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Particle measurement configuration and semiconductor wafer processing device with such a configuration
   
Document Number
US Patent 7000454
Issued Date
February 21, 2006
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Abstract
A particle measurement configuration measures the particle concentration in a liquid or gaseous medium by way of a particle measuring instrument. In order to avoid erroneous measurements or damage to the particle measuring instrument, a measuring cell is provided which measures temperature or pressure or pH of the medium. A system controller shuts off a valve if threshold values are exceeded and it prevents the particle measuring instrument from being operated outside a predefined specification.
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Number of Claims:
15
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Published
February 21, 2006
Application Number
10/233,878
Filed
September 3, 2002
US Classification
73/31.03  
Int'l Classification
G01N   19/00   (20060101)  
Examiner
Assistant Examiner
Priority Data
Sep 03, 2001 [DE] 101 43 075
USPTO Field of Search
73/31.02   73/31.07   73/61.41   156/345.15   118/665   118/688   118/689  
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