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Claims  |
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I claim:
1. A method for forming a temporary attachment between a semiconductor die
and a substrate, comprising the steps of:
placing a metal paste, composed of substantially spherical metallic
nodules, upon a contact pad of the substrate;
partially melting the metal paste at approximately a lowest melting
temperature of the metal paste to obtain a first partial liquidus region
to partially fuse the spherical metallic nodules together;
aligning an interconnect protrusion on an active surface of the
semiconductor die to the contact pad; and
reheating the metal paste at approximately a lowest melting temperature of
the metal paste to obtain a second partial liquidus region to join the
interconnect protrusion to the contact pad with a tack joint to form an
electrical contact between the semiconductor die and the contact pad.
2. The method of claim 1, wherein the step of placing the metal paste is
performed through screen printing.
3. The method of claim 1, wherein the step of placing a metal paste is
performed by dispensing a solder paste composed of 20 wt % to 97 wt %
lead.
4. The method of claim 1, wherein the step of partially melting is
performed at a temperature substantially in a range of 183.degree. to
250.degree. C.
5. The method of claim 1, wherein the step of aligning the interconnect
protrusion comprises aligning a solder bump.
6. The method of claim 1, further comprising the step of:
testing the semiconductor die which is electrically connected to the
contact pad on the substrate.
7. The method of claim 6, further comprising the step of:
burning-in the semiconductor die.
8. A method for forming a temporary attachment between a semiconductor die
and a substrate, comprising the steps of:
placing a solder paste composed of substantially spherical solder nodules
upon a contact pad on the substrate;
partially melting the solder paste at approximately a lowest melting
temperature of the solder paste to get a first partial liquidus region
between the spherical solder nodules to partially fuse the spherical
solder nodules together;
aligning an interconnect protrusion on an active surface of the
semiconductor die to the contact pad; and
reheating the solder paste at approximately a lowest melting temperature of
the solder paste to get a second partial liquidus region to join the
interconnect protrusion to the contact pad with a tack joint to form an
electrical contact between the semiconductor die and the contact pad.
9. The method of claim 8, wherein the step of placing the solder paste is
performed through screen printing.
10. The method of claim 8, wherein the step of placing a solder paste is
performed by dispensing a eutectic solder paste composed of substantially
63 wt % tin and 37 wt % lead.
11. The method of claim 8, wherein the step of partially melting is
performed at substantially 183.degree. C.
12. The method of claim 8, wherein the step of aligning the interconnect
protrusion comprises aligning a solder bump containing 3 wt % tin.
13. The method of claim 8, further comprising the step of:
testing the semiconductor die which is electrically connected to the
contact pad on the substrate.
14. The method of claim 13, further comprising the step of:
burning-in the semiconductor die.
15. A method for testing a semiconductor die, comprising the steps of:
providing a test substrate having a pattern of conductive traces
terminating in a plurality of contact pads on a surface of the test
substrate;
placing a metal paste, composed of substantially spherical metallic
nodules, upon a contact pad of the plurality of contact pads;
partially melting the metal paste at approximately a lowest melting
temperature of the metal paste to obtain a first partial liquidus region
to partially fuse the spherical metallic nodules together;
aligning an interconnect protrusion on an active surface of the
semiconductor die to said contact pad having the metal paste thereon;
reheating the metal paste at approximately a lowest melting temperature of
the metal paste to obtain a second partial liquidus region to join the
interconnect protrusion to the contact pad with a tack joint to form an
electrical contact between the semiconductor die and the contact pad; and
testing the semiconductor die through contacting the pattern of conductive
traces on the test substrate.
16. The method of claim 15, wherein the step of placing the metal paste is
performed through screen printing.
17. The method of claim 15, wherein the step of placing a metal paste is
performed by dispensing a solder paste having a lead content of 20 wt % to
97 wt %.
18. The method of claim 17, wherein the step of partially melting is
performed at a temperature substantially in a range of 183.degree. to
250.degree. C.
19. The method of claim 15, wherein the step of providing a test substrate
comprises providing ceramic test substrate.
20. The method of claim 15, wherein the step of providing a test substrate
comprises providing printed circuit board test substrate. |
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Claims  |
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Description  |
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CROSS-REFERENCE TO RELATED APPLICATION
Related subject matter is disclosed in a pending U.S. patent application
Ser. No. 08/236,320 by Stuart E. Greet entitled "Semiconductor Device
Solder Bump Having Intrinsic Potential for Forming an Extended Eutectic
Region and Method for Making and Using the Same," filed on May 2, 1994 and
commonly assigned to assignee hereof.
