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Claims  |
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I claim:
1. A semiconductor element assembly comprising:
(a) a non-planar substrate including a plurality of substrata, wherein said
plurality of substrata are interconnected to form a cavity;
(b) a semiconductor material coupled to said non-planar substrate, said
semiconductor material including a plurality of integrated circuits
interconnected for communication; and
(c) an operation supporting means for supporting the operation of the
semiconductor element assembly, wherein said operation supporting means is
disposed within said cavity.
2. The semiconductor element assembly of claim 1, wherein said non-planar
substrate is substantially curved.
3. The semiconductor element assembly of claim 1, wherein said non-planar
substrate is substantially conical.
4. The semiconductor element assembly of claim 1, wherein the said
non-planar substrate is substantially frustoconical.
5. The semiconductor element assembly of claim 1, wherein said non-planar
substrate is substantially spherical.
6. The semiconductor element assembly of claim 1, wherein said non-planar
substrate includes a three-dimensional surface connecting two circles
residing in different parallel planes.
7. The semiconductor element assembly of claim 1, wherein said operation
supporting means comprises a cooling means for cooling the semiconductor
element assembly.
8. The semiconductor element assembly of claim 1, wherein said operation
supporting means comprises a power supply means for providing power to the
semiconductor element assembly.
9. The semiconductor element assembly of claim 1, wherein said operation
supporting means comprises a coolant conduit means travelling through a
power supply means and abutting said non-planar substrate, wherein said
coolant conduit means contains a fluid coolant for cooling the
semiconductor element assembly.
10. The semiconductor element assembly of claim 1, further comprising:
(d) at least one electronic circuit fabricated on said semiconductor
material.
11. The semiconductor element assembly of claim 1, wherein said non-planar
substrate comprises a material selected from the group consisting of a
ceramic material, a pure carbon, and a silicon dioxide.
12. The semiconductor element assembly of claim 11, wherein said non-planar
substrate comprises silicon dioxide which is doped to match the lattice
structure of said semiconductor material.
13. The semiconductor element assembly of claim 1, wherein said
semiconductor material comprises a first semiconductor layer composed of
GaAs.
14. The semiconductor element assembly of claim 13, wherein the thickness
of said GaAs layer is in the range of 50-200 Angstroms.
15. The semiconductor element assembly of claim 13, wherein said
semiconductor material further comprises a second semiconductor layer
composed of materials selected from the group consisting of Si and GaAs.
16. The semiconductor element assembly of claim 1, further comprising:
(d) transmitting means coupled to said semiconductor material for
transmitting signals from said semiconductor material to a destination
external to said semiconductor material.
17. The semiconductor element assembly of claim 16, wherein said
transmitting means transmits light signals.
18. The semiconductor element assembly of claim 16, wherein said
transmitting means comprises an edge-emitting laser.
19. The semiconductor element assembly of claim 16, wherein said
transmitting means comprises a surface-emitting laser.
20. The semiconductor element assembly of claim 19, wherein said
surface-emitting laser includes a cone-shaped beam splitter.
21. The semiconductor element assembly of claim 16, wherein said
transmitting means further comprises a mirror for reflecting the signals
from said transmitting means.
22. The semiconductor element assembly of claim 1, further comprising:
(d) receiving means coupled to said semiconductor material for receiving
signals from a source external to said semiconductor material and
providing the signals to said semiconductor material.
23. The semiconductor element assembly of claim 22, wherein said receiving
means receives light signals.
24. The semiconductor element assembly of claim 22, wherein said receiving
means comprises a photo-sensitive element. |
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Claims  |
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Description  |
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BACKGROUND OF THE INVENTION
1. Technical Field
This invention relates generally to semiconductor technology, and in
particular, to a new microelectronic semiconductor technology, advanced
computer architecture, special electronic device architecture, and
affiliated highly efficient subsystems of cooling and power supply for
electronic circuits. Also the invention relates to a multiprocessor
network architecture and the methods to achieve maximum data throughput of
the network. Finally, the present invention relates to applications of the
above technology.
