIG. 0.6 is a top view drawing illustrating the bond pad designations of the memory chip.

FIG. 0.7 is a top view drawing illustrating a portion of the memory array.

FIG. 0.8 is a cross sectional view of a portion of the memory array.

FIG. 0.9 is a side view of the cross sectional view of FIG. 0.8.

Note: FIGS. 1 through 149 are electrical schematic drawings of various circuits of the 16 mb DRAM of FIG. 0.1 and FIG. 0.11. It is to be noted and understood that the prefix "X:" precedes the device reference characters illustrated in these FIGS. even though "X:" is not physically written on these drawings. "X:" corresponds to the FIG. number of the schematic. Codes for various of the electrical schematics are contained in the appendices. Appendices A53-A57 contain a signal from-to list for the electrical schematics. Unless the figures and the structural description indicates otherwise, it is to be presumed that the circuits are biased by the voltage Vperi.

FIG. 1 illustrates the RCL, or Row Clock Logic Circuit.

FIG. 2 illustrates the CL1, or Column Logic Circuit.

FIG. 3 illustrates the RBC, or Ras Before Cas Circuit. FIG. 4 illustrates the RBC.sub.-- RESET Circuit, or the Ras Before Cas Reset Circuit.

Note: there is no FIG. 5.

FIG. 6 illustrates the PADABUF Circuit, or the Pad Address Buffer Circuit.

FIG. 7 illustrates the RADR, or Row Address Driver Circuit.

FIG. 8 illustrates the BITCOUNT, or Bit Count Circuit.

FIG. 9 illustrates the RF, or Row Factor Circuit. Code in Appendix A1.

FIG. 10 illustrates the RLEN.sub.--, or Row Logic Enable Circuit.

FIG. 11 illustrates the RLXH, or Row Logic X (Word) High Circuit.

FIG. 12 illustrates the RDDR, or Row Decoder Driver Circuit. Code in Appendix A3.

FIG. 12.2 illustrates the BNKPC.sub.--, or Bank Select Pre-charge Circuit.

FIG. 13 illustrates the XDECM, or Row Decoder Circuit.

FIG. 14 illustrates the RRA, or Row Redundancy Address Circuit. Code in Appendices A5 and A7.

FIG. 15 illustrates the RRDEC, or Row Redundancy Decoder Circuit.

FIG. 16 illustrates the RRX, or Row Redundancy X Factor Circuit.

FIG. 17 illustrates the RRXE, Row Redundancy X Factor Emulator Circuit.

FIG. 18 illustrates the RRQS, or Row Redundancy Quadrant Select Circuit.

FIG. 19 illustrates the RXDEC, or Redundancy X (word) Decoder Circuit.

FIG. 20 illustrates the SDXWD, or Sense Clock X-Word Detect Circuit.

FIG. 21 illustrates the SDS1, or Master Sense Clock Circuit.

FIG. 22 illustrates the SDS2, or Sense Clock-2 Circuit.

FIG. 23 illustrates the SDS3, or Sense Clock-3 Circuit.

FIG. 24 illustrates the SDS4, or Sense Clock-4 Circuit.

FIG. 25 illustrates the BNKSL, or Bank Select Circuit. Code in Appendix A9.

FIG. 26 illustrates the BSS.sub.-- DR, or Bank Select Driver Circuit.

FIG. 27 illustrates the LENDBNKSL, or Left End Bank Select Circuit.

FIG. 28 illustrates the RENDBNKSL, or Right End Bank Select Circuit.

FIG. 29 illustrates the 11234, or Sense Clock 1234 Circuit.

FIG. 30 illustrates the PCNC, or P charge and N charge Circuit.

FIG. 31 illustrates the SA, or Sense Amplifier Circuit. Code in Appendix A11.

FIG. 32 illustrates the SA.sub.-- END, or Sense Amplifier End Circuit.

FIG. 33 illustrates the CABUF01, or Column Address Buffer 01 Circuit.

FIG. 34 illustrates the CABUF29, or Column Address Buffer 29 Circuit.

FIG. 35 illustrates the CLEN, or Column Logic Enable Circuit.

FIG. 36 illustrates the CF07, or Column Factor 0, 7 Circuit. Code in Appendix A13.

FIG. 36.1 illustrates the CF07DR, or Column Factor 0,7 Driver Circuit.

FIG. 36.2 illustrates the CF815, or Column Factor 8 thru 15 Circuit.

FIG. 37 illustrates the YDEC, or Y Decoder Circuit.

FIG. 37.1 illustrates the CRDEC, or Column Redundancy Coder Enable Circuit.

