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Claims  |
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We claim:
1. A vacuum plasma processor for treating a workpiece with a plasma comprising a vacuum chamber where the workpiece is adapted to be located, the chamber having an inlet for introducing
into the chamber a gas which can be converted into the plasma for treating the workpiece, a coil positioned to couple an RF field to the gas for exciting the gas to the plasma state, the RF field derived from a main part of the coil interacting with an
electromagnetic shield, the electromagnetic shield substantially confining the coil RF field to structure associated with the processor and interacting with the RF field derived from the main coil part in such a manner as to tend to reduce (a) the RF
field derived from the main coil part in a part of the plasma generally aligned with a peripheral portion of the main coil part and (b) plasma flux density in the part of the plasma generally aligned with the main coil part peripheral portion relative to
flux density of a portion of the plasma generally inside the part of the plasma generally aligned with the main coil part peripheral portion, the main coil part peripheral portion including an additional coil structure for supplying an additional amount
of RF field to the portion of the plasma generally aligned with the main coil part peripheral portion, the additional amount of RF field supplied increasing the plasma flux density in the part of the plasma generally aligned with the main coil part
peripheral portion.
2. The vacuum plasma processor of claim 1 wherein the additional coil structure is spatially adjacent to and connected electrically in parallel with the main coil part peripheral portion.
3. The vacuum plasma processor of claim 2 wherein there is different spacing, relative to the plasma in a direction at right angles to a treated workpiece surface, of the additional coil structure and the main coil part.
4. The vacuum plasma processor of claim 2 wherein the main coil peripheral portion includes at least one corner, the additional coil structure being spatially adjacent to and connected electrically in parallel with conductor segments of the main
coil forming the corner.
5. The vacuum plasma processor of claim 4 wherein the main coil peripheral portion includes at least one end terminal, the additional structure being connected electrically in parallel with the end terminal and a coil conductor segment including
and adjacent the end terminal.
6. The vacuum plasma processor of claim 5 wherein there is different spacing relative to the plasma, in a direction at right angles to a treated workpiece surface, of the additional coil structure and the main coil part.
7. The vacuum plasma processor of claim 6 wherein the coil includes plural windings electrically connected in parallel with each other, each of the plural windings extending radially and circumferentially between interior and exterior terminals
of the coil.
8. The vacuum plasma processor of claim 7 wherein the coil includes a center point and the windings are interlaced as well as approximately spatially and electrically symmetrical with respect to the center point.
9. The vacuum plasma processor of claim 8 wherein each of the windings includes at least several intersecting straight conducting segments.
10. The vacuum plasma processor of claim 2 wherein the main coil peripheral portion includes at least one end terminal of the coil, the additional structure being connected electrically in parallel with the end terminal and a coil conductor
segment including and adjacent the end terminal.
11. The vacuum plasma processor of claim 1 wherein the additional structure is spatially adjacent to and connected electrically in series with the main coil peripheral portion.
12. The vacuum plasma processor of claim 11 wherein there is different spacing relative to the plasma, in a direction at right angles to a treated workpiece surface, of the additional coil structure and the main coil part.
13. The vacuum plasma processor of claim 11 wherein the main coil peripheral portion includes a pair of adjacent, non-contacting conductor segments having ends that almost form a corner, the additional coil structure being connected electrically
in series with the ends of the conductor segments that almost form a corner.
14. The vacuum plasma processor of claim 13 wherein the main coil peripheral portion includes at least one peripheral end terminal of the coil, the additional structure being connected electrically in series between the end terminal and a coil
conductor segment adjacent the end terminal.
15. The vacuum plasma processor of claim 14 wherein there is different spacing relative to the plasma, in a direction at right angles to a treated workpiece surface, of the additional coil structure and the main coil part.
16. The vacuum plasma processor of claim 1 wherein the main coil peripheral portion includes a pair of adjacent conductor segments having adjacent ends for coupling to the plasma magnetic fields having axes displaced approximately 90.degree.
with respect to each other, the additional structure being spatially adjacent the adjacent ends and electrically connected to the adjacent conductor segments for establishing in the plasma magnetic fields that aid the magnetic fields coupled to the
plasma by the adjacent conductor segments.
17. The vacuum plasma processor of claim 16 wherein the adjacent conductor segments abut to form a corner and the additional structure includes a conductor segment spatially adjacent the corner and electrically connected in parallel with the
conductor segments forming the corner.
