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| United States Patent | 5504348 |
| Link to this page | http://www.wikipatents.com/5504348.html |
| Inventor(s) | Yoshida; Mamoru (Kunitachi, JP);
Sasaki; Makoto (Tokyo, JP);
Okimoto; Hiroyuki (Hino, JP);
Nomoto; Tsutomu (Hachioji, JP);
Sato; Shunichi (Kawagoe, JP) |
| Abstract | A thin film transistor array comprises an insulative substrate, a plurality
of pixel electrodes arranged in a matrix on the insulative substrate, a
plurality of thin film transistors connected respectively to the pixel
electrodes, a plurality of address lines formed on the insulative
substrate, each address line being connected to a plurality of control
electrodes of the thin film transistors, and a plurality of data lines
arranged on the insulative substrate in such a manner as to intersect the
address lines, each data line being connected to a plurality of data input
electrodes of the thin film transistors. A short-wiring is formed on the
outside of a display region on the insulative substrate on which the pixel
electrodes are arranged, and the short-wiring is connected to at least two
of the address lines and the data lines by a two-terminal element having
non-linear resistance characteristics defining voltage/current
characteristics on the basis of a space charge limited current. |
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Title Information  |
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Drawing from US Patent 5504348 |
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Thin-film transistor array and liquid crystal display device using the
thin-film transistor array |
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| Publication Date |
April 2, 1996 |
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| Filing Date |
March 20, 1995 |
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| Parent Case |
This application is a Continuation of application Ser. No. 08/102,457,
filed Aug. 5, 1993, now abandoned. |
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| Priority Data |
Aug 13, 1992[JP]4-215971
Aug 13, 1992[JP]4-215972
Dec 28, 1992[JP]4-347603
Dec 28, 1992[JP]4-347605
Dec 28, 1992[JP]4-347606 |
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Title Information  |
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References  |
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| *references marked with an asterisk below are user-added references |
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U.S. References |
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| | Reference | Relevancy | Comments | Reference | Relevancy | Comments | 5311040 Hiramatsu 257/57 May,1994 |      Your vote accepted [0 after 0 votes] | | 5233448 Wu 349/40 Aug,1993 |      Your vote accepted [0 after 0 votes] | | 5220443 Noguchi 349/40 Jun,1993 |      Your vote accepted [0 after 0 votes] | | 5200876 Takeda 361/56 Apr,1993 |      Your vote accepted [0 after 0 votes] | | 5184235 Sukegawa 349/40 Feb,1993 |      Your vote accepted [0 after 0 votes] | | 5081687 Henley
Jan,1992 |      Your vote accepted [0 after 0 votes] | | 5068748 Ukai
Nov,1991 |      Your vote accepted [0 after 0 votes] | | 5053347 Wu 438/157 Oct,1991 |      Your vote accepted [0 after 0 votes] | | 5019002 Holmberg 445/24 May,1991 |      Your vote accepted [0 after 0 votes] | | 4836650 Morin 349/50 Jun,1989 |      Your vote accepted [0 after 0 votes] | | 4667189 den Boer 345/90 May,1987 |      Your vote accepted [0 after 0 votes] | | | | | |
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Technical Review  |
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Claims  |
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What is claimed is:
1. A thin film transistor array comprising:
an insulative substrate;
a plurality of pixel electrodes arranged in a matrix above the insulative
substrate, said pixel electrodes being arranged in a display region of the
array;
a plurality of thin film transistors connected to the pixel electrodes,
respectively;
a plurality of address lines formed on or above said insulative substrate
and having connection terminals for connection with a driver circuit at a
region outside the display region in which said pixel electrodes are
arranged, each address line being connected to a plurality of control
electrodes of said thin film transistors;
a plurality of data lines arranged on or above the insulative substrate in
such a manner as to intersect with the address lines and having connection
terminals for connection with a driving circuit at a region outside the
display region in which said pixel electrodes are arranged, each data line
being connected to a plurality of data input electrodes of said thin film
transistors;
each of said thin film transistors comprising a gate electrode formed on
said insulative substrate, said gate electrode serving as the control
electrode, a gate insulating film covering the gate electrode, a first
semiconductor film, a drain electrode formed on one side of the first
semiconductor film via an ohmic contact layer and connected to a
corresponding one of said data lines, said drain electrode serving as the
data input electrode, and a source electrode formed on another side of the
first semiconductor film via another ohmic contact layer and connected to
a corresponding one of said pixel electrodes;
the gate insulating films of the thin film transistors comprising one
common insulating film formed in substantially an entire display region of
said insulative substrate;
at least one address line short-circuiting conductor in a region of the
insulative substrate outside the display region in which said pixel
electrodes are arranged, and connected to said address lines by respective
thin film two-terminal elements, said two-terminal elements each having
non-linear resistance characteristics; and
at least one data line short-circuiting conductor, insulated from said at
least one address line short-circuiting conductor, formed on a region of
the insulative substrate outside the display region in which said pixel
electrodes are arranged, and connected to said data lines by respective
thin film two-terminal elements, said two-terminal elements each having
non-linear resistance characteristics;
said at least one address line short-circuiting conductor and said at least
one data line short-circuiting conductor being formed inside of a terminal
arrangement section in which the connection terminals of the address lines
and the data lines are arranged; and
each of said two-terminal elements comprising:
a second semiconductor film which is formed on the common insulating film;
a first electrode formed on one side of the second semiconductor film and
connected to one of said data and address lines;
a second electrode formed on another side of the second semiconductor film
and connected to one of said short-circuiting conductors;
an ohmic contact layer between said first electrode and said second
semiconductor film; and
another ohmic contact layer between said second electrode and said second
semiconductor film.