FIG. 38 illustrates the CRRA, or Column Redundancy Row Address Circuit. Code in Appendix A35.

FIG. 39 illustrates the CRCA, or Column Redundancy Address Circuit. Code in Appendices A37 and A39.

FIG. 40 illustrates the CRDEC.sub.--, or Column Redundancy Decoder Circuit.

FIG. 41 illustrates the CRY, or Column Redundancy Y Factor Circuit. Code in Appendix A41.

FIG. 42 illustrates the CRSS, or Column Redundancy Segment Select Circuit.

FIG. 43 illustrates the CRQS, or Column Redundancy Quadrant Circuit.

FIG. 44 illustrates the CRYS, or Column Redundancy Y Select Circuit.

FIG. 45 illustrates the CRIOS, or Column Redundancy I/O Select Circuit.

FIG. 46 illustrates the CRDPC, or Column Delay Redundancy Pre-Charge Circuit.

FIG. 47 illustrates the Column Address Transition Detector Circuit, CATD.

FIG. 48 illustrates the Column Logic Summation Circuit, CLSUM.

FIG. 49 illustrates the Column Sum Logic Driver Circuit, CLSUMDR.

FIG. 50 illustrates the Quadrant Select Circuit, QDDEC. Code in Appendix A15.

FIG. 51 illustrates the Global Amplifier Select End Circuit, GASELE. Code in Appendix A17 and A19.

FIG. 52 illustrates the Global Amplifier Select Circuit, GASEL.

FIG. 53 illustrates the Data Write Enable Signal Circuit, DWE.sub.--. Code in Appendix A21.

FIG. 54 illustrates the IOCLMP, or I/O Clamp Circuit. Code in Appendix A23.

FIG. 55 illustrates the Local I/O Amplifier Circuit, LIAMP. Code in Appendix A25.

FIG. 56 illustrates the Global I/O Amplifier Circuit, GIAMP. Code in Appendix A27.

FIG. 57 illustrates the I/O Multiplexor Circuit, IOMUX. Code in Appendix A29.

FIG. 58 illustrates the I/O Multiplexor 3 Circuit, IOMUX3.

FIG. 59 illustrates the Pre-Output Buffer Circuit, POUTBUF.

FIG. 59.1 illustrates the Pre-Output Buffer 3, POUTBUF3.

FIG. 60 illustrates the Output Buffer Circuit, OUTBUF. Code in Appendix A31.

FIG. 60.2 illustrates the Output Buffer 3 Circuit, OUTBUF3.

FIG. 60.3 illustrates WMO and CLX4 Generation.

FIG. 61 illustrates the Input Buffer Circuit, INBUF. Code in Appendix A33.

FIG. 62 illustrates the Input Buffer 3 Circuit, INBUf3.

FIG. 63 illustrates the I/O Control Logic Circuit, IOCTL.

FIG. 64 illustrates the I/O Control Logic Circuit, IOCTL3.

FIG. 65 illustrates the W1 or Write Clock 1 Circuit.

FIG. 66 illustrates the WBR or Write Before RAS Circuit.

FIG. 67 illustrates the Read Before Write Pulse Circuit RBWP.sub.--.

FIG. 68 illustrates the Write Before RAS Pulse Circuit WBRP.

FIG. 69 illustrates the Read Write Logic Enable Circuit RWLEN. FIG. 70 illustrates the Control Logic Read Master Circuit CLRMX.sub.--.

FIG. 71 illustrates the Data Enable Circuit DEN.sub.--.

FIG. 72 illustrates the TMDLEN Circuit, or the Test Mode Data Enable Circuit

FIG. 73 illustrates the Write Logic Master Circuit WLMX.

FIG. 74 illustrates the Internal Output Enable Clock 1 Circuit G1.

FIG. 75 illustrates the Early Write Circuit LATWR.sub.--.

FIG. 76 illustrates the Control Logic Output Enables Circuit CLOE.

FIG. 77 illustrates the Voltage Bandgap Reference Generator Circuit VBNDREF.

FIG. 78 illustrates the Voltage Multiplier Circuit VMULT.

FIG. 79 illustrates the Voltage Burn In Circuit VBIN.

FIG. 80 illustrates the VDD Clamp Circuit VDDCLAMP.

FIG. 80.1 illustrates the Voltage Clamp Circuit VCLMP.

FIG. 81 illustrates the Voltage Level Multiplier VLMUX.

FIG. 82 illustrates the Voltage Array Buffer Circuit VARYBUF.

FIG. 83 illustrates the Voltage Periphery Buffer Circuit VPERBUF.

FIG. 84 illustrates the Voltage Array Driver Circuit VARYDRV.