18. The vacuum plasma processor of claim 17 wherein there is different spacing relative to the plasma, in a direction at right angles to a treated workpiece surface, of the additional coil structure and the mail coil part.
19. The vacuum plasma processor of claim 16 wherein the adjacent conductor segments are spaced almost to form a corner and the additional coil structure includes a conductor segment spatially adjacent the corner and electrically connected in
series with the adjacent conductor segments almost forming the corner.
20. The vacuum plasma processor of claim 19 wherein there is different spacing relative to the plasma, in a direction at right angles to a treated workpiece surface, of the additional coil structure and the main coil part.
21. The vacuum plasma processor of claim 16 wherein there is different spacing relative to the plasma, in a direction at right angles to a treated workpiece surface, of the additional coil structure and the main coil part.
22. The vacuum plasma processor of claim 1 wherein there is different spacing relative to the plasma, in a direction at right angles to a treated workpiece surface, of the additional coil structure and the main coil part.
23. The vacuum plasma processor of claim 1 wherein the coil includes interior and exterior terminals connected via a matching network to an RF source.
24. The vacuum plasma processor of claim 23 wherein the coil includes plural windings connected in parallel so current flows between the matching network and the plural windings via the terminals.
25. The vacuum plasma processor of claim 24 wherein the plural windings are interlaced as well as being approximately spatially and electrically substantially symmetrical about a center point of the coil.
26. The vacuum plasma processor of claim 24 wherein each of the windings includes plural turns extending radially and circumferentially between the interior and exterior terminals.
27. The vacuum plasma processor of claim 26 wherein at least some of the turns include plural straight segments.
28. The vacuum plasma processor of claim 26 wherein all of the turns include plural straight segments.
29. The vacuum plasma processor of claim 28 wherein all of the turns include only straight segments.
30. A vacuum plasma processor for treating a workpiece with a plasma comprising a vacuum chamber where the workpiece is adapted to be located, the chamber having an inlet for introducing into the chamber a gas which can be converted into the
plasma for treating the workpiece, a coil positioned to couple an RF field to the gas for exciting the gas to the plasma state, the coil having a peripheral portion including a pair of adjacent conductor segments having adjacent ends, the adjacent
conductor segments forming corners and coupling to the plasma magnetic fields having longitudinal axes forming corners so the magnetic fluxes in peripheral parts of the plasma define corners, the coil being arranged so the magnetic flux density in the
corners formed by the adjacent conductor segments is substantially greater than the magnetic flux density in other peripheral parts of the coil.
31. The vacuum plasma processor of claim 30 wherein the coil includes an additional segment spatially close to each of the corners and connected electrically in parallel with the conductor segments forming the corner.
32. The vacuum plasma processor of claim 31 wherein the parallel segment and corner have different spacings from the plasma in a direction at right angles to a treated workpiece surface.
33. The vacuum plasma processor of claim 30 wherein the coil includes exterior terminals and the corners formed by the adjacent conductor segments are at the periphery of the coil, the exterior terminals being approximately midway between a pair
of the corners at the periphery of the coil.
34. The vacuum plasma processor of claim 30 wherein the coil peripheral portion includes a pair of adjacent, non-contacting conductor segments having ends that almost form a corner, the additional structure being connected electrically in series
with the ends of the conductor segments that almost form a corner, the coil including a further segment spatially close to the adjacent segment ends almost forming the corner and connected electrically in series with the adjacent conductor segments
almost forming the corner.
35. The vacuum plasma processor of claim 34 wherein the further segment and the adjacent segment ends almost forming the ends have different spacings relative to the plasma in a direction at right angles to a treated workpiece surface.
36. The vacuum plasma processor of claim 30 wherein the coil peripheral portion includes plural adjacent pairs of said adjacent conductor segments.
37. The vacuum plasma processor of claim 36 wherein the plural adjacent pairs are nested.
38. The vacuum plasma processor of claim 36 wherein said adjacent conductor segments are at corners of the coil.
39. The vacuum plasma processor of claim 38 wherein the coil includes additional conductor segments for supplying substantial magnetic flux density to the plasma and further conductor segments connected between the adjacent conductor segments at
the coil corners and the additional conductor segments, the further conductor segments supplying substantially lower magnetic flux density to the plasma than either the additional or adjacent conductor segments.
