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Positive photoresist transfer material and method for processing surface of substrate using the transfer material
   
Document Number
US Patent 6881529
Issued Date
April 19, 2005
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Abstract
A positive photoresist transfer material, wherein an alkali-soluble thermoplastic resin layer, an intermediate layer and a positive photoresist layer are successively applied on an adhesive surface of a temporary support, and adhesion between the positive photoresist layer and the intermediate layer is less than adhesion between other layers or surfaces.
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Number of Claims:
20
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Published
April 19, 2005
Application Number
10/143,567
Filed
May 13, 2002
US Classification
430/166   430/258 430/262 430/263
Int'l Classification
G03C   1/805   (20060101)   G03F   7/09   (20060101)   G03F   7/023   (20060101)   G03F   7/032   (20060101)   H01L   21/027   (20060101)   H05K   3/00   (20060101)   H05K   3/06   (20060101)   G03F   7/40   (20060101)   G03F   7/30   (20060101)   G03F   7/11   (20060101)   G03F   7/004   (20060101)   G03F   7/022   (20060101)   H01L   21/02   (20060101)   H01L   21/306   (20060101)   H01L   21/3065   (20060101)  
Examiner
Attorney/Law Firm
Priority Data
May 14, 2001 [JP] 2001-143850
USPTO Field of Search
430/166   430/258   430/262   430/263  
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