FIG. 85 illustrates the Voltage Periphery Driver Circuit VPERDRV.

FIG. 86 illustrates the Voltage Array Driver Standby Circuit VARYDRVS.

FIG. 87 illustrates the Voltage Periphery Driver Standby Circuit VPERDRVS

FIG. 88 illustrates the Voltage Regulator Control Logic for Standby Circuit VRCTLS.

FIG. 88.1 illustrates the Voltage Regulator Control Logic for Array Circuit VRCTLA.

FIG. 88.2 illustrates the Voltage Regulator Control Logic for Periphery Circuit VRCTLP.

FIG. 88.3 illustrates the Voltage Regulator Control Logic for Control Circuit VRCTLC.

FIG. 89.0 illustrates the Voltage Regulator VBB0 Level Detector Circuit Zero Level Detector Circuit VRVBB0.

FIG. 90 illustrates the Voltage Bit Line Reference Circuit VBLR.

FIG. 90.1 illustrates the Bit Line Reference Switch Circuit, BLRSW.

FIG. 90.2 illustrates the Voltage Top Plate Generator, VPLT.

FIG. 90.3 illustrates the Voltage Top Plate Switch, VPLTSW.

FIG. 90.4 illustrates the BIHO Circuit.

FIG. 90.5 illustrates the VREFINIT circuit.

FIG. 90.6 illustrates the VDDREF, or VDD Reference Circuit.

FIG. 91 illustrates the DFT Over Voltage Circuit, TLOV.

FIG. 92 illustrates the DFT Over Voltage Latch Circuit, TVOVL.

FIG. 93 illustrates the DFT initialized Circuit, TLINI.

FIG. 94 illustrates the DFT Ras.sub.-- Only Refresh Circuit, TLROR.

FIG. 95 illustrates the DFT Exit Circuit, TLEX.

FIG. 96 illustrates the DFT Jedec Mode Circuit, TLJDC.

FIG. 97 illustrates the DFT Row Address Latch Circuit, TLRAL. Code in Appendix A45.

FIG. 98 illustrates the DFT Address Key Decoder Circuit, TLKEY.

FIG. 99 illustrates the DFT Storage Cell Stress Latch Circuit, TLSCSL.

Note: There is no FIG. 100.

FIG. 101 illustrates the DFT Mode Circuit, TLMODE.

FIG. 102 illustrates the DFT Parallel Test Data High Circuit, TLPTDH.

FIG. 103 illustrates the DFT Jedec Multiplex Circuit, TLJDCMX.

FIG. 104 illustrates the DFT Parallel Test Expected Data Circuit, TLPTED.

FIG. 105 illustrates the DFT Parallel Test X1 Circuit, TLPTX1.

FIG. 106 illustrates the DFT Word Line Comparator Circuit, TLWLC.

FIG. 106.1 illustrates the DFT Word Line Leakage OR Gate Circuit, TLWLOR.

FIG. 107 illustrates the DFT Word Line Leakage Multiplexor Circuit, TLWLLMX.

FIG. 108 illustrates the DFT Redundancy Signature Circuit, TLRS. FIG. 109 illustrates the DFT Row Redundancy Roll Call Circuit, TLRCALL.

FIG. 110 illustrates the DFT Column Redundancy Row Call Circuit, TLCCALL.

FIG. 111 is a Block Diagram illustrating the VBB Circuits.

FIG. 112 illustrates the Low Power Oscillator Circuit, LPOSC.

FIG. 113 illustrates the VBB Low Power Pump Circuit, VBBLPP.

FIG. 114 illustrates the High Power Oscillator Circuit HPOSC.

FIG. 115 illustrates the VBB High Power Pump Circuit, VBBHPP.

FIG. 116 illustrates the Power up Boost Oscillator Circuit, BOSC.

FIG. 117 illustrates the VBB Booster Pump Circuit, VBBPB.

FIG. 118 illustrates the VBB Detector Circuit, VBBDET.

FIG. 119 illustrates the Level Detector Circuit, LVLDET.

FIG. 120 illustrates the Power Up Detector Circuit, PUD.

FIG. 121 illustrates the Pre Reset and Initialization Detector Circuit, PRERID.

FIG. 122 illustrates the CREDSP Circuit.

FIG. 123 illustrates the RRDSP Circuit.

FIG. 124 illustrates the Row Redundancy Address Test Circuit, RRATST.

FIG. 125 illustrates the TPLHO Circuit, or the Top Plate Holdoff Circuit.

FIG. 126 illustrates the TTLCLK Circuit, or the TTL Clock Circuit.

FIG. 127 illustrates the RS Latch, RSQ.

