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Liquid-jet/liquid droplet initiated plasma discharge for generating useful plasma radiation
   
Document Number
US Patent 6998785
Issued Date
February 14, 2006
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Abstract
Plasma discharge sources for generating emissions in the VUV, EUV and X-ray spectral regions. Embodiments can include running a current through liquid jet streams within space to initiate plasma discharges. Additional embodiments can include liquid droplets within the space to initiate plasma discharges. One embodiment can form a substantially cylindrical plasma sheath. Another embodiment can form a substantially conical plasma sheath. Another embodiment can form bright spherical light emission from a cross-over of linear expanding plasmas. All the embodiments can generate light emitting plasmas within a space by applying voltage to electrodes adjacent to the space. All the radiative emissions are characteristic of the materials comprising the liquid jet streams or liquid droplets.
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Number of Claims:
20
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Published
February 14, 2006
Application Number
10/194,387
Filed
July 12, 2002
US Classification
315/111.71   118/723MP 250/504R 313/231.31 313/231.61 315/111.01 378/119
Int'l Classification
H01J   7/24   (20060101)   H05B   31/26   (20060101)  
Examiner
Assistant Examiner
Parent Case
This invention relates to discharge sources, and in particular to methods and apparatus for using liquid jet streams or liquid droplets within spaces to form plasma discharge for generating debris free and debris reduced emissions in the VUV, EUV, and X-ray spectral regions, and this invention claims the benefit of priority to U.S. Provisional Application Ser. No. 60/305,334 filed Jul. 13, 2001, by the same inventors and assignee as the subject invention.
USPTO Field of Search
378/34   378/119   378/122   378/143   250/504R   250/493.1   313/231.31   313/231.61   313/231.01   313/231.41   313/231.51   315/111.21   315/111.71   315/111.01   315/111.41   315/111.81   118/723MP  
Related Patents
7518300 - Method and device for the generation of a plasma through electric discharge in a discharge space - Owned by Koninklijke Philips Electronics N.V. (Eindhoven,NL)

The invention relates to a method and a device for the generation of a plasma through electric discharge in a discharge space which contains at least two electrodes, at least one of which is constructed from a matrix material or carrier material, such that an erosion-susceptible region with an evaporation spot is formed at least by the current flow. To present a method or a device for the generation of a plasma by electric discharge, it is suggested that a sacrificial substrate (38) is provided at least at the evaporation spot, the boiling point of said sacrificial suvstrate (38) during discharge operation lying below the melting point of the carrier material (30), such that charge carriers arising in the current flow are mainly generated from the sacrificial substrate (38).

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Description
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