Disclosed in an arrangement to achieve satisfactory head contact by increasing contact face pressure at a head gap and to reduce the change in time of head contact performance in a double azimuth head. Heads in a portion in which a tape is slid are respectively constructed with each head having two different arcs with a radius of curvature R1 in a first area which includes a gap, and with a radius of curvature R2 in a second area which is adjacent to the first area. A transition portion P for transitioning an arc with the radius of curvature R1 and an arc with the radius of curvature R2 is located in the direction of its adjacent head based upon a contact point Q on R1 of a common tangent drawn from an arc forming a periphery of a rotating drum to a circle formed by R1. The relationship between the radiuses of curvature in two areas is set to R1>R2. As the area in which a tape is in contact can be reduced, contact face pressure by the tape on a gap can be increased, satisfactory head contact can be obtained and as a contact area with a tape is wide to some extent, a change in time of contact performance can be reduced.
In processing a head unit in which a head relative height Y is Y' with a grinding amount .DELTA.GD of .DELTA.GD', the relationship between distances Bo between a vertex of a curved surface as a front face of a head chip and a head gap before and after grinding the front face of the head chip and a gap depth dimension GD, is predetermined with respect to a head unit in which the head relative height is substantially equal to Y', through which Bo1 as the value of Bo before grinding corresponding to a target value of the value of Bo after grinding is determined and used as Bo1 of the head unit in which the head relative height Y is Y'. Thus, grinding of the front face of the head chip is conducted after Bo1 corresponding to the target value is determined. Hence, a head unit with the value of Bo after grinding falling within the range of standard values can be manufactured efficiently, and accordingly the yield can be improved.
According to the invention, techniques for cleaning a rotary magneto-resistive head. Embodiments according to the invention are especially useful in tape drive systems, and the like. Embodiments can provide methods and apparatus for cleaning contaminant from rotary magneto-resistive heads while guarding against damage to the head from excess cleaning, and the like. Specific embodiments can control the rotational speed of a rotary magneto-resistive head in order to facilitate cleaning operations. Embodiments include a cleaning device and a control method, and are suited for use in a magneto-resistive head mounted on a rotary cylinder of a computer tape storage unit, for example, although application of the present invention is not limited to such embodiments.
According to the invention, techniques for cleaning a rotary magneto-resistive head. Embodiments according to the invention are especially useful in tape drive systems, and the like. Embodiments can provide methods and apparatus for cleaning contaminant from rotary magneto-resistive heads while guarding against damage to the head from excess cleaning, and the like. Specific embodiments can control the rotational speed of a rotary magneto-resistive head in order to facilitate cleaning operations. Embodiments include a cleaning device and a control method, and are suited for use in a magneto-resistive head mounted on a rotary cylinder of a computer tape storage unit, for example, although application of the present invention is not limited to such embodiments.
A magnetic head is manufactured by grinding a head chip (2) with a gap depth (GD 1) to remove its margin (6) until the gap depth becomes a final gap depth (GD 2). The gap depth (GD 1) is 25 microns or thinner. The method increases yield and productivity in the manufacture of a high performance magnetic head with a decreased gap depth (GD 2), which satisfies the standards of both the gap depth (GD 2) and the distance between the head gap and the outermost point of the chip front.
A magnetic head comprises an MR element, and a substrate supporting the MR element from both sides at a center portion, and a magnetic tape is in contact and slide-contact with a slide-contact surface thereof. A curvature in a thickness direction of the slide-contact surface is set to be larger at a center portion than at both sides thereof. In this way, it is possible to protect the slide-contact surface of the magnetic head from eccentric wear and avoid deterioration of the magnetic head performance.