2. A liquid crystal display device comprising:
a first insulative substrate;
a plurality of pixel electrodes arranged in a matrix above the first
insulative substrate;
a plurality of thin film transistors connected to the pixel electrodes,
respectively;
a plurality of address lines formed on or above the first insulative
substrate, each address line being connected to a plurality of control
electrodes of said thin film transistors, said address lines being
supplied with address signals for successively selecting the address
lines;
a plurality of data lines arranged on or above the first insulative
substrate so as to intersect the address lines, each data line being
connected to a plurality of data input electrodes of said thin film
transistors, said data lines being supplied with data signals
corresponding to display data to be displayed and having a potential
waveform inverted at predetermined cycles;
at least one short-circuiting wire formed on or above the first insulative
substrate and outside of a display region in which the pixel electrodes
are arranged, wherein at least two lines of said plurality of address
lines and at least two lines of said plurality of data lines are connected
to said at least one short-circuiting wire by respective two-terminal
elements, said two-terminal elements each having non-linear resistance
characteristics;
a short-wiring driver, connected to said at least one short-circuiting
wire, for applying a predetermined potential to said at least one
short-circuiting wire;
a second insulative substrate opposed to a surface of said first insulative
substrate, said second insulative substrate having a surface provided with
at least one opposed electrode opposed to said pixel electrodes; and
a liquid crystal layer of a predetermined thickness interposed between said
first and second insulative substrates;
wherein said short-wiring driver supplies to said at least one
short-circuiting wire a potential which is synchronized with an inverted
cycle of said data signals supplied to the data lines and is inverted with
the same potential and same phase as the data signals with reference to a
potential applied to the at least one opposed electrode formed on the
second substrate.
3. A liquid crystal display device comprising:
a first insulative substrate;
a plurality of pixel electrodes arranged in a matrix above the first
insulative substrate;
a plurality of thin film transistors connected to the pixel electrodes,
respectively;
a plurality of address lines formed on or above the first insulative
substrate, each address line being connected to a plurality of control
electrodes of said thin film transistors, said address lines being
supplied with address signals for successively selecting the address
lines;
a plurality of data lines arranged on or above the first insulative
substrate so as to intersect the address lines, each data line being
connected to a plurality of data input electrodes of said thin film
transistors, said data lines being supplied with data signals
corresponding to display data to be displayed and having a potential
waveform inverted at predetermined cycles;
at least one short-circuiting wire formed on or above the first insulative
substrate and outside of a display region in which the pixel electrodes
are arranged, wherein at least two address lines of said plurality of
address lines and at least two data lines of said plurality of data lines
are connected to said at least one short-circuiting wire by respective
two-terminal elements, said two-terminal elements each having non-linear
resistance characteristics;
a short-wiring driver, connected to said at least one short-circuiting
wire, for applying a predetermined potential to said at least one
short-circuiting wire;
a second insulative substrate opposed to a surface of said first insulative
substrate, said second insulative substrate having a surface provided with
at least one opposed electrode opposed to said pixel electrodes; and
a liquid crystal layer of a predetermined thickness interposed between said
first and second insulative substrates;
wherein said short-wiring driver supplies to said at least one
short-circuiting wire a potential which is synchronized with said data
signals supplied to the data lines and is inverted with the same potential
and opposite phase as the data signals, with reference to a potential
applied to the at least one opposed electrode formed on the second
substrate.
