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Cosmetic composition with choline derivative
   
Document Number
US Patent 5468475
Issued Date
November 21, 1995
Link
Inventors
Kano; Ai (Yokohama,JP)
Nakabayashi; Nobuo (Koganehara, Matsudo-shi, Chiba-ken,JP)
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Abstract
The cosmetic composition of this invention which is a 2-methacryloyloxyethylphosphorylcholine polymer (Poly MPC) in a preferable amount of 0.001% to 10% by weight based on the total weight of the cosmetic composition. The cosmetic composition can repair damage to the skin and hair, such as dryness, loss of luster, etc. and enhance the moisture preservation capability thereof. It also has a good feel when applied.
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Cosmetic composition with choline derivative - US Patent 5468475 Drawing
Drawing from US Patent 5468475
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Number of Claims:
5
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Owner
Pola Chemical Industries Inc. (Nakabayashi; Nobuo(
Published
November 21, 1995
Application Number
08/153,414
Filed
November 15, 1993
US Classification
424/70.16   424/78.03
Int'l Classification
A61K   8/72   (20060101)   A61K   8/81   (20060101)   A61K   9/127   (20060101)   A61Q   5/00   (20060101)   A61Q   19/00   (20060101)  
Examiner
Assistant Examiner
Priority Data
Nov 17, 1992 [JP] 4-306751
USPTO Field of Search
424/401   424/63   424/64   424/69   424/70.1   424/70.16   424/401   424/78.03  
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A composition for hydrogels which comprises (A1) a copolymer which comprises 25 to 97 mol % of unit (a) derived from a compound represented by formula (1) and 3 to 75 mol % of unit (b) derived from a monomer represented by formula (2) and is soluble in aqueous media and (B) a polymer which has hydrophilic groups such as hydroxyl or carboxyl groups and is soluble in aqueous media; and a hydrogel comprising the composition. (X represents a divalent organic residue; Y represents alkyleneoxy, etc.; Z, R.sup.1, R.sup.2, R.sup.3, R.sup.4, and L.sup.2 each represents hydrogen, etc.; and L.sup.1 represents --C.sub.6 H.sub.4 --, etc.) ##STR1##

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Description
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