40. The vacuum plasma processor of claim 30 wherein the coil includes interior and exterior terminals connected via a matching network to an RF source.
41. The vacuum plasma processor of claim 40 wherein the exterior terminals are diametrically opposed.
42. The vacuum plasma processor of claim 41 wherein the coil includes peripheral corners, the exterior terminals being at a pair of the peripheral corners of the coil.
43. The vacuum plasma processor of claim 41 wherein the coil includes plural windings connected in parallel so current flows between the matching network and the plural windings via the terminals.
44. The vacuum plasma processor of claim 43 wherein the plural windings are interlaced as well as approximately spatially and electrically symmetrical about a center point of the coil.
45. The vacuum plasma processor of claim 43 wherein each of the windings includes plural interlaced turns extending radially and circumferentially between the interior and exterior terminals.
46. The vacuum plasma processor of claim 45 wherein at least some of the turns include plural straight segments.
47. The vacuum plasma processor of claim 45 wherein all of the turns include plural straight segments.
48. The vacuum plasma processor of claim 45 wherein all of the turns include only straight segments.
49. The vacuum plasma processor of claim 30 wherein the coil includes a main part and an additional conductor segment, the additional conductor segment being spatially close to the adjacent ends and electrically connected to the adjacent
conductor segments for establishing in the plasma magnetic fields that aid the magnetic fields coupled to the plasma by the adjacent conductor segments.
50. A vacuum plasma processor for treating a workpiece with a plasma comprising a vacuum chamber where the workpiece is adapted to be located, the chamber having an inlet for introducing into the chamber a gas which can be converted into the
plasma for treating the workpiece, a coil positioned to couple an RF field to the gas for exciting the gas to the plasma state, the coil including plural electrically conducting windings, each having sufficient length at the frequency of the RF field to
have transmission line effects so there is a peak standing wave RF current therein, each winding including different portions having differing spacings from the plasma in a direction at right angles to a face of the workpiece exposed to the plasma.
51. A vacuum plasma processor for treating a workpiece with a plasma comprising a vacuum chamber where the workpiece is adapted to be located, the chamber having an inlet for introducing into the chamber a gas which can be converted into the
plasma for treating the workpiece, a coil positioned to couple an RF field to the gas for exciting the gas to the plasma state, the coil including peripheral and other non-peripheral conducting portions, the coil including a conductor segment connected
electrically only to the peripheral portion of the coil and located spatially close to the peripheral portion of the coil, the peripheral portion of the coil and the conductor segment being arranged so RF fields established by them add in a portion of
the plasma to increase the plasma flux density in the portion of the plasma.
52. A vacuum plasma processor for treating a workpiece with a plasma comprising a vacuum chamber where the workpiece is adapted to be located, the chamber having an inlet for introducing into the chamber a gas which can be converted into the
plasma for treating the workpiece, a coil positioned to couple an RF field to the gas for exciting the gas to the plasma state, the coil including first and second electrical conducting portions connected electrically in series, the first and second
conducting portions being in spatially different parts of the coil, the coil including a conductor segment connected electrically in parallel with only the first conducting portion and located spatially close to the first conducting portion, the first
conducting portion and the conductor segment being arranged so RF fields established by them add in a portion of the plasma to increase the plasma flux density in the portion of the plasma.
53. A vacuum plasma processor for treating a workpiece with a plasma comprising a vacuum chamber where the workpiece is adapted to be located, the chamber having an inlet for introducing into the chamber a gas which can be converted into the
plasma for treating the workpiece, a coil positioned to couple an RF field to the gas for exciting the gas to the plasma state, the coil including first and second conducting segments having spatially close ends spaced from each other by a gap, a third
conducting segment connected electrically in series with the ends of the first and second conducting segments and spatially close to said first conducting segment, the first and third conducting segments being arranged so RF fields established by them
add in a portion of the plasma to increase the plasma flux density in the portion of the plasma.
54. A vacuum plasma processor for treating a workpiece with a plasma comprising a vacuum chamber where the workpiece is adapted to be located, the chamber having an inlet for introducing into the chamber a gas which can be converted into the
plasma for treating the workpiece, a coil positioned to couple an RF field to the gas for exciting the gas to the plasma state, the coil including first and second electrical conducting portions connected electrically in series, the first and second
conducting portions being in spatially different parts of the coil, the coil including a conductor segment connected electrically in parallel with only the first conducting portion and located spatially close to the first conducting portion, the first
conducting portion and the conductor segment being arranged so RF fields established by them add in a portion of the plasma to increase the plasma flux density in the portion of the plasma.
