Disclosed are methods of preparing monoalkyl Group VA metal dihalide compounds in high yield and high purity by the reaction of a Group VA metal trihalide with an organo lithium reagent or a compound of the formula R.sub.n M.sup.1 X.sub.3-n, where R is an alkyl, M.sup.1 is a Group IIIA metal, X is a halogen and n is an integer fro 1 to 3. Such monoalkyl Group VA metal dihalide compounds are substantially free of oxygenated impurities, ethereal solvents and metallic impurities. Monoalkyl Group VA metal dihydride compounds can be easily produced in high yield and high purity by reducing such monoalkyl Group VA metal dihalide compounds.
This application is a Continuation-in-Part of Non-Provisional application Ser. No. 10/303,434, filed Nov. 23, 2002 which application claims the benefit of Provisional Application Serial No. 60/355,124 filed Feb. 8, 2002 and a Continuation-in-Part of Non-Provisional application Ser. No. 10/284,894, filed Oct. 31, 2002 which application claims the benefit of Provisional Application Serial No. 60/349,725, filed Jan. 17, 2002.
