A positive-working, radiation-sensitive recording material capable of being used for the production of planographic printing plates, comprising: an aluminum support and a radiation-sensitive layer coated thereon, wherein the aluminum support has been grained in nitric acid, then cleaned in sulfuric acid, anodized in sulfuric acid, and subsequently hydrophilized with a compound comprising at least one unit with a phosphonic acid or phosphonate group; and the radiation-sensitive layer comprises a) a radiation-sensitive 1,2-naphthoquinone-2-diazide-4- or -5-sulfonic acid ester of a polycondensate having phenolic hydroxy groups, said polycondensate being obtained by reacting a phenolic compound with an aldehyde or ketone, b) a novolak or a polycondensation product obtained by reacting a polyphenol with an aldehyde or ketone, as an alkali-soluble resin, c) a vinyl-type polymer comprising at least one unit having a lateral hydroxyphenyl group, d) a clathrate-forming compound, e) a low-molecular weight compound which comprises at least one acidic hydrogen atom, and f) silica gel particles having a maximum diameter of 15 .mu.m.

The invention provides a 1,2-naphthoquinone-2-diazidesulfonate ester photosensitive agent which is useful as a photosensitive agent employed in a photoresist for producing semiconductor integrated circuits, liquid crystal displays, EL displays, etc., a method for producing the photosensitive agent, and a photoresist composition containing the photosensitive agent. The 1,2-naphthoquinone-2-diazidesulfonate ester photosensitive agent is produced by reacting a polyhydric phenol with 1,2-naphthoquinone-2-diazidesulfonyl chloride in the presence of a neutralizing agent, wherein the polyhydric phenol is obtained by a condensation reaction between resorcinol and at least one aldehyde selected from C3-C10 aldehydes, and contains, as a predominant component, a compound represented by formula (I) and components exhibiting a retention time as measured by using GPC shorter than that of the compound represented by formula (I) in an amount of 10% or less: ##STR1## wherein each of R.sub.1, R.sub.2, R.sub.3, and R.sub.4 represents a C2-C9 alkyl group.

A photoresist stripper composition is formed of a mixture of acetone, .gamma.-butyrolactone, and ester solvent. A photoresist stripping method includes spraying the photoresist stripper composition over a substrate while rotating the substrate at a relatively low speed, so as to strip photoresist from the substrate. The rotation of the substrate is stopped for a short period of time, and thereafter the photoresist stripper composition is again sprayed over the substrate while rotating the substrate at a relatively high speed. Then, the substrate is rinsed with pure water.

The objectives of the present invention are to provide a photosensitive composition having high solubility to organic solvents as well as to alkaline developers or water-base developers of pH 11 or less, and to provide a pattern forming process for obtaining a high-resolution resist pattern. These objectives are achieved by means of a photosensitive composition comprising a compound which is glassy at room temperature and has a cyclic structure with three or more aromatic rings containing an acid-decomposable substituent, and a pattern forming process wherein a photosensitive material using said photosensitive composition is exposed to a light pattern and developed with an aqueous solution of an alkali or with a water-base developer of pH 11 or less.

Aqueous hard surface cleaning compositions comprising a non associative, acrylic copolymer alkali swellable emulsion and a set of alkaline detergent builders. Methods of producing the compositions, using the compositions for cleaning hard surfaces, and improving the cleaning efficiency of alkaline liquid cleaning compositions.