FIG. 128 illustrates the RS Latch, RS.

FIG. 129 illustrates the RS Latch, RS.sub.-- 3.

FIG. 130 illustrates the TLPTSELA Circuit.

FIG. 131 illustrates the Multiplexor Circuit, SMUX.

FIG. 132 illustrates the Delay Element, SDEL1.

FIG. 133 illustrates the Delay Element SDEL2.

FIG. 134 illustrates the Delay Element SDEL2EXT.

FIG. 135 illustrates the Delay Element SDEL4.

FIG. 136 illustrates the logic Circuit XNOR.

FIG. 137 illustrates the Level Shift Circuit, LVLSHF.

FIG. 138 illustrates the Buffer Circuit, TTLADD.

FIG. 139 illustrates the Buffer Circuit, TTLDATA.

FIG. 140 illustrates the Sample and Hold Circuit, SAMHLD.

FIG. 141 illustrates the NAND Gate, NAND4.

FIG. 142 illustrates the NAND gate NAND3.

FIG. 143 illustrates the NAND gate NAND2.

FIG. 144 illustrates the NOR Gate NOR3.

FIG. 145 illustrates the NOR Gate NOR2.

FIG. 146 illustrates the Inverter INV.

FIG. 147 illustrates the Inverter INVL.

FIG. 148 illustrates the Circuit ESD.

FIG. 149 illustrates the Circuit ESD.sub.-- VEXT.

FIG. 150 is a block diagram illustrating the memory cell addressing sequence.

FIG. 151 is a block diagram illustrating the sense amp configuration for a memory quadrant.

FIG. 152 is a block diagram further illustrating a portion of the sense amp configuration for a memory quadrant.

FIG. 153 is a block diagram further illustrating a portion of the sense amp configuration for a memory quadrant.

FIG. 154 is a system level diagram illustrating the Local I/O to Global I/O decoding for one quadrant of memory.

FIG. 155 is a partial block diagram of the row addressing scheme.

FIG. 156 is a partial block diagram of the column addressing scheme.

FIG. 157 is read cycle timing diagram.

FIG. 158 is an early write cycle timing diagram.

FIG. 159 is a write cycle timing diagram.

FIG. 160 is a read-write cycle timing diagram.

FIG. 161 is an enhanced page-mode read cycle timing diagram.

FIG. 162 is an enhanced page-mode write cycle timing diagram.

FIG. 163 is an enhanced page-mode read-write cycle timing diagram.

FIG. 164 is a RAS.sub.-- only refresh cycle timing diagram.

FIG. 165 is an automatic CAS.sub.-- before RAS.sub.-- refresh cycle timing diagram.

FIG. 166 is a hidden refresh cycle (READ) cycle timing diagram.

FIG. 167 is a hidden refresh cycle (WRITE) cycle timing diagram.

FIG. 168 is a test mode entry (WCBR) cycle timing diagram.

FIG. 169 is a partial block diagram illustrating the data path during a read operation.

FIG. 170 is a partial block diagram illustrating the data path during a write operation.

FIG. 171 is a flow chart of the inital power up sequence of the memory chip.

FIG. 172 is a flow chart of the inital power up sequence of the memory chip with an established substrate bias voltage Vbb.

FIG. 173 is a general flow and timing diagram of the substrate bias voltage Vbb.

FIG. 174 is a signal diagram of the LVLDET circuit 119.

FIG. 175 is a system level block diagram illustrating the DRAM of FIG. 0.1 incorporated into a computer system.

DESCRIPTION OF THE APPENDICES

Note: The information contained in the Appendices is incorporated by reference into this application.

APPENDIX A1 depicts the table of Row Factor codes. The Row Factor codes showed the relationship between the RF signals and the RAX, RAW signals. The RFR signals are outputs of the twelve instances of schematic 9.0.

APPENDIX A3 depicts the Row Decoder Driver codes. The Row Decoder Driver circuit shown in schematic 12.0 is used 32 times in each of the four quadrants of the circuit. The RDDR.sub.-- CODE table depicted in Appendix A3 explains the relationships between the output signals, RDj0k0 through RDj7k3, to the signals in each quadrant.

APPENDICES A5 and A7 depict the Row Redundancy Address codes in two tables, the first labeled RRA.sub.-- CODE1 and the second labeled RRA.sub.-- CODE2. Schematic 14.0, the Row Redundancy Address circuit, is used 120 times in the chip. Tables RRA.sub.-- CODE1 and RRQA.sub.-- CODE2, shown in appendix pages A5 and A7 respectively, illustrate how the 120 instances of the RRA circuit are used in the chip to produce 120 output signals labeled RRA0-RRA119.

