A slide mount has a first portion and a second portion. The first portion includes an interior region, an edge, and a slot extending from the interior region to the edge. A cavity is formed between the first portion and the second portion, and extends to the first edge, with a film segment in the cavity extracted therefrom by a film extraction system. The film extraction system includes a piston for disengaging a latch mechanism from the film segment. An extractor arm enters the slot to engage a second perforation in the film segment, and slidably moves within the slot to move the film segment through and out of the cavity toward a roller. The film extraction system operates with the slide mount according to a method including the steps of: extending the piston into a locking aperture in the slide mount; disengaging a latch end from a first perforation in the film segment; extending the extractor arm into the extraction slot; engaging a second perforation in the film segment with the extractor arm; and moving the extractor arm through extraction slot to move the film segment out of the cavity.
A slide mount has a first portion and a second portion. The first portion includes an interior region, an edge, and a slot extending from the interior region to the edge. A cavity is formed between the first portion and the second portion, and extends to the first edge. A film segment is disposed in the cavity. The slide mount disengageably locks in the film segment. The film segment can be released from the slide mount using an extractor arm. The slide mount can have a locking aperture for receiving a locking piston to disengage a protruding element from the film segment so as to permit extraction of the film segment from the cavity of the slide mount.
Adaptive optical elements for use in high precision lithography exposure are provided with an array of discrete actuators to provide highly stable and repeatable correction of the shape of an optical element to an accuracy of a small fraction of a very short wavelength of light in the EUV range of 1 to 50 nanometers, responsive to a metrology source and sensor arrangement. The actuators are matched to the deformation characteristics of the adaptive optical elements. Preferably, the actuators provide both positive and negative force for outward and/or inward deflection continuously over the surface of the mirror. The surface of the optical element may thus be accurately, controllably and repeatably deformed to within an allowable deformation limit to optimize optical performance of an optical system for high precision lithography exposure.