2. Description of the Prior Art
No signals, in any type of media, can propagate faster than the speed of
light. The propagation speed of signals in electronic circuitry in
conventional media currently cannot exceed one-half this rate due to the
factors associated with Resistance/Capacitance (RC) time constants, and
this speed is achievable only by applying comparatively large quantities
of power by signal transmitters that have to switch greater amounts of
current for faster recharging of the electrical capacitance of the
conductive media. These large amounts of electrical power create
inordinate amounts of heat in both the output switches and conductors,
which must be dissipated.
A better method of semiconductor and microchip interconnections is achieved
via fiber optics technology since the problems associated with RC time
delay do not apply. Although fiber optic interconnections offer some
degree of solutions to these problems, it is still necessary to minimize
the length of the conduction paths; and this is dependent upon the
topology and size of the electronic devices involved. Therefore, in order
to increase processing speed, the electronic components must be compressed
into an extremely compact arrangement, which also results in the
accumulation of an excessive amount of heat that must be dissipated.
Another problem affiliated with such a compact arrangement is that of the
creation of unwanted noise, and signal-to-signal and signal-to-power
interference resulting from the distribution of comparatively high
electric current inside a small volume. These phenomena require special
tracing for both power and signal conductors in high frequency circuits.
Most current computer research and development projects proceed along one
of two primary directions. One is that used in the manufacture of
supercomputers such as CYBER or CRAY, and the other is the design of
microsystems based on highly efficient, extremely fast microprocessors
similar to INTEL 80486, INTEL I-960 or Motorola MC-68000. Both of these
directions are limited, however, by the necessity of short, fast
interconnections between large numbers of microchips, boards and units,
and cooling requirements of all systems and each individual microchip and
power supply.
In most single and multiprocessor systems, all sub-unit interconnections
occur through either one, two or occasionally three system buses.
Therefore, at a single point in time, no more than two devices (active-bus
master and passive-slave) may share a bus, which severely restricts
inter-unit communications. This is probably the most consequential
limiting factor inherent in conventional computer design in that when the
bus is being used by one unit for one function, all other processes are
disconnected leaving valuable resources remaining idle.
One of the most recent classes of computational media is based on the
"transputers network". A transputer is a special processor, usually based
on very large scale integration (VLSI) technology, which has been assigned
a set of special instructions and includes input/output circuitry that
allows it to be interconnected directly with two or more other
transputers, thereby eliminating the need to share the system bus. Usually
a transputer network is controlled by a master processor that shares the
system bus with other units.
Transputers are designed to-perform specific tasks such as solving a series
of differential equations or similar exclusively designated function, the
results of which are used by the master processor. In spite of being
highly efficient in mathematical processing, transputers retain the same
weaknesses inherent in other microchips. They still require a supply of
electrical power, a method of heat dissipation, and conventional
interconnection with other chips, because the usual method of mounting the
chips is on the planar surface of a board.
The above-described shortcomings, and other shortcomings of prior art
semiconductor technology, are effectively overcome by the present
invention, as described in further detail below.
SUMMARY OF THE INVENTION
It is therefore an object of the present invention to provide an improved
and efficient semiconductor technology.
It is another object of the present invention to provide a semiconductor
technology having a short time of signal propogation.
It is another object of the present invention to provide a semiconductor
technology having short inter-element connections.
It is another object of the present invention to provide a semiconductor
technology having fast inter-element connections.
It is another object of the present invention to provide a semiconductor
technology allowing for more efficient heat dissipation.
It is another object of the present invention to provide a semiconductor
technology having a compact arrangement.
It is another object of the present invention to provide a semiconductor
technology having minimal inter-element interference.
It is another object of the present invention to provide a semiconductor
technology having an improved power supply system.
It is another object of the present invention to provide a semiconductor
technology having an improved cooling system.
It is another object of the present invention to provide a semiconductor
technology having an improved topology.
It is another object of the present invention to provide a semiconductor
technology having an improved architecture.
It is another object of the present invention to provide an application for
the herein-described improved semiconductor technology.