55. A vacuum plasma processor for treating a workpiece with a plasma comprising a vacuum chamber where the workpiece is adapted to be located, the chamber having an inlet for introducing into the chamber a gas which can be converted into the
plasma for treating the workpiece, a coil positioned to couple an RF field to the gas for exciting the gas to the plasma state, the coil including first and second conducting segments having spatially close ends spaced from each other by a gap, a third
conducting segment connected electrically in series with the ends of the first and second conducting segments and spatially close to said first conducting segment, the first and third conducting segments being arranged so RF fields established by them
are in a portion of the plasma to increase the plasma flux density in the portion of the plasma.
56. A vacuum plasma processor for treating a workpiece with a plasma comprising a vacuum chamber where the workpiece is adapted to be located, the chamber having an inlet for introducing into the chamber a gas which can be converted into the
plasma for treating the workpiece, a coil positioned to couple an RF field to the gas for exciting the gas to the plasma state, the coil including center and other portions each having a number of winding turns, the turns of the center portion having a
tighter pitch than the turns of the other portion, the turns of the center and other portions being connected to each other and spatially arranged such that there is significant self coupling of an RF magnetic field derived by the center portion without
substantial cross coupling of the RF magnetic field derived by the center portion with RF magnetic fields derived from the other portion of the coil.
57. The vacuum plasma processor of claim 56 wherein the coil includes plural multi-turn windings connected in parallel, the plural windings being included in the center and other portions of the coil.
58. The vacuum plasma processor of claim 57 wherein each of the windings extends radially and circumferentially from a center point.
59. The vacuum plasma processor of claim 58 wherein each of the windings has interior and exterior terminals and the turns of the plural windings are interlaced.
60. The vacuum plasma processor of claim 56 wherein the RF field derived from a main part of the coil interacts with an electromagnetic shield, the electromagnetic shield substantially confining the coil RF field to structure associated with the
processor and interacting with the RF field derived from the main coil part in such a manner as to tend to reduce (a) the RF field derived from the main coil part in a part of the plasma generally aligned with a peripheral portion of the main coil part
and (b) plasma flux density in the part of the plasma generally aligned with the main coil part peripheral portion relative to flux density of a portion of the plasma generally inside the part of the plasma generally aligned with the main coil part
peripheral portion, the main coil part peripheral portion including an additional coil structure for supplying an additional amount of RF field to the portion of the plasma generally aligned with the main coil part peripheral portion, the additional
amount of RF field supplied increasing the plasma flux density in the part of the plasma generally aligned with the main coil part peripheral portion.
61. The vacuum plasma processor of claim 60 wherein the coil peripheral portion includes a pair of adjacent conductor segments having adjacent ends, the adjacent conductor segments forming corners and coupling to the plasma magnetic fields
having longitudinal axes forming corners so the magnetic fluxes in peripheral parts of the plasma define corners, the coil being arranged so the magnetic flux density in the corners formed by the adjacent conductor segments is substantially higher than
the magnetic flux density in other peripheral parts of the plasma.
62. The vacuum plasma processor of claim 61 wherein the coil includes plural electrically conducting windings, each having sufficient length at the frequency of the RF field to have transmission line effects so there is a peak standing wave RF
current therein, each winding including different portions having differing spacings from the plasma in a direction at right angles to a face of the workpiece exposed to the plasma.
63. The vacuum plasma processor of claim 62 wherein the coil includes a conductor segment connected electrically only to the peripheral portion of the coil and located spatially close to the peripheral portion of the coil, the peripheral portion
of the coil and the conductor segments being arranged so RF fields established by them add in a portion of the plasma to increase the plasma flux density in the portion of the plasma.
64. The vacuum plasma processor of claim 63 wherein the coil includes first and second electrical conducting portions connected electrically in series, the first and second conducting portions being in spatially different parts of the coil, the
coil including a conductor segment connected electrically in parallel with only the first conducting portion and located spatially close to the first conducting portion, the first conducting portion and the conductor segments being arranged so RF fields
established by them add in a portion of the plasma to increase the plasma flux density in the portion of the plasma.
