A system (10) for processing wafers and cleaning wafer cassettes (160, 260, 460) includes a work cell (12) having a plurality of processing stations (14) for processing wafers, and at least one processing/cleaning station (30, 130, 230, 430) for receiving and delivering wafers to and from a wafer cassette (160, 260, 460), a transfer mechanism (16) for moving the wafers between the plurality of processing stations (14) and the cleaning station (30). The cleaning station (30, 130, 230, 430) may have an exterior door (32, 132, 232, 432), an exhaust (34, 134, 234, 434), an interior door (40, 140, 240, 440), a plurality of gas nozzles (166, 266, 466) for delivering a sweeping gas over the wafer cassette (160, 260, 460). A method for processing wafers and cleaning wafer cassettes (160, 260, 460) includes delivering a wafer cassette (160, 260, 460) to a first station (30, 130, 230, 430) of a work cell (12), cleaning the wafer cassette (160, 260, 460), and loading the cassette (160, 260, 460) with wafers, and the step of cleaning the wafer cassette may include the substeps of applying a pressurized stream of gas against at least one surface of the wafer cassette (160, 260, 460). The cleaning process can also be done with a loaded cassette (160, 260, 460) that is unloaded before cleaning.
A method for dry cleaning a wafer container such as a SMIF pod that is equipped with a bottom mounting plate covered with contaminating particles. In the method, the wafer containers are mounted in openings of the enclosure such that the bottom mounting plates with the contaminating particles are exposed to an air-tight cavity of the enclosure. A purge gas flow is then directed to the bottom of the plate to dislodge the contaminating particles which are then picked up by a vacuum conduit positioned juxtaposed to the purge gas conduit and connected to a factory vacuum source such that contaminating particles dislodged are immediately removed. The present invention novel method can be carried out without using wet bench cleaning while achieving desirable and efficient cleaning results.
An apparatus for handling, storing and reloading carriers for disk-shaped items, such as semiconductor wafers or CDs, has at least one cleaning unit and at least one storage unit for the carriers containing the disk-shaped items. The apparatus further has at least one sorting unit for the disk-shaped items. The cleaning unit, the storage unit and the sorting apparatus are integral component parts of the apparatus and are operated by a common automatic control.
A pod for storing and carrying substrates consists of a pod body and a cover. An inlet and an outlet are formed on one of the pod body and cover. The cover is tightly fitted to the pod body to close the inside of the pod body. A washing liquid is introduced into the pod through the inlet and is discharged from the pod through the outlet, thereby easily washing the inside of the pod with the pod itself serving as a washing tank. A washing cover has an inlet, an outlet, and a heater. The washing cover is attached to the pod body when washing the inside of the pod body. Further provided is a cleaning apparatus having pipes and a pump that are connected to the washing cover. The cleaning apparatus may have a table serving as the washing cover. The table is connected to pipes and a pump.
A rinsing lid for a wet bench cleaning chamber used in the rinsing of acids, chemicals and/or particles from semiconductor wafers. The rinsing lid includes a lid housing having an upper water reservoir for receiving a stream of deionized water or other cleaning liquid. A water distribution plate is provided in the lid housing beneath the water reservoir. Small water openings extend through the water distribution plate at the water inlet end, and large water openings extend through the water distribution plate at the opposite end, of the lid housing. A nozzle plate provides multiple nozzle openings in the lid housing beneath the water distribution plate. The large water openings at the end of the lid housing opposite the water inlet end compensate for diminishing water pressure along the length of the lid housing, providing water sprays of uniform force and volume.
A pod for storing and carrying substrates consists of a pod body and a cover. An inlet and an outlet are formed on one of the pod body and cover. The cover is tightly fitted to the pod body to close the inside of the pod body. A washing liquid is introduced into the pod through the inlet and is discharged from the pod through the outlet, thereby easily washing the inside of the pod with the pod itself serving as a washing tank. A washing cover has an inlet, an outlet, and a heater. The washing cover is attached to the pod body when washing the inside of the pod body. Further provided is a cleaning apparatus having pipes and a pump that are connected to the washing cover. The cleaning apparatus may have a table serving as the washing cover. The table is connected to pipes and a pump.