4. A thin film transistor array comprising:
an insulative substrate;
a plurality of pixel electrodes arranged in a matrix above the insulative
substrate, said pixel electrodes being arranged in a display region of the
array;
a plurality of thin film transistors connected to the pixel electrodes,
respectively;
a plurality of address lines formed on or above said insulative substrate
and having connection terminals for connection with a driver circuit at a
region outside the display region in which said pixel electrodes are
arranged, each address line being connected to a plurality of control
electrodes of said thin film transistors;
a plurality of data lines arranged on or above the insulative substrate in
such a manner as to intersect with the address lines and having connection
terminals for connection with a driving circuit at a region outside the
display region in which said pixel electrodes are arranged, each data line
being connected to a plurality of data input electrodes of said thin film
transistors;
at least one address line short-circuiting conductor in a region of the
insulative substrate outside the display region in which said pixel
electrodes are arranged, and connected to only said address lines; and
at least one data line short-circuiting conductor, insulated from said
address line short-circuiting conductor, formed on a region of the
insulative substrate outside the display region in which said pixel
electrodes are arranged, and connected to only said data lines; and
wherein:
said at least one address line short-circuiting conductor and said at least
one data line short-circuiting conductor are formed inside of a terminal
arrangement section in which the connection terminals of the address lines
and the data lines are arranged; and
said address lines and said data lines are connected to said at least one
address line short-circuiting conductor and to said at least one data line
short-circuiting conductor by respective thin film two-terminal elements
having non-linear resistance characteristics.
5. A thin film transistor array according to claim 4, wherein:
said at least one address line short-circuiting conductor comprises two
first short-circuiting wirings formed along opposed edges of said display
region;
at least two of said address lines are connected to each of the first
short-circuiting wirings;
said at least one data line short-circuiting conductor comprises two second
short-circuiting wirings formed along opposed edges of said display
region; and
at least two of said data lines are connected to each of the second
short-circuiting wirings.
6. A thin film transistor array comprising:
a plurality of pixel electrodes arranged in a matrix above the insulative
substrate, said pixel electrodes being arranged in a display region of the
array;
a plurality of thin film transistors connected to the pixel electrodes,
respectively;
a plurality of address lines formed on or above said insulative substrate
and having connection terminals for connection with a driver circuit at a
region outside the display region in which said pixel electrodes are
arranged, each address line being connected to a plurality of control
electrodes of said thin film transistors;
a plurality of data lines arranged on or above the insulative substrate in
such a manner as to intersect with the address lines and having connection
terminals for connection with a driving circuit at a region outside the
display region in which said pixel electrodes are arranged, each data line
being connected to a plurality of data input electrodes of said thin film
transistors;
at least one address line short-circuiting conductor in a region of the
insulative substrate outside the display region in which said pixel
electrodes are arranged, and connected to only said address lines; and
at least one data line short-circuiting conductor, insulated from said
address line short-circuiting conductor, formed on a region of the
insulative substrate outside the display region in which said pixel
electrodes are arranged, and connected to only said data lines; and
wherein:
said at least one address line short-circuiting conductor and said at least
one data line short-circuiting conductor comprise:
first short-circuiting wirings formed inside of a terminal arrangement
section in which the connection terminals of the address lines and the
data lines are arranged, wherein said address lines and said data lines
are connected to said first short-circuiting wirings by respective thin
film two-terminal elements having non-linear resistance characteristics;
and
second short-circuiting wirings formed outside of the terminal arrangement
section, wherein said address lines and said data lines are connected to
said second short-circuiting wirings.
7. A thin film transistor array according to claim 4, wherein said thin
film two-terminal elements each include:
a double-injection type thin film non-linear resistor element in which
holes and electrons are injected as carriers, said double-injection type
thin film non-linear resistor element comprising a semiconductor film of a
non-doped hydrogenated amorphous silicon film formed on or above the
insulative substrate, said semiconductor film having two ends;
a first electrode formed on one end of said semiconductor film and
connected to one of said data and address lines; and
a second electrode formed on another end of said semiconductor film and
connected to one of said short-circuiting conductors.
