Describes a stabilized trans-1,2-dichloroethylene composition having a low concentration of aliphatic aldehyde hydrazone, optionally in combination with an epoxide. The aliphatic aldehyde hydrazone was found to be more efficient than commercially used hydroquinone monomethylether (HQMME) in preventing the isomeric transformation of trans-1,2-dichloroethylene to cis-1,2-dichloroethylene during storage. Also described is a process for cleaning the surface of an article with the stabilized 1,2-dichloroethylene composition.
The present invention relates to the stabilization of trans-1,2-dichloroethylene (TDCE) for the purpose of its use in the treatment of solid surfaces.The stabilized solution comprises at least one acid acceptor, at least one radical scavenger, at least one Lewis base and at least one compound possessing a buffering effect.
Describes compositions of 1,2-dichloroethylene, particularly trans-1,2-dichloroethylene, stabilized with effective stabilizing amounts of a combination of (a) C3 to C12 alkylene oxide, e.g., butylene oxide, (b) alcohol chosen from aliphatic and cycloaliphatic alcohols having from 2 to 8 carbon atoms, e.g., isopropanol, and (c) a material chosen from (i) C1 to C5 alkoxyphenol, e.g., 4-methoxyphenol, (ii) free radical stabilizer having at least one 2,2,6,6-tetra(lower alkyl)-1-piperidinyloxy-yl group, and (iii) mixtures of (i) and (ii). Also describes use of such compositions for vapor degreasing of soiled articles, e.g., metal parts and soldered circuit boards.
Chemical solvating, degreasing, stripping and cleaning agents. The agents are cleaning and solvating mixtures of dichloroethylene and alkoxy-substituted perfluoro compounds that contain six carbon atoms, with optionally highly fluorinated materials to retard flammability and/or other enhancement agents that improve and enhance the properties of the composition to accomplish its desired cleaning or solvating task. These other agents are one or more of the following materials: alcohols, esters, ethers, cyclic ethers, ketones, alkanes, aromatics, amines, siloxanes terpenes, dibasic esters, glycol ethers, pyrollidones, or low- or non-ozone depleting halogenated hydrocarbons. These mixtures are useful in a variety of solvating, vapor degreasing, photoresist stripping, adhesive removal, aerosol, cold cleaning, and solvent cleaning applications including defluxing, dry-cleaning, degreasing, particle removal, metal and textile cleaning.
Chemical solvating, degreasing, stripping and cleaning agents. The agents are cleaning and solvating mixtures of dichloroethylene and alkoxy-substituted perfluoro compounds that contain six carbon atoms, with optionally highly fluorinated materials to retard flammability and/or other enhancement agents that improve and enhance the properties of the composition to accomplish its desired cleaning or solvating task. These other agents are one or more of the following materials: alcohols, esters, ethers, cyclic ethers, ketones, alkanes, aromatics, amines, siloxanes terpenes, dibasic esters, glycol ethers, pyrollidones, or low- or non-ozone depleting halogenated hydrocarbons. These mixtures are useful in a variety of solvating, vapor degreasing, photoresist stripping, adhesive removal, aerosol, cold cleaning, and solvent cleaning applications including defluxing, dry-cleaning, degreasing, particle removal, metal and textile cleaning.