1. Field of the Invention
The present invention generally relates to solder attachment of a
semiconductor die, and more specifically to a temporary attachment for
easy subsequent detachment.
2. Background of the Invention
Testing and burn-in of a controlled chip collapse connection (C4)
semiconductor die produces a "known good die" (KGD) which is rapidly
becoming a high demand item in the semiconductor industry for flip-chip
and multichip module applications. For the purposes of test and burn-in of
C4 dice, it is often necessary to temporarily attach the solder bumped
dice to test substrate carriers. Because of the unique nature of the
solder bumps, one must select an interconnection methodology that does not
alter the bump structure during the test and burn-in evaluation. It is
also important not to alter the nature of the C.sub.4 bumps on the
semiconductor die after those test and burn-in evaluations because these
bumps are then subsequently reflowed to permanently attach the KGD to the
next level interconnect. An additional constraint on test and burn-in
methods is the required easy separation of the C4 semiconductor die from
the test substrate to avoid destroying the solder bumps on the die after
the evaluations. This constraint precludes the use of permanent or
semi-permanent links that result from high temperature metallurgical
interconnection techniques. Moreover, the choice of interconnect
metallurgies must be such that detrimental contaminants are not
transferred to the bump from the substrate or become an integral part of
the bump as a result of the attachment and detachment processes.
Currently, physical methods, such as piercing or abrasive connections, are
commonly used to link the C4 solder bumps to the test substrate. Piercing
connections involve needle-like probes on the substrate that pierce into
the bumps to make the physical contact between the substrate and the die.
Abrasive connections on the other hand involve rubbing the bumps against
roughened or texturized surfaces on the substrate in order to make
multiple mating mini contacts between the die and the substrate. Positive
spring forces are often applied between the bump and the substrate to help
maintain physical contact. However, since the solder bumps become
extremely soft during high temperature burn-in, there is difficulty in
retaining electrical continuity even when positive spring forces are
applied. Moreover, there is a tendency for the solder bumps to become
flattened as a result of these physical methods, which is an undesirable
consequence of testing. Often these solder bumps must undergo a high
temperature (350.degree. C.-360.degree. C.) reflow process after test and
burn-in to reshape the bumps into the characteristic rounded shape that
end users expect. This additional processing can be detrimental to the
die. Furthermore, if the bumps are severely damages or deformed, they may
not recover their shape even at these reflow temperatures. Moreover, cycle
time is increased as well as cost. Thus, these physical methods are
inefficient or inadequate for reliable testing purposes since the critical
positive electrical contact during all phases of the test and burn-in
evaluation cannot be guaranteed.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. I is a lead-tin phase diagram illustrating the different solidus and
liquidus regions as a function of temperature and weight percent tin.
FIG. 2 is a magnified photograph of a portion of a substrate having a
conductive trace terminating in a contact pad with a metal paste thereon,
in a first step in practicing an embodiment of the invention.
FIG. 3 illustrates, in a cross-sectional view, a semiconductor die having
interconnect protrusions on an active surface which are aligned to the
contact pads of the substrate, in a subsequent step of practicing the
invention.
FIG. 4 illustrates, in a cross-sectional view, a temporary attachment
between the semiconductor die and the substrate, in a subsequent step of
practicing the invention.
FIG. 5 is a scanning electron microscope (SEM) micrograph of a contact pad
having spherical solder nodules which have been partially fused together,
in an experiment using the method of the invention.
FIG. 6 is a magnified photograph of a solder ball which has been removed
from the substrate after being temporarily attached thereto to illustrate
the efficacy of the present invention.
FIG. 7 is a magnified photograph of a contact pad on substrate after the
solder ball of FIG. 6 has been removed to illustrate the efficacy of the
present invention.