APPENDIX A9 depicts the Bank Select Codes. The Bank Select Codes illustrate how the 15 instances of the BNKSL circuit, schematic 25.0, are used to produce 16 unique outputs for each quadrant.

APPENDIX A11 depicts the Sense Amplifier codes. The SA circuit, schematic 31.0, is used 7,680 times in each quadrant. The SA.sub.-- CODE table illustrates how these instances of the SA circuit are connected.

APPENDIX A13 depicts the Column Factor Codes. The Column Factor codes illustrate how the Column Factor circuits are used. There are 8 instances of the column factor circuits CF07, schematic 36.0, eight instances per quadrant of column factor drivers circuit CF07DR, schematic 36.1, and eight instances of the column factor circuits CF815, schematic 36.2. The CF.sub.-- CODE table illustrated in Appendix A13 indicates how these circuits are connected.

APPENDIX A15 depicts the Quadrant Select Codes. The Quadrant Select Codes illustrate the decoding scheme for the selection of the active quadrant. The quadrant select circuit is illustrated in schematic 50.0. Referring to the QDDEC.sub.-- CODE table one may determine which of the four quadrants is the currently selected quadrant according to the schematic 50.0.

APPENDIX A17 and A19 illustrate the codes for the Global Amplifier Select End circuit and the Global Amplifier Select circuit, respectively. The Global Amplifier Select circuits perform a one of eight decode. The codes shown in the appendix pages, in combination with schematic pages 51.0 and 52.0, illustrate how the decoding is done.

APPENDIX A21 depicts the Data Write Enable codes. The Data Write Enable codes illustrate how the DWE.sub.-- circuit, depicted on schematic 53.0, is used in each of the four quadrants. The circuit DWE.sub.-- is repeated eight times for each quadrant. The table on this appendix allows the reader to determine how these date Write Enable lines are connected.

APPENDIX A23 illustrates the I/O clamp codes. There are 34 instances of the IOCLMP circuit, depicted on schematic 54.0, in each quadrant. The IOCLMP.sub.-- CODE table illustrated in Appendix A23 depicts how the 34 instances of the circuit are distributed in each quadrant. Appendix page A25 illustrates the Local IO Amplifier codes. The LIAMP circuit, depicted on page 55.0 of the schematic, is used 34 times in each quadrant. Appendix page A25 contains the LIAMP.sub.-- CODE table, which details how the 34 instances of the LIAMP circuit are distributed in each quadrant.

APPENDIX A27 depicts the Global IO Amplifier codes. The Global IO amplifier circuit, illustrated on FIG. 56.0, is used eight times in each of the four quadrants. The table on Appendix A27, GIAMP.sub.-- CODE, details how the eight GIAMP circuits in each quadrant are connected.

APPENDIX A29 illustrates the IOMUX.sub.-- CODE table. The IOMUX circuit, illustrated on FIG. 57.0, is used in three quadrants, quadrant 0, 1 and 2. The IOMUX.sub.-- CODE table details how each instance of the IOMUX circuit is connected.

APPENDIX A30 depicts the POUTBUF.sub.-- CODE table. The POUTBUF circuit, illustrated on FIG. 59.0 is used in three quadrants, quadrants 0, 1, and 2. The POUTBUF.sub.-- CODE table details how each instance of the POUTBUF circuit is connected.

APPENDIX A31 depicts the OUTBUF.sub.-- CODE table. The OUTBUF circuit, illustrated on FIG. 60.0, is used in three of the four quadrants, quadrants 0, 1 and 2. The table on this page of the Appendix, OUTBUF.sub.-- CODE, details how each of the three circuits is connected.

APPENDIX A33 depicts the INBUF.sub.-- CODE table. The INBUF circuit, illustrated on FIG. 61.0, is used in three of the four quadrants, quadrants 0, 1 and 2. The table on page A33 depicts how each of the three occurrances of the INBUF circuit are connected.

APPENDIX A35 illustrates the Column Redundancy Row Address Code table. The Column Redundancy Row Address Code table is used to depict how the circuit CRRA, illustrated on FIG. 38.0, is used in the DRAM. The CRRA circuit is used 36 times in the DRAM, and the table CRRA.sub.-- CODE depicted on Appendix page A35 details how the 36 instances of the circuit are connected.

APPENDICES A37 and A39 depict the CRCA.sub.-- CODE tables. The Column Redundancy Column Address Circuit, illustrated on FIG. 39.0, is used 96 times in the DRAM. The tables on Appendix pages A37 and A39 detail how the 96 occurances of the CRCA circuit are connected.