65. The vacuum plasma processor of claim 64 wherein the coil includes first and second conducting segments having spatially close ends spaced from each other by a gap, a third conducting segment connected electrically in series with the ends of
the first and second conducting segments and spatially close to said first conducting segment, the first and third conducting segments being arranged so RF fields established by them add in a portion of the plasma to increase the plasma flux density in
the portion of the plasma.
66. The vacuum plasma processor of claim 65 for treating a workpiece with a plasma comprising a vacuum chamber where the workpiece is adapted to be located, the chamber having an inlet for introducing into the chamber a gas which can be
converted into the plasma for treating the workpiece, a coil positioned to couple an RF field to the gas for exciting the gas to the plasma state, the coil including first and second electrical conducting portions connected electrically in series, the
first and second conducting portions being in spatially different parts of the coil, the coil including a conductor segment connected electrically in parallel with only the first conducting portion and located spatially close to the first conducting
portion, the first conducting portion and the conductor segments being arranged so RF fields established by them add in a portion of the plasma to increase the plasma flux density in the portion of the plasma.
67. The vacuum plasma processor of claim 56 wherein the coil includes first and second conducting segments having spatially close ends spaced from each other by a gap, a third conducting segment connected electrically in series with the ends of
the first and second conducting segments and spatially close to said first conducting segment, the first and third conducting segments being arranged so RF fields established by them are in a portion of the plasma to increase the plasma flux density in
the portion of the plasma.
68. The vacuum plasma processor of claim 56 wherein the coil has a peripheral portion including a pair of adjacent conductor segments having adjacent ends, the adjacent conductor segments forming corners and coupling to the plasma magnetic
fields having longitudinal axes forming corners so the magnetic fluxes in peripheral parts of the plasma define corners, the coil being arranged so the magnetic flux density in the corners formed by the adjacent conductor segments is substantially higher
than the magnetic flux density in other peripheral parts of the plasma.
69. The vacuum plasma processor of claim 56 wherein the coil includes a conductor segment connected electrically only to the peripheral portion of the coil and located spatially close to the peripheral portion of the coil, the peripheral portion
of the coil and the conductor segments being arranged so RF fields established by them add in a portion of the plasma to increase the plasma flux density in the portion of the plasma.
70. The vacuum plasma processor of claim 56 wherein the coil includes first and second electrical conducting portions connected electrically in series, the first and second conducting portions being in spatially different parts of the coil, the
coil including a conductor segment connected electrically in parallel with only the first conducting portion and located spatially close to the first conducting portion, the first conducting portion and the conductor segments being arranged so RF fields
established by them add in a portion of the plasma to increase the plasma flux density in the portion of the plasma.
71. A vacuum plasma processor for treating a workpiece with a plasma comprising a vacuum chamber where the workpiece is adapted to be located, the chamber having an inlet for introducing into the chamber a gas which can be converted into the
plasma for treating the workpiece, a coil positioned to couple an RF field to the gas for exciting the gas to the plasma state, the coil having a peripheral portion including a pair of adjacent conductor segments having adjacent ends, the adjacent
conductor segments forming corners and coupling to the plasma magnetic fields having longitudinal axes forming corners so the magnetic fluxes in peripheral parts of the plasma define corners, the peripheral portion including a further conductor segment
electrically connecting an adjacent pair of the corners together, the further conductor segment including a portion between the adjacent corners, the further conductor segment portion extending inwardly from the remainder of the further conductor
segment.
72. The vacuum plasma processor of claim 71 wherein the coil includes a plurality of said further conductor segments and a plurality of said further conductor segment portions.
73. The vacuum plasma processor of claim 72 wherein the plurality are in spatially different parts of the peripheral portion.
74. The vacuum plasma processor of claim 72 wherein the plurality are in spatially adjacent parts of the peripheral portion.
75. The vacuum plasma processor of claim 72 wherein some of the plurality are in spatially different parts of the peripheral portion and others of the plurality are in spatially adjacent parts of the peripheral portion.
76. The vacuum plasma processor of claim 71 wherein the further conductor segment, except for the inwardly extending portion thereof, extends substantially in a straight line between the adjacent corners. |
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Claims |
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Description |
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FIELD OF INVENTION
The present invention relates generally to vacuum plasma processors and more particularly to such a processor having a coil with a peripheral portion having conducting segments for coupling increased RF excitation fields to the processor plasma.