In accordance with the teachings of the present invention, a new technology
in semiconductor electronics is provided wherein basic semiconductor
elements (BSEs) are fabricated on the surfaces of hollow, cone-shaped
and/or other planar or non-planar substrata. Photosensitive and
photoemitting elements are included within each BSE capable of
transmitting and receiving signals to and from external sources in a
direction that is non-parallel (oblique) to the silicon surface and
circuitry plane. Inter-BSE communication are also achieved via fiber optic
connectors. In one embodiment, the BSEs may be assembled in an efficient
arrangement whereby some number of BSEs (for example, six (6)) are located
adjacent and surrounding another "polar" BSE, thereby providing for short
opto-electronic connections between the polar BSE and its neighbors. In
additional embodiments, a power supply may reside within the internal
space of the BSE, and the interior and exterior of the BSEs are designed
as opposite electrical poles, thereby providing power to the BSEs. A
highly effective method of cooling may also be provided by transferring
coolant within conduits into the interior of each BSE, through the power
supply and between the exterior of the internal power supply and the
substrata. The present invention may also be applied, in one embodiment,
to accept visual information in much the same way as the eye of an animal.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 shows a side view of a basic semiconductor element (BSE) having
interface lines for interfacing with other BSEs, according to one
embodiment of the present invention.
FIG. 2 depicts the development of the surface of the BSE of FIG. 1,
according to one embodiment of the present invention.
FIG. 3a shows two photocells on neighboring BSEs, as well as the paths of
light travelling between the two photocells, according to one embodiment
of the present invention.
FIG. 3b shows two photocells on neighboring BSEs, as well as the paths of
light travelling from one photocell to the other photocell, according to
one embodiment of the present invention.
FIG. 3c shows a plan view of an interface line shown in FIG. 1, according
to one embodiment of the present invention.
FIG. 4 shows in further detail a BSE according to one embodiment of the
present invention.
FIG. 5 shows a spherical assembly of BSEs, optical interconnections, system
of cooling and power supply.
FIG. 6 shows one embodiment of an optical interconnector for connecting the
BSEs of the present invention.
FIGS. 7a and 7b show a visual information gathering application of the
present invention in a preferred embodiment.
FIG. 8 shows a multiprocessor application of the present invention in a
preferred embodiment.
DETAILED DESCRIPTION OF THE INVENTION
Referring to FIG. 1, a side view of a basic semiconductor element (BSE) 100
of the present invention is shown. For purposes of example, the particular
BSE 100 depicted in FIG. 1 takes the general form of a cone, where both
the top 101 and the bottom 102 of BSE 100 form parallel circular rims in
different planes, and the sides of BSE 100 taper down from the larger rim
to the smaller rim. BSE 100 may also take other planar or non-planar
shapes. For example, BSE 100 may comprise a plurality of planar surfaces
connected together so as to define a generally non-planar shape. A nearly
infinite number of shapes for BSE 100 may be constructed, and it will be
understood that the present invention shall not be limited merely by the
particular shape of BSE 100.
Electronic circuitry may be grown on the non-planar surface of the
cone-shaped substrata 104 of BSE 100. Substrata 104 may be manufactured
from materials such as ceramics, pure carbon, silicon dioxide (SiO.sub.2)
doped to make the crystalline lattice match with the semiconductor
lattice, or some other suitable material upon which a layer of
semiconductor material can be grown having properties of perfect
crystalline lattice structure. This procedure can be divided into two
stages, both of which utilize modern crystal growth technologies. Of
course, other commonly known methods of growing semiconductor material can
be utilized, and the method described below is described as a preferred
embodiment only.
In the first stage, a semiconductor buffer layer (reference numeral 304 in
FIG. 3a, discussed below) is grown on the surface of substrata 104 by
molecular beam epitaxy (MBE) or metal-organic chemical vapor deposition
(MOCVD). In one embodiment, the semiconductor buffer layer may be grown to
a thickness of 50-100 Angstroms (10-50 monoatomic layers of semiconductor
material). It has been shown that no misfit dislocation is generated by
the mismatch of the crystalline lattice of dissimilar materials, if the
epitaxial layers are sufficiently thin.
The second stage involves a faster growing technique such as hot-wall
epitaxy (HWE) or liquid-phase epitaxy (LPE). This stage provides a
comparatively faster rate of growth in attaining a 10 mkm layer of
semiconductor material (reference numeral 306 in FIG. 3a, discussed below)
with suitable lattice quality. This final layer may be grown onto the
previously grown buffer layer. In one embodiment, the final layer may be
grown over all surfaces of the previously grown buffer layer except
specific areas along radial interface lines 106 of BSE 100.
