A mask forms a top magnetic pole piece of an inductive magnetic head having a layer of insulating material over a hill region and a gap region on a wafer. The mask comprises a layer of photolithographic material on the insulating material and a waste region of the wafer and includes a first aperture exposing the insulating material to define a paddle region of the pole piece over the hill region and a trench over the gap region. A second aperture is connected to the first aperture to define a feeder region over the waste region that funnels solvent to and through the trench and establishes laminar flow of solvent through the trench. Solvent is admitted into the feeder region for laminar flow through the trench region to form the mask and expose a surface of the layer of insulating material in the paddle and trench regions of the mask. The top pole piece defines a gap at an air bearing surface of the head having an average gap width not greater than 1.0 microns with a standard deviation of the average gap widths no more than 0.07 for heads formed on a single wafer and no more than 0.12 for heads formed on different wafers.
CROSS-REFERENCE TO RELATED APPLICATION
This application claims priority of Provisional Application No. 60/078,882 filed Mar. 20, 1998 for "High Aspect Ratio (Narrow Trench) Proximity Correction Design" by Steven A. Mastain, Wallace A. Peck, Diana M. Simplair and Kurt A. Rothstein.
A high data-rate stitched pole inductive magnetic write head incorporating a non-magnetic spacer layer and a magnetic pole yoke that is recessed from the magnetic pole tip. Said spacer layer is deposited as part of a self-aligned, patterned photoresist process, wherein the spacer layer is deposited first and the P2 portion of the upper pole assembly is then plated over it to form the pole tip configuration. Increasing the thickness of the spacer layer, while keeping it within a specified tolerance range, allows the upper stitched P3 portion of the pole piece to be recessed relative to the tip of P2. The spacer layer shortens throat height, reduces saturation write current, and improves overwrite and side erasure performance.
A giant magneto-resistive head is provided which includes a novel high data-rate stitched pole inductive magnetic write head. The write head incorporates a non-magnetic spacer layer and a magnetic pole yoke that is recessed from the magnetic pole tip. The spacer layer shortens the throat height of the write head, reduces its saturation write current, and improves its overwrite and side erasure performance.
A longitudinal recording head (50, 56, 60) for use with magnetic recording media includes a non-uniform gap (54, 59, 64) between first (51, 57, 61) and second magnetic (52, 58, 62) poles which focuses magnetic flux onto a small area of the magnetic recording medium. The non-uniform gap is preferably in the form of a cavity that is contoured to produce the desired flux pattern. Longitudinal recording heads incorporating the non-uniform gap are capable of improved recording densities.
A method for forming a top magnetic pole of an inductive magnetic head being begins with the step of forming a photolithographic material over a layer of insulating material at a hill region and gap region of the inductive magnetic head formed on a wafer and over a waste region of the wafer. Second, a mask is patterned on the photolithographic material defining a paddle region over the hill region, a feeder region over the waste region, and a trench region between the feeder region and the paddle region. The trench region extends over the gap region. Third solvent is admitted into the feeder region to flow in a laminar flow through the trench region to the paddle region to form the mask and expose a surface of the layer of insulating material in the paddle and trench regions of the mask.
