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Method of making lithographic contact springs
 
   
Document Number
US Patent 6616966
Issued Date
September 9, 2003
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Abstract
A method of forming an interconnection, including a spring contact element, by lithographic techniques. In one embodiment, the method includes applying a masking material over a first portion of a substrate, the masking material having an opening which will define a first portion of a spring structure, depositing a structure material (e.g., conductive material) in the opening, and overfilling the opening with the structure material, removing a portion of the structure material, and removing a first portion of the masking material. In this embodiment, at least a portion of the first portion of the spring structure is freed of masking material. In one aspect of the invention, the method includes planarizing the masking material layer and structure material to remove a portion of the structure material. In another aspect, the spring structure formed includes one of a post portion, a beam portion, and a tip structure portion.
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Number of Claims:
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Owner
FormFactor, Inc. (Livermore, CA)
Published
September 9, 2003
Application Number
09/795,024
Filed
February 26, 2001
US Classification
29/842   205/125 427/272 427/282 427/307 427/96.8 427/97.4 430/312 430/314 430/315 430/316
Int'l Classification
G01R   1/067   (20060101)   G01R   3/00   (20060101)   H05K   3/40   (20060101)   H05K   3/32   (20060101)  
Examiner
Parent Case
This application is a divisional application of U.S. patent application Ser. No. 09/205,022, filed Dec. 2, 1998 now U.S. Pat. No. 6,268,015.
USPTO Field of Search
427/96   427/272   427/282   427/307   29/842  
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Description
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