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Method of controlling vapor deposition substrate temperature
   
Document Number
US Patent 6319569
Issued Date
November 20, 2001
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Abstract
Coating temperature during vapor deposition of a ceramic coating on a substrate in a coating box or enclosure is maintained by means of a heat release cover or lid on the coating enclosure and movable in response to temperature in the coating enclosure exceeding a predetermined value so as to release excess heat from the enclosure to maintain coating temperature within an appropriate range.
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Method of controlling vapor deposition substrate temperature - US Patent 6319569 Drawing
Drawing from US Patent 6319569
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Number of Claims:
4
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Owner
Published
November 20, 2001
Application Number
09/201,648
Filed
November 30, 1998
US Classification
427/585   118/723EB 118/723FE 118/724 427/248.1 427/596
Int'l Classification
C23C   14/54   (20060101)  
Examiner
USPTO Field of Search
118/715   118/724   118/725   118/723R   118/723EB   118/723FE   427/248.1   427/585   427/596   438/714   156/345  
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