8. A thin film transistor array according to claim 4, wherein said thin
film two-terminal elements each include:
a thin film non-linear resistor element in which electrons are injected as
a carrier, said thin film non-linear resistor element comprising a
semiconductor film of a non-doped hydrogenated amorphous silicon film
formed on or above the insulative substrate, said semiconductor film
having two ends;
two n-type amorphous silicon films doped with n-type impurities and
respectively formed at both ends of said semiconductor film;
a first electrode formed on one of said n-type amorphous silicon films and
connected to one of said data and address lines; and
a second electrode formed on the other of said n-type amorphous silicon
films and connected to one of said short-circuiting conductors. |
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Claims  |
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Description  |
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BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a thin-film transistor array used in a
liquid crystal display (LCD) device, in which display electrodes connected
to thin-film transistors are arranged in a matrix, and an LCD apparatus
using the thin-film transistor array.
2. Description of the Related Art
There has conventionally been known an active matrix type liquid crystal
display device using a thin film transistor array (hereinafter referred to
as "TFT-LCD") in which thin film transistors ("TFT") and pixel electrodes
are arranged in a matrix.
An example of such a conventional TFT-LCD is disclosed in Jpn. Pat. Appln.
KOKAI Publication No. 59-166984. FIG. 32 shows an equivalent circuit of
the TFT array used in this TFT-LCD.
As is shown in FIG. 32, in the TFT array, address lines 2 and data lines 3
are arranged in rows and columns on a transparent insulating substrate 1
such that the address lines 2 intersect the data lines 3 at right angles.
TFTs 4 having their gates connected to the address lines 2 and their
drains connected to the data lines 3 are arranged in a matrix at the
intersections of the address lines 2 and data lines 3. Pixel electrodes 5
connected to the sources of the TFTs 4 are arranged in a matrix. A
short-wiring or short-ring 6 is formed on an outer peripheral portion of
the transparent insulating substrate 1 along the outer periphery of the
substrate 1. The data lines and address lines 3 electrically are connected
to the short-wiring 6 via their terminal portions 2a and 3a.
After the processing of the TFT array is completed, the substrate 1 is cut
along broken lines 7 shown in FIG. 32. Then, the substrate 1 is bonded to
an opposed substrate having opposed electrodes with a predetermined gap
therebetween, and a liquid crystal material is sealed between these
substrates. Thus, an LCD device is formed.
In the manufacturing process of this TFT array, a DC static electricity
occurs while the substrate is exposed to a plasma or subjected to a
rubbing process. However, since all address lines 2 and data lines 3 are
connected to the short-wiring 6, the potential of all address lines 2 and
data lines 3 is equalized and it is possible to prevent a problem of
dielectric breakdown or short-circuit due to a discharge of static
electricity between electrodes.
However, in the manufacturing process of the conventional LCD device using
the TFT array, the TFT array is bonded to an opposed substrate via a
sealing member and then the short-wiring 6 is cut along broken lines 7 and
removed. Thus, owing to static electricity occurring in the subsequent
manufacturing steps of adhering a polarizing plate, connecting a driving
circuit, etc., there may occur dielectric breakdown, line breakage, a
characteristic variation of the TFTs, etc., resulting in a display defect
in the LCD device. Consequently, a manufacturing yield may deteriorate.
FIG. 33 shows a structure for preventing dielectric breakdown, etc. due to
static electricity in the LCD device after the TFT array is completed. A
short-wiring 8 is formed between a display region, in which the pixel
electrodes 5 connected to the TFTs 4 are arranged in a matrix, and a
terminal array section in which the terminal portions 3a of data lines 3
and the terminal portions 2a of address lines 2 are arranged, such that
the short-wiring 8 surrounds the display region. The short-wiring 8 is
connected to the data lines 3 and address lines 2 by protection elements 9
each comprising a plurality of diodes designed to have non-linear
current-voltage characteristics, as shown in FIG. 34.
In the TFT array having the protection elements 9, the protection elements
9 are turned on if static electricity occurs after the short-wiring 6
shown in FIG. 32 is cut and a high voltage is applied between the
short-wiring 6 and the data lines 3 and address lines 2. As a result, a
voltage difference between the data lines 3 and address lines 2 is
eliminated, and dielectric breakdown between the data lines 3 and address
lines 2 can be prevented.
The structure of the above-described protection elements, however, is
complex, and steps other than those for forming TFTs are required. Thus,
the number of steps for manufacturing the TFT panel increases and the
manufacturing yield of TFTs considerably deteriorates owing to the
increased steps.
