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Selective etching of thin films    
United States Patent6306313   
Link to this pagehttp://www.wikipatents.com/6306313.html
Inventor(s)Fetter; Linus Albert (Morganville, NJ); Pastalan; John Z. (Hampton, NJ)
AbstractThe invention removes a portion(s) of a material of interest, while leaving an adjacent or underlying electrode(s) intact. The material is exposed to a plasma containing at least two-halogen-containing gases. At least a portion of the material, for example a piezoelectric material, an oxygen-containing material, or a nitrogen-containing material, is etched by the plasma. By removing desired portions of this material, the device can have alternative or complex architecture. In addition, the propagation of shear waves is limited in the device.



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Drawing from US Patent 6306313
Selective etching of thin films - US Patent 6306313 Drawing
Selective etching of thin films
Inventor     Fetter; Linus Albert (Morganville, NJ); Pastalan; John Z. (Hampton, NJ)
Owner/Assignee     Agere Systems Guardian Corp. (Allentown, PA)
Patent assignment
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Publication Date     October 23, 2001
Application Number     09/497,982
PAIR File History     Application Data   Transaction History
Image File Wrapper   Patent Term   Fees
Litigation
Filing Date     February 4, 2000
US Classification     216/67 216/77 438/734
Int'l Classification     B44C 001/22 H01L 021/00
Examiner     Stinson; Frankie L.
Assistant Examiner     Ahmed; Shamim
Attorney/Law Firm     Brown & Michaels, PC
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Priority Data    
USPTO Field of Search     216/67 216/77 438/734 252/79.1
Patent Tags     selective etching thin films
   
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Market Size
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Market Share
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5 - 9.99%