DETAILED DESCRIPTION OF A PREFERRED EMBODIMENT
The present invention describes a method of selectively forming nodular
protrusions on substrate interconnections using metal pastes fabricated of
the same metals as contained in the bumps present on the C4 semiconductor
chips. The nodules are uniquely formed on the wettable portion of the
substrate fingers or contact pads by dispensing the metal paste onto the
fingers, and then heating the nodules to a predetermined temperature where
they only partially melt. The partial liquid region permits bonding of the
individual metal nodules to the contact pads and to adjacent paste
nodules. This partial bonding allows the metal nodules to still protrude
above the substrate contact pad. Different solder compositions and heating
temperatures can provide optimum combinations of protrusion height and
wetting of the metal paste to the substrate. A bumped semiconductor die
can then be temporarily attached to the partially bonded nodules through
what is effectively a tack joint.
Generally solder bumped semiconductor dice are placed over the partially
bonded nodules and heated to a minimum temperature required to partially
remelt and locally join to the bumps. Because the metallurgical contact
area between the paste nodules and the chip bumps is minimized, electrical
contact can be sustained with only a small cross-sectional area of
connected material. This tack joint creates an electrically sound but
physically weak link between die and the substrate. Once connected to the
substrate, the dice may be tested and burned-in according to
specification. After test and burn-in are completed, the dice can be
removed with little residual damage to the bumps themselves.
These and other features, and advantages, will be more clearly understood
from the following detailed description taken in conjunction with the
accompanying drawings. It is important to point out that the illustrations
may not necessarily be drawn to scale, and that there may be other
embodiments of the present invention which are not specifically
illustrated.
What follows is a method for forming a temporary attachment between a
solder bump on a semiconductor die and a nodular metallic paste pre-placed
on a metallic contact pad on a substrate. FIG. 1 is a metallurgical phase
diagram 10 for lead-tin alloys. Phase diagram 10 illustrates the different
solidus and liquidus regions of the alloy as a function of temperature and
weight percent (wt. %) tin. When an alloy of approximately 63 wt. % tin is
heated from room temperature to approximately 183.degree. C., a eutectic
(lowest melting) liquid is formed. This phase transition from solid to
liquid is utilized to practice one embodiment of the present invention as
will be discussed later. One can choose a starting material of this
composition as the metal paste placed on a substrate. However, the
invention is in no way limited to the use of a eutectic lead-tin solder.
Other starting alloys, specifically those between 20 wt. % tin and 97 wt.
% tin can offer more flexibility in the nodule formation and nodule attach
steps since they form partially solid/partially liquid "2-phase" regions
above 183.degree. C. This 2-phase region means that they will retain their
spherical structure over a significant span of temperatures above
183.degree. C., whereas the eutectic material will become fully liquidized
and melted above 183.degree. C. Hence, non-eutectic alloys may be more
robust, allowing a wider process window, in this application since
retention of the substantially spherical shape of the partially melted
nodules is important. Additionally, other metal alloy pastes may also be
used in practicing the invention to achieve the same results.
In accordance with the invention, a metal paste is first placed onto
contact areas on a carrier substrate. FIG. 2 is a magnified photograph 20
of a portion of a carrier substrate having conductive traces with a metal
paste on contact pads. The conductive traces and contact pads or fingers
are wettable portions, typically composed of copper, plated copper or
nickel-gold. A metal paste, preferably lead-tin solder or another suitable
metal alloy, has been dispensed onto the contact pads or fingers. The
amount of paste dispensed can vary. As can be seen, the paste is composed
of substantially spherical nodules. It is important to ensure that the
size of the nodules composing the metal paste is chosen so that a minimum
number of nodules are left on the substrate finger or contact pad. At
least 1 nodule must be dispensed on the finger for the invention method to
work. However, covering the entire finger with metallic nodules is also
feasible. The metal paste is typically applied through a metal mask that
is pre-aligned to the finger area of the substrate, though other methods
can be used to place the metal paste such as automated micro-dispensers or
syringes. Once the paste material is dispensed, the substrate is heated to
an optimum temperature where the nodules begin to coalesce and wet to the
substrate fingers, but without collapsing into a single fused droplet of
solder on the substrate finger. Hence, the individual nodules retain their
substantially spherical shape after partial joining. This optimum
temperature is a function of the starting paste alloy material. For a
eutectic solder, this temperature is approximately 183.degree. C.,
although in a given process, .+-.2.degree. C. is common. For solders
having 20 wt. % tin to less than 63 wt. % tin (eutectic), the process
window is much wider, meaning that the temperature can be much higher than
183.degree. C. for the partial joining.