The conventional TFT panels shown in FIGS. 32 and 33 have a problem in that
the TFT panel has a low electrostatic destruction preventing effect
against pulsatile static electricity, which is applied when the TFT panel
is handled by operators, when the TFT panel is put in contact with an
electrified manufacturing apparatus, when the rubbing roller approaches
the substrate, or when the substrate is cut, at which time most of
electrostatic destruction occurs.
Furthermore, in the TFT panel having the protection elements shown in FIG.
32, a leak current flows between the address lines 2 and data lines 3 via
the protection elements 9. Thus, much crosstalk occurs, the display
quality deteriorates and much current is consumed.
SUMMARY OF THE INVENTION
The object of the present invention is to provide a thin film transistor
array capable of reducing the possibility of the aforementioned display
defect due to static electricity of a liquid crystal display device,
increasing the yield, and decreasing power consumption with easy
manufacturing, and to provide a liquid crystal display device using the
thin film transistor array.
In order to achieve this object, there is provided a TFT array comprising:
a plurality of pixel electrodes arranged in a matrix on an insulative
substrate; a plurality of thin film transistors connected respectively to
the pixel electrodes; a plurality of address lines connected to a
plurality of control electrodes of the thin film transistors; and a
plurality of data lines arranged such a manner as to intersect the address
lines, each data line being connected to a plurality of data input
electrodes of the thin film transistors, wherein there are provided
short-wiring formed on the outside of a display region on which the pixel
electrodes are arranged, and a two-terminal element for connecting the
short-wiring to at least two lines of the address lines and the data
lines, the two-terminal element having non-linear resistance
characteristics defining voltage/current characteristics on the basis of a
space charge limited current.
According to this invention, the thin film non-linear resistor element can
be fabricated during the process of manufacturing the thin film transistor
(TFT), without providing any special manufacturing step. Thus, the
two-terminal element for preventing electrostatic breakdown can be formed
without increasing the number of manufacturing steps of the TFT panel.
Accordingly, the manufacturing yield of the TFTs can be increased.
In the present invention, it is desirable that the thin film non-linear
resistor element be a double-injection type thin film non-linear resistor
element in which holes and electrons are injected as carriers, or an
electron-injection type thin film non-linear resistor element in which
electrons are injected as a carrier. The double-injection type thin film
non-linear resistor element is formed by connecting electrodes to both
ends of an impurity-non-doped hydrogenated amorphous silicon film formed
on the insulative substrate. The electron-injection type thin film
non-linear resistor element is formed by connecting electrodes to both
ends of an impurity-non-doped hydrogenated amorphous silicon film formed
on the insulative substrate via an n-type amorphous silicon film doped
with n-type impurities.
According to another aspect of the invention, there is provided a TFT array
comprising: a plurality of pixel electrodes arranged in a matrix on an
insulative substrate; a plurality of thin film transistors connected
respectively to the pixel electrodes; a plurality of address lines
connected to a plurality of control electrodes of the thin film
transistors; and a plurality of data lines arranged such a manner as to
intersect the address lines, each data line being connected to a plurality
of data input electrodes of the thin film transistors, wherein there are
provided a plurality of electrically insulated short means formed on the
outside of a display region on the insulative substrate on which the pixel
electrodes are arranged, said short means being connected to at least two
of the address lines and the data lines.
According to this invention, the address lines are not connected to the
data lines via the short-wiring. Thus, a high potential is not applied
across the address line and data line owing to pulse-like static
electricity which occurs most frequently during the TFT manufacturing
process, and electrostatic breakdown can be prevented.
The above invention may have a structure wherein the short means is formed
outside the display region and inside the terminal arrangement section of
the address and data lines, and the short means is a two-terminal element
having non-linear resistance characteristics and is connected to the
address and data lines. In this case, the two-terminal element as the
short means may be connected between two or more address lines and two or
more data lines. Furthermore, the short-wiring may be formed outside the
terminal arrangement region of the address and data lines. The
short-wiring may be a two-terminal element having non-linear resistance
characteristics formed outside the display region and inside the terminal
arrangement region, and the two-terminal element may comprise first
short-wiring connected to the address and data lines and second
short-wiring formed outside the terminal arrangement region. Moreover, the
short-means may comprise the short-wiring formed outside the display
region and inside the terminal arrangement region and an outside
short-wiring formed outside the terminal arrangement region and connecting
the address lines and data lines.
