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Method and composition for removing sodium-containing material from microcircuit substrates
   
Document Number
US Patent 6899818
Issued Date
May 31, 2005
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Abstract
A method and composition for removing sodium-containing materials such as photoresist from microcircuit substrate material utilizes 1,2-Diaminocyclohexanetetracarboxylic Acid in an organic solvent.
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Number of Claims:
14
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Owner
Mallinckrodt Inc. (St. Louis, MO)
Published
May 31, 2005
Application Number
10/220,720
Filed
September 4, 2002
US Classification
216/83   216/106 216/91 252/79.1 252/79.4 257/E21.228
Int'l Classification
G03F   7/42   (20060101)  
Examiner
Assistant Examiner
Parent Case
This application claims the benefit of Provisional Application No. 60/190,071, filed on Mar. 20, 2000.
USPTO Field of Search
216/83   216/91   216/106   252/79.1   252/79.4  
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