APPENDIX A41 illustrates the CRYS.sub.-- CODE table. The CRYS circuit, illustrated on FIG. 44.0, is used 24 times in the DRAM. The CRYS.sub.-- CODE table depicted on Appendix page A41 details how the 24 occurances of the CRYS circuit are connected.

APPENDIX A43 illustrates the substrate characterization data. The substrate pump system on the DRAM, or the VBB system, is depicted in several FIGS. previously described. The substrate pump characterization data shows timing and power information for the substrate pump circuits.

APPENDIX A45 depicts the decoding for the DFT test logic Row Address Latch circuit, which is illustrated on FIG. 97.0, labeled TLRAL. The table on the Appendix page A45 shows the output values of the circuit TLRAL for several combinations of the inputs.

APPENDIX A47 describes the CATD circuit operation, illustrated on FIG. 47.0.

APPENDIX A48 depicts the function of the Row Address-6 blocks of the circuit illustrated on FIG. 155.

APPENDIX A49 depicts the function of the Column Address-6 blocks illustrated on FIG. 156.

APPENDIX A50 illustrates timing cycle data for the DRAM.

APPENDIX A51 describes the functions of selected blocks used on FIG. 178.

APPENDIX A52 is a table illustrating the state functions of the array driver and the periphery driver circuitry.

APPENDICES A53 to A57 contain the signal from-to list for the DRAM. The first column contains the signal name. The second and third columns contain the circuit name and corresponding FIG. number that the signal is output from. The fourth and fifth columns contain the circuit name and the corresponding FIG. number that the signal is input to.

APPENDIX A58 contains a name decoding scheme for the electrical schematics described in the figures. Those electrical schematics that are used multiple times are shown only once in the figures. APPENDIX A58 depicts how to determine the names of signals connected to a particular instance of a replicated circuit.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

FIG. 0.1 illustrates a 16 Megabit Dynamic Random Access Memory Chip referred to as a 16 MB DRAM. The chip size is about 325.times.660 mm. The chip is partitioned into four memory array quadrants. Each memory array quadrant contains 4 Megabits. A 4 MB memory array quadrant contains 16 memory blocks. Each memory block contains 256 Kilobits. The Column Decoders lie along the vertical axis of the chip adjacent to their respective memory array quadrants. The ROW decoders lie along the horizontal axis of the chip, adjacent to their respective memory array quadrants. The periphery circuits containing such devices as the input and output buffers and the timing and control circuits are centrally located along both horizontal the vertical axis of the chip. The bond pads are centrally located along the horizontal axis of the chip.

FIG. 0.11 is a graph orientation drawing illustrating how to connect FIGS. 0.11A1-0.11A5, FIGS. 0.11B1-0.11B5, FIGS. 0.11C1-0.11C5, FIGS. 0.11D1-0.11D5, FIGS. 0.11E1-0.11E5, 0.11F1-0.11F5, and FIGS. 0.11G1-0.11G5. These figures are connected by placing them flat so that the A1-G5 reference characters of each figure are on the bottom left hand corner. The connected figures form a top view block diagram of the 16 MB DRAM of FIG. 0.1.

FIG. 0.2 is a top view drawing illustrating the package/pin out of the device. The chip is center bonded and encapsulated in a thin plastic, small outline J-type package. Among other features, the DRAM is bond programmable as either a X1 or a X4 device. The pin designations for both the X1 and X4 modes of operation are illustrated.

FIG. 0.3 is a three-dimensional view of the encapsulated chip wherein the encapsulating plastic is rendered transparent. The pin designations shown correspond to the X4 option. The TSOJ package is of the lead over chip with center bond (LOCCB) type. Basically, the chip lies underneath the lead fingers. A polyimide tape attaches the chip to the lead fingers. Gold wires are wire-bonded from the lead fingers to the center bonding pads of the chip.

FIG. 0.4 is an assembly view of the packaging concept and FIG. 0.5 is a cross-section view of the packaged device.

FIG. 0.6 is a diagram illustrating the names and sequence of the bond pads. The sequence for both the X1 and the X4 options are illustrated. EXT BLR is a pad that is for in-house only. The brackets, such as those for bond pad 4 and 25 indicate that this is a bond pad option.

General characteristics of the 16 MB DRAM device of FIG. 0.1 follow. The device receives external VDD of typically 5 volts. On chip internal voltage regulation powers the memory arrays at 3.3 volts and the periphery circuits at 4.0 volts to reduce power consumption and channel hot carrier effects. The substrate is biased at -2 volts. The organization is bond programmable X1/X4. The enhanced page mode is the main option, with a metal mask programmable option for a write per bit (data mask) operation. The main option for the refresh scheme is 4096 cycles at 64 ms. However, the DRAM is bond programmable for 2048 cycle refresh.