According to still another aspect of the invention, there is provided a
liquid crystal display element which comprises the TFT array; a second
insulative substrate opposed to a surface of the first insulative
substrate, on which the TFT array is provided, with a liquid crystal layer
of a predetermined thickness being interposed, the second insulative
substrate having a surface provided with opposed electrodes opposed to the
pixel electrodes; and potential supply means, connected electrically to
the short means, for applying a predetermined potential to the short
means.
According to the liquid crystal display device of the invention, the
potential of the short means is set at a predetermined level, and
therefore a leak current flowing via the terminal element decreases, the
power consumption decreases, the crosstalk decreases, and the display
quality is enhanced.
In this display device, it is desirable that the potential applied to the
short means be substantially equal to a potential applied to the opposed
electrodes, be substantially equal to a lowest potential of the data
signal supplied to the data lines, or be a potential which is synchronized
with an inverted cycle of the data signal supplied to the data lines and
is inverted with the same potential and the same or opposite phase with
reference to a potential applied to the opposed electrodes formed on the
second substrate.
Additional objects and advantages of the invention will be set forth in the
description which follows, and in part will be obvious from the
description, or may be learned by practice of the invention. The objects
and advantages of the invention may be realized and obtained by means of
the instrumentalities and combinations particularly pointed out in the
appended claims.
BRIEF DESCRIPTION OF THE DRAWINGS
The accompanying drawings, which are incorporated in and constitute a part
of the specification, illustrate presently preferred embodiments of the
invention, and together with the general description given above and the
detailed description of the preferred embodiments given below, serve to
explain the principles of the invention.
FIG. 1 is a plan view showing a TFT array according to a first embodiment
of the present invention;
FIG. 2 is a cross-sectional view of a liquid crystal display (LCD) device
using the TFT array of the present invention;
FIG. 3 is a partially enlarged view showing a part of the TFT array shown
in FIG. 1;
FIG. 4 is a cross-sectional view of the TFT section taken along line IV--IV
in FIG. 3;
FIG. 5 is a partially enlarged view showing a two-terminal element portion
of the TFT array shown in FIG. 1;
FIG. 6 is a cross-sectional view of the two-terminal element portion taken
along line VI--VI in FIG. 5;
FIG. 7 is a graph showing voltage/current characteristics of the
two-terminal element shown in FIG. 6;
FIGS. 8A to 8E are views for illustrating sequential steps for
manufacturing the TFT portion of the TFT array;
FIGS. 9A to 9E are views for illustrating sequential steps for
manufacturing the two-terminal device portion of the TFT array;
FIGS. 10A to 10E are views for illustrating sequential steps for
manufacturing the intersection portions of the short-wiring and address
lines of the TFT array, and the connecting portions of the short-wiring;
FIG. 11 is a plan view showing a modification of the TFT array according to
the first embodiment;
FIG. 12 is a partially enlarged view showing a two-terminal device portion
of a TFT array according to a second embodiment of the invention;
FIG. 13 is a cross-sectional view of the two-terminal device portion taken
along line XIII--XIII in FIG. 12;
FIG. 14 is a graph showing voltage/current characteristics of the
two-terminal element shown in FIG. 13;
FIGS. 15A to 15E are views for illustrating sequential steps for
manufacturing the two-terminal device portion of the TFT array;
FIG. 16 is a cross-sectional view showing a modification of the TFT portion
according to the second embodiment of the invention;
FIG. 17 is a cross-sectional view showing a modification of the
two-terminal device portion according to the second embodiment of the
invention;
FIG. 18 is a plan view showing a TFT array according to a third embodiment
of the invention;
FIG. 19 is a plan view showing a first modification of the TFT array
according to the third embodiment;
FIG. 20 is a plan view showing a second modification of the TFT array
according to the third embodiment;
FIG. 21 is a plan view showing a TFT array according to a fourth embodiment
of the invention;
FIG. 22 is an enlarged plan view of a two-terminal device portion of the
TFT array shown in FIG. 21;
FIG. 23 is a cross-sectional view of the two-terminal device portion taken
along line XXIII--XXIII in FIG. 21;
FIG. 24 is a plan view showing a first modification of the TFT array
according to the fourth embodiment;
FIG. 25 is a plan view showing a second modification of the TFT array
according to the fourth embodiment;
FIG. 26 is a plan view showing a third modification of the TFT array
according to the fourth embodiment;
FIG. 27 is a plan view showing a fourth modification of the TFT array
according to the fourth embodiment;
FIG. 28 is a plan view showing a fifth modification of the TFT array
according to the fourth embodiment;
FIG. 29 schematically shows the structure of an LCD apparatus according to
a fifth embodiment of the invention;
FIG. 30 shows an equivalent circuit of the LCD apparatus, as viewed from
the connection terminal of one data line;
FIGS. 31A to 31D show voltage waveforms of signals applied to the
connection terminals of the lines LCD apparatus according to the fifth
embodiment;
FIG. 32 is a plan view showing a conventional TFT array;
FIG. 33 is a plan view showing another conventional TFT array; and
FIG. 34 is a graph showing V-I characteristics of the two-terminal device
used in the TFT array shown in FIG. 33.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
Embodiments of the present invention will now be described in detail with
reference to the accompanying drawings.
