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Water laser plasma x-ray point source and apparatus
   
Document Number
US Patent 5459771
Issued Date
October 17, 1995
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Abstract
A high repetition-rate laser plasma target source system and lithography system is disclosed. The target source system comprises in a preferred embodiment a liquid tank source and freezer which freezes microscopic particles into crystal shapes which are projected by a nozzle jet from a high repetition rate liquid-droplet injector into the path of a flashing laser beam, which results in producing soft x-rays of approximately 13 nm. Uncollected and unshot target crystals are collected and reliquified by a heater source in order to be recycled back to the liquid tank source. Optionally an auxiliary source and detector system can be used to allow for instantaneous triggering of the laser beam. The target source system can be incorporated into well known EUV lithography systems for the production of wafer chips.
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Water laser plasma x-ray point source and apparatus - US Patent 5459771 Drawing
Drawing from US Patent 5459771
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Number of Claims:
16
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Published
October 17, 1995
Application Number
08/222,608
Filed
April 1, 1994
US Classification
378/119   347/1 378/143
Int'l Classification
G03F   7/20   (20060101)   H05G   2/00   (20060101)  
Examiner
Assistant Examiner
Attorney/Law Firm
USPTO Field of Search
378/119   378/124   378/143  
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