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Procedure and device for calibrating the gas pressure in a process vacuum chamber (receiver)
   
Document Number
US Patent 6408254
Issued Date
June 18, 2002
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Abstract
A system for treating goods, in particular for coating optical substrates, under a vacuum, within a gas-tight sealable, evacuatable vacuum chamber (receiver) that can be provided with an inert gas atmosphere, includes a device for calibrating the gas pressure in the receiver for a respective operating cycle. The calibrating device has a calibration pressure vessel (2) having a volume (v) lower than the volume (V) of the receiver (1) and is connected in terms of flow with an inert gas source and the receiver (1) via actuatable valve fittings (3, 4), wherein the receiver (1) and calibration pressure vessel (2) are each linked via a pressure gage (5 or 6) with a computer (7), which controls the valve fittings (3, 4) for introducing the gas into the calibration pressure vessel (2) or receiver (1) by way of a downstream controller (8). The measures of the calibration device make it possible to calibrate the gas pressures in a gas-tight sealable, evacuatable vacuum chamber (receiver) that can be provided with an inert gas atmosphere, in such a way as to repeatedly ensure a preset, constant gas concentration in the receiver within an operating or treatment cycle.
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Procedure and device for calibrating the gas pressure in a process vacuum chamber (receiver) - US Patent 6408254 Drawing
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Number of Claims:
4
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Published
June 18, 2002
Application Number
09/353,450
Filed
July 14, 1999
US Classification
702/98   702/138 702/85 702/99
Int'l Classification
C23C   14/54   (20060101)   C23C   16/52   (20060101)   G01L   27/00   (20060101)  
Examiner
Assistant Examiner
Priority Data
Jul 14, 1998 [CH] 1507/98
USPTO Field of Search
356/43   73/19.12   73/4   73/1   73/753   73/19   250/343   250/306   324/462   702/98   702/99   702/138   702/85  
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