First Embodiment!
FIG. 1 is a plan view showing schematically the structure of a TFT array
according to a first embodiment of the present invention, and FIG. 2 is a
cross-sectional view of an active matrix type liquid crystal display
device (TFT-LCD) using the TFT array of the present invention.
As is shown in FIG. 2, a liquid crystal display (LCD) device using a TFT
array according to the present invention comprises a TFT array 110 having
an orientation film 20 formed to cover pixel electrodes 15 and TFTs 14, an
opposed substrate 24 having an opposed electrode 22 facing the pixel
electrodes 15 and an orientation film 23 covering the opposed electrode
22, a liquid crystal (LC) layer 21 with a predetermined thickness
interposed between the opposed substrate 24 and TFT array 110, and a seal
member for connecting the opposed substrate 24 and TFT array 110 with a
predetermined gap therebetween.
The TFT array 110 has the following structure. Address lines 12 extending
in rows and data lines 13 extending in columns are arranged on a
transparent insulative substrate 11 such that the address lines 12
intersect the data lines 13 at right angles in a mutually insulated
manner. TFTs 14 and pixel electrodes 15 are provided at intersections of
the address lines 12 and data lines 13. The TFTs 14 are electrically
connected to the lines 12 and 13, and the pixel electrodes 15 are
electrically connected to the TFTs 14. The pixel electrodes 15 are
arranged in rows and columns to form a display region.
A short-wiring or short-ring 16 made of an electrically conductive film is
formed at an outer peripheral portion of the substrate 11. The address
lines 12 and data lines 13 extend from the display region and electrically
are connected to the short-wiring 16. The short-wiring 16 is cut out along
broken lines 17 in FIG. 1, after the manufacturing process of the TFT
array 110 has been completed or after the opposed substrate 24 facing the
TFT array 110 has been bonded in the process of forming LC cells.
A short-wiring 18 surrounding the display region is formed in the vicinity
of the outer edge of the display region and within the cut-out lines 17,
such that the short-wiring 18 intersects the address lines 12 and data
lines 13 in an insulated manner. A data-line connection portion 18a of the
short-wiring 18, which is substantially parallel to the address lines 12,
is formed on the substrate 11. An address-line connection portion 18b of
the short-wiring 18, which is substantially parallel to the data lines 13,
is formed on a gate insulating film 42 (described later). The short-wiring
18 is connected to the address lines 12 and data lines 13 by two-terminal
elements (SCLC elements) 19 having non-linear voltage/current
characteristics determined by a space charge limited current.
FIGS. 3 and 4 show the structures of the TFT 14 and pixel electrode 15
arranged at an intersection between the address lines 12 and data lines 13
of the TFT array 110. As shown in these figures, the address lines 12
intersect the data lines 13 via gate insulating films 42 and intersection
insulating films 21 (described later). In the vicinity of the
intersection, there is provided TFT 14 having a gate electrode 41
connected to the address line 12 and a drain electrode 46 connected to the
data line 13. The source electrode of the TFT 14 is connected to the pixel
electrode 15.
The TFT 14 has the following structure. The gate electrode 41 projecting
from the address line 12 and the gate insulating film 42 covering the gate
electrode 41 are formed on the substrate 11. A semiconductor film 43 of
amorphous silicon is formed on the gate insulating film 42 at a location
above the gate electrode 41, and thus a device region is formed. A
blocking layer 44 of silicon nitride is formed on a channel portion of the
semiconductor film 43. On one side of the semiconductor film 43, the drain
electrode 46 is formed via an ohmic contact layer 45 made o | | |