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| United States Patent | 5587119 |
| Link to this page | http://www.wikipatents.com/5587119.html |
| Inventor(s) | White; David M. (Sulpher Springs, TX) |
| Abstract | A multi-chip-module comprising a plurality of vertically layered substrates
and including a plurality of coaxial inter-connects formed between and
through the substrate layers. Each of the coaxial inter-connects is formed
by a process wherein: an outer hole (aperture) is drilled through the
substrate and lined with an electrically conductive material to form an
outer via; the outer via is filled with a dielectric material; and, an
inner hole (aperture) is drilled through the dielectric material and
filled with an electrically conductive material to form a center via. The
characteristic impedance of the coaxial inter-connect is determined by the
selection of the outer diameters of the drilled holes for the outer and
center vias. |
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Title Information  |
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Drawing from US Patent 5587119 |
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Method for manufacturing a coaxial interconnect |
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| Publication Date |
December 24, 1996 |
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| Parent Case |
This is a division of application Ser. No. 08/305,290 filed on Sep. 14,
1994. |
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Title Information  |
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References  |
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| *references marked with an asterisk below are user-added references |
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| Market Size |
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Estimate the gross annual revenues of the relevant market
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| Reasonable Royalty |
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Public's "Guesstimation" of Royalty Value
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Market Review  |
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Technical Review  |
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Claims  |
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I claim:
1. A method for manufacturing a coaxial interconnect, comprising the steps
of:
forming an outer aperture through a substrate layer;
coating an inner surface of the outer aperture in the substrate layer with
an electrically conductive material to form an outer conductor of the
coaxial inter-connect;
filling the coated outer aperture with a dielectric material;
forming an inner aperture through the dielectric material; and
filling the inner aperture in the dielectric material with an electrically
conductive material to form a center conductor of the coaxial
inter-connect.
2. The method as in claim 1 wherein the outer aperture in the substrate
layer has a first outer diameter and the inner aperture in the dielectric
material has a second outer diameter, further including the step of:
selecting the first and second outer diameters to establish a
predetermined characteristic impedance for the coaxial inter-connect.
3. The method as in claim 1 wherein the step of filling the inner aperture
in the dielectric material comprises the step of inserting a fuzz-button
through the inner aperture to form the center conductor of the coaxial
inter-connect.
4. The method as in claim 1 wherein the step of filling the inner aperture
in the dielectric material comprises the step of coating an inner surface
of the inner aperture with an electrically conductive material. |
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Claims  |
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Description  |
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TECHNICAL FIELD
The present invention relates to a multi-chip-module and, in particular, to
a controlled impedance inter-connection for use in connecting between and
through vertically stacked multi-chip-module substrates.
BACKGROUND OF THE INVENTION
It is well known to use socket-type inter-connections between and through
the substrates of three-dimensional multi-chip-modules. However, currently
available socket-type inter-connections suffer from several drawbacks.
Notably, these connections fail to provide a controlled impedance signal
path resulting in a limitation in performance speed (bandwidth). In
addition, the socket inter-connection is not shielded, and is therefore
susceptible to cross-talk and signal loss. Furthermore, the
inter-connection often includes one or more points of discontinuity
leading to a reduction in signal integrity. Accordingly, there is a need
for an improved shielded and continuous inter-connection having a
controlled impedance for connecting between and through vertically stacked
multi-chip-module substrates.
SUMMARY OF THE INVENTION
The present invention comprises a controlled impedance coaxial
inter-connect formed between and through substrates in a
multi-chip-module. The coaxial inter-connect extends through an opening in
a substrate and includes an outer cylindrical conductive via, a center
conductive via, and a dielectric material positioned between the outer and
center vias.
The coaxial inter-connect is manufactured in accordance with the following
process. First, an outer hole is drilled through the substrate. Next, the
outer hole is lined with an electrically conductive material to form the
outer via. Then, the outer via is filled with a dielectric material. Next,
an inner hole is drilled through the dielectric material. Finally, the
inner hole is filled with an electrically conductive material to form a
center via.
