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Vapor deposition of solid oligomers
   
Document Number
US Patent 7005161
Issued Date
February 28, 2006
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Abstract
A monomer is selected to produce a polymeric film having desirable characteristics for a particular application. The monomer is ppolymerized under controlled conditions to produce a solid oligomer having those characteristics at a molecular weight suitable for evaporation under vacuum at a temperature lower than its thermal decomposition temperature. The process of polymerization to produce the oligomer is carried out under conditions that yield a finite molecular-chain length with no residual reactive groups. The solid oligomer so produced is extruded as a film onto a revolving drum (38) in the evaporation section (40) of a vapor deposition chamber, and then cryocondensed on a cold substrate (44) to form a solid film having the same characteristic selected in the solid oligomer constituting the starting material. As a result of the initial complete reaction to produce the oligomer, the thin-film product does not contain unreacted groups and all attendant disadvantages are avoided.
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Number of Claims:
6
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Published
February 28, 2006
Application Number
10/475,923
Filed
June 22, 2001
US Classification
427/255.6   118/715 118/730 425/378.1 427/294 427/398.1 427/398.2
Int'l Classification
C23C   14/24   (20060101)  
Examiner
Parent Case
RELATED APPLICATIONS This is a continuation-in-part application of U.S. Ser. No. 09/346,877, filed Jul. 2, 1999 U.S. Pat. No. 6,270,841.
USPTO Field of Search
427/255.6   427/294   427/398.1   427/398.2   118/715   118/729   118/730   425/378.1  
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