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Process of manufacturing solid oxygen ion conducting oxide layers
   
Document Number
US Patent 5989634
Issued Date
November 23, 1999
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Abstract
Electrochemical vapor deposition (EVD) of oxygen ion conducting and mixed conducting, oxygen-ionic/electronic, oxide layers is achieved at near atmospheric pressure process conditions by employing metals and metal compounds for removal and/or recovery of the free halogen byproduct of the EVD reaction. The metals and metal compounds are employed as solids, vapors, and as oxides in intimate mixture with carbon directly within the deposition zone together with the substrates to be coated. The process leads to significant cost reduction, for instance, in the fabrication of thin layers of solid oxygen ion conducting electrolytes, for fuel cells, gas separators, and gas sensors, when compared to state-of-the-art EVD processes which are conducted under vacuum conditions.
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Number of Claims:
20
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Owner
Published
November 23, 1999
Application Number
08/882,579
Filed
June 25, 1997
US Classification
427/255.32   205/344 205/538 205/542 427/255.33 427/255.35
Int'l Classification
C23C   16/40   (20060101)   C23C   16/44   (20060101)  
Examiner
Attorney/Law Firm
USPTO Field of Search
427/115   427/255.3   427/255.32   427/255.33   427/255.35   205/344   205/538   205/542  
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