BACKGROUND ART
Various structures have been developed to supply RF fields to an ionizable gas in a vacuum plasma processing chamber, to excite the gas to a plasma state. The excited plasma interacts with a workpiece in the vacuum plasma processing chamber to
etch materials from an exposed workpiece surface or deposit materials on the surface. The workpiece is typically a semiconductor wafer having a planar circular surface, a metal planar surface or a dielectric workpiece, which can have a rectangular
periphery, as in a flat panel display.
A processor for treating workpieces with an inductively coupled planar plasma (ICP) is disclosed, inter alia, by Ogle, U.S. Pat. No. 4,948,458, commonly assigned with the present invention. A magnetic field is derived from a coil positioned on
or adjacent a single planar dielectric window extending in a direction generally parallel to the workpiece planar surface. In commercial devices, the window is usually quartz because quartz has low material impurity and provides optimum results for RF
coupling. The coil is connected to be responsive to an RF source having a frequency in the range of 1 to 100 MHz, but which is typically 13.56 MHz. An impedance matching network is connected between the coil and source, to minimize RF reflections
coupled back to the source from a load, including the coil and the plasma.
Barnes et al., U.S. Pat. No. 5,589,737 discloses a plasma processor including a coil for inductively deriving an RF plasma excitation field for processing relatively large substrates, for example, dielectric substrates forming rectangular flat
panel displays. In the Barnes et al. patent, the RF field derived by the coil is coupled to the plasma via plural individually supported dielectric windows. In the preferred embodiment of the '737 patent, four such windows are positioned in four
different quadrants. To maximize RF coupling from the coil through the windows to the plasma, the windows have a thickness substantially less than the thickness of a single window having the same combined area as the plural windows to withstand the
differential pressure between the vacuum inside the chamber and atmospheric pressure on the chamber exterior.
Several different coil configurations are disclosed in the '737 patent. Some of these coils have plural winding segments connected electrically in parallel between first and second terminals coupled to an RF excitation source via a matching
network. Some of the coil configurations of the '737 patent have parallel coil segments of the same electrical length between the first and second terminals.
To provide more uniform plasma flux density on the relatively large planar flat panel display surfaces having a rectangular periphery, the various coil configurations disclosed in the '737 patent were redesigned as illustrated in FIG. 1, a bottom
view of the redesigned coil. The prior art coil 10 of FIG. 1 includes two spiral-like, electrically parallel copper windings 12 and 14, each having plural spiral-like turns substantially symmetrically arranged with respect to coil center point 16.
Windings 12 and 14 are coplanar and have copper conductors with square cross-sections (with each side having a length of about 1.25 cm), including bottom edges spaced approximately 3 cms above the upper faces of the four rectangular quartz
windows 21, 22, 23 and 24, individually supported by one-piece, rigid frame 26, made of a non-magnetic metal, preferably anodized aluminum. Frame 26 is preferably constructed in a manner similar to that illustrated and described in the '737 patent,
except that interior mutually perpendicular rails 28 and 30 are substantially coplanar with the top coplanar faces of windows 21-24. Coil 10 is suspended by dielectric hangers from the ceiling of a nonferrous metal (preferably anodized aluminum)
electromagnetic shield cover of the type disclosed in Barnes et al. '737.
Windings 12 and 14 respectively include interior terminals 32 and 34, equispaced from coil center point 16 along rail 28. Terminals 32 and 34 are electrically driven in parallel and connected by metal strap 35 and cable 36 to output terminal 38
of matching network 40, having an input terminal connected to be responsive to RF source 42. Typically, strap 35 has an inverted U shape with a first leg of the U being spaced substantially farther from windows 21 and 24 than windings 12 and 14, and the
other legs running between the first leg and terminals 32 and 34; strap 35 is shown offset to simplify the drawing.
Windings 12 and 14 also respectively include, at diametrically opposed corners thereof, terminals 44 and 46, respectively connected to ground through capacitors 48 and 50. Output terminal 52 of matching network 40 is also grounded to provide a
return current path through capacitors 48 and 50 to the matching network grounded terminal for the parallel currents flowing through windings 12 and 14. Windings 12 and 14 have a geometry and the values of capacitors 48 and 50 are selected so maximum
standing wave currents occur along the lengths of windings 12 and 14 at positions that are somewhat electrically close to terminals 44 and 46. Typically, the maximum standing wave currents occur in the outermost turn of each of windings 12 and 14 in
proximity to rail 26. | | |
