A semiconductor light emitting device is disclosed, which comprises a substrate, and a multi-layer semiconductor film formed on the substrate, the multi-layer semiconductor film including a plurality of semiconductor layers overlaid on the substrate, the semiconductor layers having a light emission layer for emitting a light, wherein the light is picked up at a first side of the multi-layer semiconductor film, which is a side opposite to the substrate, wherein a pattern having a light pickup surface is formed on a light emitting portion of the multi-layer semiconductor film, the light pickup surface is in a (111) plane or a plane in the vicinity of the (111) plane, and an unevenness is formed on the light pickup surface.

Room temperature lasing from optically pumped single defect in a two-dimensional photonic bandgap crystal is illustrated. The high Q optical microcavities are formed by etching an array of air holes into a half wavelength thick multiquantum well waveguide. Defects in the two-dimensional photonic crystal or used to support highly localized optical modes with volumes ranging from 2 to 3 (.lambda./2n).sup.3. Lithographic tuning of the air hole radius and the lattice spacing is used to match the cavity wavelength to the quantum well gain peak, as well as to increase cavity Q. The defect lasers were pumped with 10-30 nsec pulse of 0.4-1 percent duty cycle. The threshold pump power was 1500 milliwatts. The confinement of the defect mode energy to a tiny volume and the enhancement of the spontaneous emission rate make the defect cavity an interesting device for low threshold, high spontaneous emission coupling factor lasers, and high modulation rate light emitting diodes. Optic structures formed from photonic crystals also hold promise due to the flexibility of their geometries. Lithographic methods may be employed to alter the photonic crystal geometry so as to tune device characteristics. The integration of densely packed photonic crystal waveguides, prisons, and light sources integrated on a single monolithic chip is made possible. Lithographically defined photonic crystal cavities may also find use in some material systems as an alternative to epitaxially grown mirrors, such as for long wavelengths vertical cavity surface emitting lasers (VCSEL) and GaN based devices.

A method for manufacturing quantum wires is provided in which a stacked structure having AlAs layers and GaAs layers alternatively is formed, V-grooves are formed beside the GaAs layers and the quantum wires are formed using the V-grooves. The method for manufacturing quantum wires, which method includes the following steps: growing a GaAs buffer layer on the facet (011) of a GaAs single crystal substrate; growing an AlAs layer for using as oxide mask and a GaAs layer for a V-groove alternatively on the GaAs buffer layer so that each GaAs layer is stacked between an AlAs layer and an adjacent AlAs layer; growing the cover layer of GaAs on the AlAs layer which is grown as the top layer of the structure; cutting the entire structure including the GaAs cover layer to the perpendicular direction of (011), whose structure is grown in the orientation of (011) entirely, so as to expose the facet (100); performing a heat treatment for the entire structure cut to expose the facet (100) and forming oxide film on the exposed portion of each AlAs layer; etching each exposed GaAs layer chemically using the oxide as mask and forming V-groove so that the facet (111) of GaAs layer is exposed; and growing the quantum wire in the V-groove.

A waveguide (10) is provided having a two-dimensional optical wavelength Bragg grating (20) embedded within a semiconductor laser medium (16). More particularly, the waveguide (10) includes an active region (16) sandwiched between n-doped and p-doped cladding layers (14, 22). The two-dimensional Bragg grating (20) is formed in the active region (16). Upper and lower electrodes (24, 26) are defined on opposite sides of the cladding layers (14, 22) to complete the waveguide structure (10). The two-dimensional grating (20) provides simultaneous frequency selective feedback for mode control in both the longitudinal and lateral directions.

A semiconductor device includes a semiconductor substrate; a semiconductor laminated structure including a first barrier layer, a conduction layer including a natural superlattice, and a second barrier layer, disposed on the semiconductor substrate. The first barrier layer, the conduction layer, and the second barrier layer produce heterojunctions that confine charge carriers within the conduction layer. The first barrier layer has steps at the surface contacting the conduction layer, the steps including, alternatingly arranged, a first crystal plane having a first orientation and a second crystal plane having a second orientation. The conduction layer includes first portions where the natural superlattice is ordered and second portions where the natural superlattice is disordered, the first and second portions being disposed on the first and second crystal planes, respectively. The degree of order in the conduction layer is higher in the first portions than in the second portions. Thus, the band gap energy of the conduction layer is lower in the first portions than in the second portions, and charge carriers are confined within the first portions by the second portions. As a result, a semiconductor device in which the first portions function as high-performance quantum wires is realized.