A storage device containing a quantity of a liquid chemical substance which is used as a reactant in a chemical process, the device being composed of: a closed container holding the quantity of substance and having a wall provided with an inlet opening and an outlet opening; an inlet valve coupled to said inlet opening, the inlet valve being closeable to block said inlet opening; an outlet valve coupled to the outlet opening, the outlet valve being closeable to block the outlet opening; and a filter interposed between the quantity of liquid and said outlet valve.
An apparatus for chemical vapor deposition includes a dispenser for dispensing a precursor to a vaporizer positioned within a vaporization chamber. A delivery conduit joins the vaporization with a process chamber. A flow meter is positioned within the delivery conduit for measuring the flow of precursor through the delivery conduit. A flow controller is likewise positioned within the delivery conduit for controlling the flow of precursor in response to the measured flow rate.
A method for chemical vapor deposition includes dispensing a precursor to a vaporizer positioned within a vaporization chamber and delivering a vapor to a process chamber without a carrier gas. A flow meter is positioned within the delivery conduit for measuring the flow rate of precursor through the delivery conduit. A flow controller is likewise positioned within the delivery conduit for controlling the flow of precursor in response to the measured flow rate.