The DRAM has numerous design-for-test features. Test mode entry 1 is through WCBR with no address key for 16X internal parallel test with mode data compare. Test mode entry 2 is WCBR with over-voltage and address key only thereafter (8 volts on A11), Exit from test mode occurs from any refresh cycle (CBR or RAS only). Test mode entry 1 is the industry standard 16X parallel test. This test is similar to those use on the 1 MB and 4 MB DRAMS, except that 16 bits are compared simultaneously instead of 8 bits. The valid address keys are A0, A1, A2, and A6. Test mode entry 2 contains numerous tests. There is a 32X parallel test with data compare and a 16X parallel test with data compare. Different hexadecimal addresses are keyed for the different parallel tests. A storage cell stress test and a VDD margin test allows connection of the external VDD to internal VARY and VPERI through the P-channel devices. Other tests include a redundancy signature test, a row redundancy roll call test, a column redundancy roll call test, a row transfer test, a word-line leakage detection test, clear concurrent test modes, and a reset to normal mode. The DRAM also contains a test validation method that indicates if it has remained in a test mode.

Although not illustrated in FIG. 0.1, for clarity, the DRAM contains redundancy features for defect elimination. It has four redundant rows per 256K memory block. All four may be used at one time. There are 3 decoders per redundant row and 11 row addresses per redundant row decoder. It uses fuses for row redundancy with, on-average, 10 fuses blown for a single repair. The row redundancy uses a two stage programmable concept to more efficiently enable repair. There are 12 redundant columns per quadrant and four decoders per redundant column. There are 8 column addresses and 3 row addresses per decoder. The total fuse count for column repair is about, on average, 10 fuses blown for a single repair. Column redundancy also has a two-stage programmable feature to more efficiently enable repair.

FIG. 0.7 is a top view of the capacitor cell layout. The bit lines are poly-3 (TiSi.sub.2) polyside. No bitline reference is used and the bitlines are triple twisted for noise immunity. The bit line voltage is about 3.3 volts. The word lines are segmented poly-2. They are strapped every 64 bits with metal2. The memory cells are of the modified trench capacitor type and may be formed by a process such as disclosed in the following co-pending and co-assigned applications, all filed, Jul. 25, 1989:

Serial #385,441;

Serial #385,601;

Serial #385,328;

Serial #385,344; and

Serial #385,340.

Alternative suitable memory cells of the stacked trench-type are disclosed in co-pending and co-assigned application Serial #385,327 also filed Jul. 25, 1989.

In FIG. 0.7, the dimensions include a 1.6 um bit-line pitch by 3.0 um double word line pitch, with a cell size of about 4.8 um.sup.2 obtained through 0.6 micron technology. The trench opening is about 0.8 um.times.0.8 um. The trench-to-trench space is about 1.1 um and the trench depth is about 6.0 um. The dielectric is of nitride/oxide, having a thickness of about 65A. Field plate isolation is utilized. The transistors have thin gate oxide. FIG. 0.8 is a cross-sectional view of the modified trench capacitor cell and FIG. 0.9 is a side view of the trench capicator cell.

The structural description for the various circuits contained in the DRAM of FIG. 0.1 and the FIGS. 0.11A1 through 0.11G5 is given next. It is to be noted and understood that the prefix "X:" precedes the device reference characters in the circuits next described, wherein "X" corresponds to the FIG. number of the circuit. For clarity, "X:" is not physically written on these drawings. The codes the circuits having are contained in the Appendices. Appendices A53-A57 contain a signal from-to list for the electrical schematics. Appendix A58 is a signal description key for the signals used in the electrical schematics.

FIG. 1 is an illustration of the Row Clock Logic circuit, RCL. The Row Clock Logic circuit has four input signals and three output signals. The first input signal, EXREF, is coupled to the first input of the XTTLCLK block, which is labeled 1:XTTLCLK. The second input signal, RID, is coupled to the second input, not counting the VPERI supply connection of XTTLCLK, of the TTLCLK circuit through two serially connected delay elements; 1:XSDEL4, 1:XSDEL4.sub.-- 1 and 1:XSDEL4.sub.-- 2. The third input signal, RAS.sub.--, is coupled to the third input of the TTLCLK block. The fourth input signal, RAN, is coupled to the second input of the NAND gate 1:ND1 through the inverter 1:IV2.