This phenomenon can best be explained by referring to the phase diagram 10
in FIG. 1, where the liquid+solid region 12 is the operating region for
the partial joining process. The operating window can be anywhere between
183.degree. C. and approximately 250.degree. C. for a 20 wt. % tin solder.
The operating window narrows as more tin is added to the solder until the
eutectic solder is fairly confined to the 183.degree. C..+-.2.degree. C.
window mentioned above. Moving across the diagram to the next liquid+solid
phase region 14, one can see that again the operating window widens to the
maximum workable solder having 97 wt. % tin which would have an operating
window between 183.degree. C. and approximately 225.degree. C.
One advantage to the preceeding processing steps is that once the paste
nodules are partially bonded together and wetted to the contact pads or
fingers on the substrate, the substrate may be stored for an extended
period of time before it is used or the substrate may be used immediately
for chip attach as discussed below.
FIGS. 3-4 illustrate, in cross-sectional view, the subsequent steps in
practicing the invention. FIG. 3 illustrates a semiconductor die 32 having
interconnect protrusions 34 on an active surface which are aligned to the
contact pads 40 of the substrate 38. The interconnect protrusions 34 are
typically solder bumps which have been formed on the bonding pads 36 on
the die surface. Methods of forming C.sub.4 solder bumps are well known in
the art. The contact pads or fingers 40 have the metal paste 42 already
pre-placed thereon. As shown the metal paste is composed of substantially
spherical individual nodules 44. These nodules have been partially fused
together, at just the tangents of the nodules, to provide a continuous
electrical path through the paste 42 down to the contact pad 40 as
discussed above.
Then in FIG. 4 the semiconductor die is joined to the nodular paste on the
substrate. The joint between the solder bump 34 and the metal paste 42 is
effectively a tack joint to provide a temporary attachment between the
semiconductor die and the substrate. This joining process is performed
through reheating the nodular paste at the predetermined optimum
temperature to form a partial liquidus region at the outer skin of the
nodules. This liquidus region then joins the solder bump to the paste
along a small portion of the bottom of the bump as illustrated by contact
area 46.
Once the semiconductor die is attached to the substrate in the above
manner, the die can then be tested and burned-in according to
specification. A major advantage to the present method of attachment is
that no additional positive spring pressure is needed to help maintain
continuous contact between the die and the substrate. The physically
relatively weak solder joints at the tangent of the solder bump to the
underlying paste nodules provide sufficient contact to maintain electrical
continuity for testing and burn-in evaluations.
After these evaluations, the tested KGD can be easily removed from the
carrier substrate without significant deformation to the solder bump. The
removal step is usually performed by the local application of heat,
physical application of tensile or shear stress or by local freezing with
a gas such as CO.sub.2. FIG. 6 is a magnified photograph of a solder ball
which has been removed from the test substrate after being temporarily
attached thereto in accordance with the above disclosed method. The
photograph shows how a small attach cross-sectional area has been achieved
using the above-described methodology and how the bump has retained its
substantially spherical shape throughout the process. Any solder material
remaining on the solder bump can be redistributed onto the bump by an
additional low temperature (183.degree. C.-220.degree. C.) reflow. A high
temperature reflow, such as those required in the prior art is not
required. FIG. 7 is a magnified photograph of the mating contact pad on
substrate after the solder ball of FIG. 6 has been removed. As can be seen
the removed solder paste left only a small footprint on the contact pad.
This site can be "dressed" to remove excess solder so that the substrate
can be reused for testing of another bumped die.
EXPERIMENTAL RESULTS
Several different solder pastes have been used in the reduction to practice
of the present invention. The pastes ranged from a eutectic composition of
lead-tin (63 wt. % tin, 37 wt. % lead) to an alloy mix of 60% tin and 40%
tin. It is important to ensure that the paste nodule size is chosen so
that a minimum number of spheres are left on the substrate finger. Using
nodule diameters in-the range of 1.0 mil to 1.5 mils (25 to 38 microns)
provided the optimized combination of adhesion to 5 mil (127 micron)
substrate fingers and a tack joint between the nodules. It was observed
that pastes that contain "fines" (very small particle sizes) interspersed
into a larger nodule size tend to mat together and are unsuitable for
forming successful nodular structures because the "fines" melted and
coalesced too quickly as compared to the larger sized nodules. As a
practical matter, an acceptable range for the nodule diameter could be
between 1 to 4 mils (25 to 100 microns). The upper limit is defined by
the size of the contact pad because at least 1 nodule must be on the pad
in order for the invention to work.
