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Scatterometry to simultaneously measure critical dimensions and film properties
   
Document Number
US Patent 6982791
Issued Date
January 3, 2006
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Inventors
Opsal; Jon (Livermore, CA)
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Abstract
An ellipsometer includes a light source for generating a probe beam of polychromatic light for interacting with a sample. A polarizer is used to impart a known polarization state to the probe beam and the polarized probe beam is directed against the sample at a shallow angle of incidence. A rotating compensator is used to impart phase retardations to the polarization state of the reflected probe beam. After passing through the compensator, the probe beam passes through a second polarizer (analyzer). After leaving the analyzer, the probe beam is received by a detector. The detector translates the received probe beam into a signal that includes DC, 2.omega. and 4.omega. signal components (where .omega. is the angular velocity of the rotating compensator). A processor analyzes the signal using the DC, 2.omega. and 4.omega. components allowing simultaneous evaluation of both critical dimensions and film parameters.
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Number of Claims:
19
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Owner
Therma-Wave, Inc. (Fremont, CA)
Published
January 3, 2006
Application Number
10/319,189
Filed
December 13, 2002
US Classification
356/369  
Int'l Classification
G01J   4/00   (20060101)  
Attorney/Law Firm
Parent Case
PRIORITY CLAIM The present application claims priority to U.S. Provisional Patent Application Ser. No. 60/346,265, filed Dec. 19, 2001, the disclosure of which is incorporated herein by reference.
USPTO Field of Search
356/369   356/364   250/225  
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Claims
Description
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