The Row Clock Logic circuit has 3 output signals. Node 1:N1, the output signal of the TTTLCLK circuit, is coupled to the first output signal RL1 through three serially connected inverters; 1:IV1, 1:IV3, and 1:IV10. Node 1:N1, the output of the TTLCLK circuit, is further coupled to the output signal RL1.sub.-- through four serially connected inverters; 1:IV1, 1:IV4, 1:IV11, and 1:IV9. Node 1:N11, the output of the inverter 1:IV4, is coupled to the first input of NAND gate 1:ND1. The output of NAND gate 1:ND1 is coupled to the input of delay element 1:XDL4 through the inverter 1:IV5. The output of delay element 1:XDL4 is coupled to the first input of the switch 1:XSW1 through the delay element 1:XDL1. The output of delay element 1:XDL1 is further coupled to the second input of the SWITCH 1:SW1 through the delay element 1:XDL2. The output of the delay element 1:XDL2 is further coupled to the third input of the SWITCH 1:XSW1 through delay element 1:XDL3. The output of the SWITCH 1:SW1 is coupled to the output signal RL2 through three serially connected inverters; 1:IV6, 1:IV7, and 1:IV8.

FIG. 2 is an illustration of the Column Logic circuit, CL1. The Column Logic circuit has four input signals and three output signals. The first input signal, RL1, is coupled to the input of the inverter 2:IV1. The second input signal, EXREF, is coupled to the first input of the XTTLCLK circuit, which is labeled 2:XTTLCLK. The third input signal, CAS.sub.--, is coupled to the fourth input of the TTLCLK circuit. The fourth input signal, RID, is coupled to the second input of the TTLCLK circuit, coupled through the NOR gate 2:NR1 and the inverter 2:IV6. The output node of inverter 2:IV1 is coupled to the input of the delay element 2:XSDEL1.sub.-- 1, the B inputs of the SWITCHES 2:SW1 and 2:SW2, and the third input of the XTTLCLK circuit. The output of the delay element XSDEL1.sub.-- 1 is coupled to the A input of the switch 2:SW1 and to the A input of the SWITCH 2:SW2. The output of the SWITCH 2:SW1, node 2:N3, is coupled to the A inputs of the SWITCHES 2:SW3 and 2:SW4 through the delay element 2:XSDEL1.sub.-- 2. The output of the SWITCH 2:SW2 is coupled to the B inputs of the SWITCHES 2:SW3 and 2:SW4. The output of the switch 2:SW3 is coupled to the A inputs of the SWITCHES 2:SW5 and 2:SW6 through the delay element 2:XSDEL1.sub.-- 3. The output of the SWITCH 2:SW4 is coupled to the B inputs of the SWITCHES 2:SW5 and 2:SW6. The output of the SWITCH 2:SW5 is coupled to the A input of the SWITCH 2:SW7 through the delay element 2:XSDEL1.sub.-- 4. The output of the SWITCH 2:SW6. Node 2:N10 is coupled to the B inputs of the SWITCH 2:SW7. The output of the switch 2:SW7 is coupled to the input of the NAND gate 2:ND1 through the inverter 2:IV2. The output of the NAND gate 2:ND1 is coupled to the output signal RBC.sub.-- EN.sub.--. The output of the circuit TTLCLK node 2:N15 is coupled to the output signal CL1.sub.-- through 2 serially connected inverters; 2:IV3 and 2:IV4. The output of the block TTLCLK is further coupled to the input of the NAND gate 2:ND1. The output of the block TTLCLK is also coupled to the input of the NAND gate 2:ND2 through the inverter 2:IV5. The output of the SWITCH 2:SW7, node 2:N12, is coupled to the input of the NAND gate 2:ND2 through the inverter 2:IV2. The output of the NAND gate 2:ND2 is coupled to the output signal CBR.sub.-- EN.sub.--. The output signal CL1.sub.-- is further coupled to the input of the NOR gate 2:NR1.

FIG. 3 illustrates the RAS before CAS or RBC circuit. The RBC circuit has five input signals and six output signals. The first input signal, RBC.sub.-- EN.sub.--, is coupled to the first input of the NOR gate 3:NR1 and further coupled to the third input of the NAND gate 3:ND1. The second signal, CBR.sub.-- EN.sub.--, is coupled to the second input of the NOR gate 3:NR2. The third input signal, RID, is coupled to the first input of the NOR gate 2:NR4. The fourth input signal, RBC.sub.-- RESET, is coupled to the second input of the NOR gate 3:NR4. The fifth input signal, TLRCOPY, is coupled to the third input of the RS latch circuit RS.sub.-- 3; which is labeled 3:XRS.sub.-- 3. The output of the NOR gate 3:NR4 is coupled through the inv