Referring to FIG. 2, radial interface lines 106 may be assigned around the
circular periphery of BSE 100 in order to allow BSE 100 to communicate
with other basic semiconductor elements (described further below). As
shown in FIG. 2, a plurality of these interface lines may be utilized
around each BSE 100. In a preferred embodiment, BSE 100 may include six
(6) interface lines 106 around its periphery in order to allow it to
communicate with six other BSEs. This arrangement will be discussed in
further detail below.
A plan view of a portion of the areas along radial interface lines 106 over
which the final layer is not grown is depicted in FIG. 3c. Particularly,
light generating elements 301 and light receiving elements 302 may be
fabricated in these holes or "pockets" 300 during a later stage of
manufacture. In a preferred embodiment, pockets 300 may consist of
circular areas of approximately 10 mkm diameter spaced 100-300 mkm apart,
located along part or all of the length of radial interface lines 106 of
BSE 100. Of course, these dimensions are given only for purposes of one
embodiment, and it will be readily understood that other suitable
dimensions would be appropriate as well. The formation of pockets 300 will
now be described in further detail with respect to FIGS. 3a, 3b and 3c.
Referring to FIGS. 3a and 3b, a cut-away cross-section of two BSEs 100 are
shown, where the radial interface lines 106 of each BSE 100 are aligned
opposite each other. Substrata 104, corresponding to that shown in FIG. 1,
forms a part of the cone, or other non-planar surface, upon which the
semiconductor material is grown, as previously described. A buffer layer
308 may preferrably be grown at the bottom of each of the pockets 300 onto
semiconductor buffer layer 304 in order to buffer layer 304 from
subsequently grown components, discussed below. Particularly, using MBE
technology, a GaAs buffer layer 308, with a perfect lattice structure 1-3
mkm thick, may preferrably be grown or otherwise coupled to the bottom of
each of the pockets onto the semiconductor buffer layer 304. Photoreceiver
cells 302 and photoemitting cells 301 may thereafter be grown on or
otherwise coupled to the base of these buffers. In one embodiment, each
photoemitting cell 301 may consist of a multi-quantum well surface
emitting laser (MQW laser), an edge emitting laser (EE laser) or other
equivalent source of light. If EE lasers are used, it may be necessary to
create integral mirrors 310 on the surface of the "Pocket" walls 312 to
reflect the laser beams in a direction almost normal to the substrata
surface 314. In a preferred embodiment, the angle between an integral
mirror 310 and the axis 316 of laser 301 must be slightly less than 45
degrees in order to focus the beam onto the surface of the opposite
photoreceiver 302 and not onto the top of the opposite laser 301.
Reference numeral 318 depicts examples of appropriate paths for the light
emitted from laser 301 to travel, so as to hit photoreceivers 302, and not
opposite laser 301.
FIG. 3b is similar to FIG. 3a, except that surface emitting lasers 301 (SE
lasers) are specifically utilized. If SE lasers are used, special cone
shaped splitters 320 may be manufactured on the top surface of SE lasers
301. These splitters 320 are used to effectively direct the path of the
light emitted from SE lasers 301 onto photoreceivers 302, rather than onto
the opposite lasers 301. Other suitable means for directing the emitted
light from other types of photoemitting cells 301 may be used for other
types of photoemitting cells.
Each photoemitting cell 301, depicted in either FIGS. 3a, 3b or another
equivalent arrangement, is preferrably surrounded by a ring-shaped
photosensitive element 302 that serves to receive light signals emitted
from photoemitting cells 301 from neighboring BSEs 100, and transform
these light signals into electric current for further processing. Of
course, the above-described photoemitter 301 and photoemitter 302
arrangements are described merely for purposes of example, and it will be
readily understood that other equivalent arrangements can be utilized in
accordance with the teachings of the present invention.