BRIEF DESCRIPTION OF THE DRAWINGS
A more complete understanding of the present invention may be had by
reference to the following Detailed Description when taken in conjunction
with the accompanying Drawings wherein:
FIG. 1 is a cross-sectional view of a three-dimensional multi-chip-module
incorporating several coaxial inter-connects of the present invention; and
FIGS. 2A-2F are cross-sectional views illustrating the steps of the method
of manufacturing the multi-chip-module coaxial inter-connect of the
present invention.
DETAILED DESCRIPTION OF THE DRAWINGS
Reference is now made to FIG. 1 wherein there are shown a plurality of
vertically stacked substrates 10 comprising a multi-chip-module 12. The
substrates 10 comprise, among other types of substrate layers known for
use in a multi-chip-module 12, a planar inter-connect layer 14, a planar
thermal heatsink layer 16, and a planar dielectric separation layer 18.
The vertically layered substrates 10 rest on a supporting substrate 20.
The multi-chip-module 12 further includes a number of coaxial
inter-connects 22 formed between and through the various substrates 10 (as
shown) for electrically inter-connecting other substrate layers and the
various circuit components (such as dies, not shown) included in the
multi-chip-module.
Reference is now made to cross-sectional FIGS. 2A-2F in connection with a
description of the method of manufacturing the coaxial inter-connects 22
for the multi-chip-module 12 of FIG. 1. The thicknesses of the various
layers illustrated in FIGS. 2A-2F have been exaggerated for clarity.
FIG. 2A shows a portion of a layer of substrate 10 in a multi-chip-module.
The first step in the process for manufacturing the coaxial inter-connect
of the present invention is to drill an outer hole (aperture) 24 through
the substrate 10 as shown in FIG. 2B. It will, of course, be understood
that the outer hole for the coaxial inter-connect may extend through
multiple stacked substrates if desired. Next, the upper surface 26 and the
lower surface 28 of the substrate 10, along with the inside surface 30 of
the hole 24, are chemically plated with an electrically conductive
material to form, as shown in FIG. 2C, conductive surfaces 32 and a
shielding outer conductive via 34. Plating in this manner provides for a
continuous electrical connection through the substrate 10. The plated
outer hole 25 of the via 34 is then filled with a low dielectric constant
material 36 (for example, TEFLON or cyanate ester) as shown in FIG. 2D.
Next, as shown in FIG. 2E, an inner hole (aperture) 38 is drilled through
the filled dielectric material 36. Manufacture of the coaxial
inter-connect 22 is then completed in FIG. 2F by filling the inner hole 38
with a compliant electrically conductive material to form a center
conductive via 40. The filling of the inner hole 38 may alternatively be
accomplished by either chemically plating the inside surface of the inner
hole with a conductor 42 (FIG. 1), or by inserting a conductive
"fuzz-button" 44 (FIG. 1) through the hole. A fuzz-button 44 is a metallic
mesh woven into a cylindrical shape of a predetermined diameter and
length. Fuzz buttons may be obtained from various manufacturers of
electrical components including Cinch Connector, a division of Labinal
Components and Systems, Inc.
The characteristic impedance (Z.sub.o) of the coaxial inter-connect 22 is
dependant upon the intrinsic impedance (n) of the medium, the outer
diameter (b.sub.1) of the outer hole 24 for the outer conductive via 34
and the outer diameter (a.sub.2) of the inner hole 38 for the center
conductive via 40, and can be approximated by the following equation:
Z.sub.o =(.eta./2.pi.)ln(b/a).
Through proper selection of the outer diameters of the outer and center
conductive vias 34 and 40, respectively, a desired characteristic
impedance may be formed for the coaxial inter-connect 22.
Although only one embodiment of the present invention has been described in
the foregoing Detailed Description and illustrated in the accompanying
Drawings, it will be understood that the present invention is susceptible
to numerous changes and modifications as known to one skilled in the art
without departing from the scope of the invention as claimed.
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Description  |
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