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Sputter load lock O-ring cleaner
   
Document Number
US Patent 5983438
Issued Date
November 16, 1999
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Inventors
Dalton; William Joseph (Sutherland Springs, TX)
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Abstract
A cleaning apparatus and method for removing debris from the seals of a pressurized enclosure, specifically a sputter load lock chamber. The cleaning apparatus includes a load lock replacement door, a cleaning tool, and a seal. The load lock replacement door includes a surface that seals the opening of the load lock chamber so as to maintain a desired vacuum pressure in the load lock chamber. The sealing surface supports a cleaning tool. The cleaning tool and the sealing surface are supported by a vacuum seal which limits leakage of gas at ambient conditions into the load lock chamber. Once the tool is installed, the load lock chamber is pumped-down to a desired vacuum pressure. The tool is manipulated as necessary to remove debris from the seals of the load lock chamber. Once the cleaning process has been completed, the load lock chamber is vented, the tool removed, and the load lock door closed and sealed. The load lock chamber is restored to the desired operating vacuum pressure and the machine is placed back on-line.
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Number of Claims:
10
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Owner
Sony Corporation (Tokyo,JP)
Sony Electronics, Inc. (Park Ridge, NJ)
Published
November 16, 1999
Application Number
09/042,041
Filed
March 13, 1998
US Classification
15/246.5   15/246
Int'l Classification
B01J   3/00   (20060101)   B01J   3/03   (20060101)   B08B   1/00   (20060101)   C23C   14/56   (20060101)  
Examiner
USPTO Field of Search
15/246   15/246.5   15/104.095  
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Description
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