The unique shape and geometry of BSE 100 allows for the development of
faster, more powerful computers and complex electronic devices based upon
an original architecture. As discussed in further detail below, an applied
design of the present invention provides for unusually large numbers of
very short (e.g., less than 2 mm) inter-element connections, and therefore
greatly increased inter-element communication speed, without the use of
wires, pins or other conventional circuitry. These benefits are made
possible by the conical form of the BSE 100 that permit dense, neuron-like
arrangement in a compact size.
As an example of the application of the BSE 100, multiple BSEs 100 may be
assembled in an efficient arrangement whereby some number of BSEs 100 are
located adjacent to another BSE 100. An example of this is one in which
six (6) BSEs 100 surround a "polar" BSE 100 of substantially the same
size. Thus, seven cones may be nested, allowing for short optoelectronic
connections between the polar cone and its neighbors, and, in part,
permits simultaneous data processing through an abundance of parallel
channels, and alleviates the bus limitations inherent in conventional
computers. A plurality of such seven-BSE assemblies can subsequently be
joined together and interconnected to form a spherical configuration,
where each BSE 100 is surrounded by six (6) other BSEs, as shown in FIGS.
4 and 5 and discussed below.
FIG. 4 depicts a side view partial cut-away and cross-section of the major
components of one BSE 100. Particularly, FIG. 4 shows a single BSE 100,
which may be connected to other BSEs 100 as described above. However, BSE
100 may also be utilized by itself apart from other BSEs 100, although the
inter-BSE communication features of the present invention may not be
realized in this configuration. However, for purposes of explanation, the
BSE 100 of FIG. 4 will be discussed in conjunction with the spherical
configuration. Additionally, it will readily be understood that other
configurations of BSEs may be implemented as well.
Referring to FIG. 4, each BSE 100 has its own power supply 401, designed
and optimized to suit its particular requirements. Power supply 401 is
designed to fit into the internal space of the BSE 100 in a male-female
arrangement, where power supply 401 forms the male component and the
hollow interior of BSE 100 forms the female component.
The hollow shape of each BSE 100 provides for a more highly effective
method of cooling. In one embodiment, coolant at a relatively high
pressure is transferred into power supply 401 at inlet 409a, through
tubular conduits 403 inside power supply 401, into the core 404 of the
spherical assembly 400, and is redirected into the space between the
interior surfaces of the non-planar BSE substrata 104 (also shown in FIGS.
3a, 3b and 3c) and the exterior surface 407 of power supply 401 on its
return. The coolant then passes out of power supply 401 at exit 409b. This
allows simultaneous cooling of BSE 100 and power supply 401 at surfaces
471. Conduits 403 may also be directed into other parts of the overall
system which require heat dissipation.
When the BSEs 100 are in a spherical, or equivalent, arrangement, shown in
FIG. 4, and more clearly in FIG. 5, the surface 411 of internal conductive
core 404 of spherical assembly 400 is designed as either the positive or
negative terminal and the exterior portion (and surface) 413 of sphere 400
becomes the opposite pole. Power supply 401 provides a potential to
internal portion 411 and external portion 413 via connectors to these
regions. That is, because power supply 401 is designed to fit within BSE
100, one end 415 of power supply 401 makes contact with the internal
portion 411 of the BSE, and the other end 417 is in contact with the
exterior portion 413. Of course, other suitable means for providing power
to BSE 100 may be utilized. The power provided to BSE 100 from power
supply 401 is ultimately provided to any electronic circuitry residing on
semiconductor layer 306 via connections 411a and 413a to semiconductor
layer 306.
Referring again to FIG. 4, radial interface lines 106, previously
discussed, may run along the length of each BSE 100 from the negative to
the positive pole, and serve to allow communications between different
BSEs. Each radial interface line 106 may include numerous pockets 312
(previously discussed, but not specifically shown in FIG. 4) which include
a photoemitting cell 301 and a photoreceiving cell 302 for transmitting
signals away from, and to, the components on semiconductor layer 306 of
BSE 100. A fiber optic interconnector 419 may be utilized which contains
two-way fiber optic lines corresponding to the various pockets 312 on each
radial interface line 106. In this case, fiber optic interconnector 419
would be connected between the length of neighboring BSEs 100, so that all
neighboring BSEs 100 which needed to communicate among themselves would be
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