For the eutectic and 60% tin alloy pastes, a furnace temperature of
183.degree. C. .+-.1.degree. C. was selected for the solder paste attach
step. This operating temperature window was just sufficient to wet the
material to the substrate finger without altering the spherical shape of
the paste nodules in any significant way. The dwell time of this first
partial melting process above the critical phase transition temperature
was between 45 and 60 seconds. However, it should be understood that the
dwell time is dependent on a given paste metallurgy and the furnace used.
The semiconductor dice used to evaluate the attach process had solder bumps
that contained 3% tin. These solder bumps melt at approximately
320.degree. C., as can be seen from the phase diagram 10 in FIG. 1. The
bumps were aligned to and placed on the contact pads on the substrate. The
substrate and die were then heated to 183.degree. C..+-.1.degree. C. to
effect localized metallurgical joining without full reflow of either the
solder bumps or the nodular solder paste.
In all these experiments, the dice were removed from the substrates by
gently tensile pulling on the dice after verification of electrical
continuity between the dice and substrate. However, other methods of
removal, such as the local application of heat, physical application of
tensile or shear stress or by local freezing with a gas such as CO.sub.2,
would probably be used in a manufacturing environment. Additionally, in
normal practice these dice would be electrically tested, burned-in and
removed for shipment after these operations were completed. If required,
the dice could be subjected to an additional low temperature (183.degree.
to 220.degree. C.) heat cycle to distribute any low melting material
transferred from the paste nodules onto the solder bump.
The foregoing description and illustrations contained herein demonstrate
many of the advantages associated with the present invention. In
particular, it has been revealed that a temporary electrical joint can be
formed between a solder bumped semiconductor die and a substrate carrier
by first placing a number of metallic nodules on a substrate finger by
carefully heating a pre-applied solder paste to a point where it partially
melts, yet retains its spherical shape. Then solder bumps on a C4 die can
be aligned to and placed onto these nodules. The contacting bumps and
nodules are then reheated to a predetermined lowest melting temperature of
the nodules to form a tack joint between the nodules and the bumps. The
temporary attachment allows electrical test and burn-in to be performed
without requiring any of the mechanical methods such as piercing or
abrasive connections and external positive spring forces. By using this
technique one can obtain good electrical contact across small
cross-sectional interfaces between the solder nodules and the chip solder
bump. Since the joint is through a small cross-sectional interface, this
interface can be broken very easily after test and burn-in without causing
extensive damage to the solder bumps or to the contact pads on the
substrate.
Thus it is apparent that there has been provided, in accordance with the
invention, a method for forming a temporary attachment between a
semiconductor die and a substrate that fully meets the need and advantages
set forth previously. Although the invention has been described and
illustrated with reference to specific embodiments thereof, it is not
intended that the invention be limited to these illustrative embodiments.
Those skilled in the art will recognize that modifications and variations
can be made without departing from the spirit of the invention. For
example, the invention is applicable to other solder systems where low
melting alloys can be merged with high temperature bump metallurgies to
form temporary attachments. These may include indium, bismuth, and gallium
based solders. Furthermore, the invention can be extended to nodular
deposition methods that use "solder-jet" spraying techniques onto the
substrates. These are small droplets of solders that are dispensed from a
heated spray gun to form protrusion on a substrate. In addition, the
invention is not limited to attaching a die to a test substrate, but can
be extended to attaching a die to a product board. The procedure would
involve attaching a semiconductor die for the purposes of testing and
burn-in. If the die is determined to be electrically good after test, it
could be locally heated onto the board to form a permanent connection. On
the other hand, if the die failed test, it could be removed and replaced
with a fresh die and the test cycle repeated. It is also important to note
that the present invention is not limited in any way to attaching a bumped
die to any particular type of substrate. For example, the substrate could
be either ceramic or an organic printed circuit board. Furthermore, the
invention is not limited to any particular type or shape of solder bumps
on the semiconductor die. The method of temporary attachment would work
equally well for spherical-shaped solder bumps as well as cone-shaped
solder bumps. Therefore, it is intended that this invention encompasses
all such variations and modifications falling within the scope of the
appended claims.
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