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Trap device and trap system
   
Document Number
US Patent 6368371
Issued Date
April 9, 2002
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Abstract
The present invention provides a trap apparatus which is capable of increasing the trapping efficiency while fulfilling a conductance allowed by a vacuum chamber in a depositing process or the like, for thereby increasing the service life of a vacuum pump and protecting a toxic substance removing device for increased operation reliability, and reducing equipment and running costs. The trap apparatus has a trap unit (18) disposed in a discharge passage (14) for discharging therethrough a gas from a vacuum chamber (10) with a vacuum pump (12) for trapping and removing a product in a discharged gas. The trap unit (18) has trap passages comprising an upstream passage portion (44) spreading outwardly from the center and a downstream passage portion (42) directed inwardly toward the center.
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Number of Claims:
4
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Owner
Published
April 9, 2002
Application Number
09/485,616
Filed
February 14, 2000
US Classification
55/309   55/440
Int'l Classification
B01D   45/00   (20060101)   B01D   45/08   (20060101)   F04B   37/00   (20060101)   F04B   37/16   (20060101)  
Priority Data
Jan 22, 1998 [JP] 10-025041 Feb 16, 1998 [JP] 10-050194
USPTO Field of Search
55/309   55/434.2   55/440   55/DIG.15   62/55.5  
Related Patents
6763700 - Trap apparatus - Owned by Ebara Corporation (Tokyo,JP)

A continuous processing trap apparatus is capable of increasing the trapping efficiency while maintaining conductance required by a vacuum chamber. The trap apparatus includes an exhaust passage for evacuating a hermetically sealed chamber by a vacuum pump, a hermetically sealed trapping and regenerating casing extending across the exhaust passage and a regenerating passage adjacent to the exhaust passage, and a trap unit movably housed in the trapping and regenerating casing for selective movement between a trapping position connected to the exhaust passage and a regenerating position connected to the regenerating passage. The trap apparatus further includes valve bodies disposed one on each side of the trap unit and supporting seals on outer circumferential surfaces thereof for sealing the exhaust passage and the regenerating passage from each other, and a monitoring mechanism for monitoring whether the seals are functioning normally.

7217306 - Trap apparatus - Owned by Ebara Corporation (Tokyo,JP)

A continuous processing trap apparatus is capable of increasing the trapping efficiency while maintaining conductance required by a vacuum chamber. The trap apparatus includes an exhaust passage for evacuating a hermetically sealed chamber by a vacuum pump, a hermetically sealed trapping and regenerating casing extending across the exhaust passage and a regenerating passage adjacent to the exhaust passage, and a trap unit movably housed in the trapping and regenerating casing for selective movement between a trapping position connected to the exhaust passage and a regenerating position connected to the regenerating passage. The trap apparatus further includes valve bodies disposed one on each side of the trap unit and supporting seals on outer circumferential surfaces thereof for sealing the exhaust passage and the regenerating passage from each other, and a monitoring mechanism for monitoring whether the seals are functioning normally.

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Description
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