Improved light duty cleaning compositions comprising 15-50% surfactant on product can be formulated such that they comprise, on surfactant: a) 50-70% wt of a mixture of primary alkyl sulphate and alkyl ether sulphate, wherein the average ethoxylation value of the mixture is 0.5-2.5, b) 2-8% wt of a betaine, an amine oxide or a mixture of betaine and amine oxide, and, c) 25-45% wt of an alkylpolyglucoside surfactant. It is believed that compositions which have an excess in surfactant of a mixture of both primary alkyl sulphate and alkyl ether sulphate in a specified ratio, i.e. such that the total EO is 0.5-2.5, together with a lesser, but significant level of APG and a minor amount of betaine, provide an acceptable combination of mildness, cleaning and foaming under a broad range of conditions and show surprising benefit in a bowl-wash situation.
A surfactant composition containing: (a) from 2 to 20% by weight of a betaine having a fatty residue containing exactly 12 carbon atoms; (b) from 3 to 18% by weight of an alkyl and/or alkenyl oligoglycoside; and (c) from 15 to 35% by weight of a fatty alcohol ether sulfate, all weights being based on the weight of the composition.
A light duty, liquid comprising: a paraffin sulfonate, an alpha olefin sulfonate, an amine oxide, a poly alkyl glucoside, a magnesium containing inorganic compound, and water.
A light duty, liquid comprising: a paraffin sulfonate, an alpha olefin sulfonate, an amine oxide, a magnesium containing inorganic compound, and water.
An aqueous liquid composition comprising water; at least one acid selected from the group consisting of carboxylic acids, hydroxycarboxylic acids, and inorganic acids other than phosphoric acid wherein the at least one acid is present in an amount from about 1.0 to about 30 milliequivalents per kilogram of total composition ("mEq/kg"); and an amphoteric surfactant wherein the amphoteric surfactant is present in an amount from about 0.01 to about 20 grams per kilogram of total composition ("g/kg"), the aqueous liquid composition having a pH from about 2.0 to about 6.1 and having a reduced etch attack on metal as compared to an aqueous composition comprising from about 1.0 to about 30 milliequivalents per kilogram of total composition ("mEq/kg") of acids selected from the group consisting of carboxylic, hydroxycarboxylic, and inorganic acids, and not containing the amphoteric surfactant.
