The present invention generally provides a method and apparatus for use in a physical vapor deposition chamber. In one embodiment, invention provides a shutter disk mechanism that eliminates the need for axially orientating a shutter disk to a robot blade that transfers the shutter disk to a substrate support.
CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a continuation-in-part of U.S. patent application Ser. No. 10/082,480, filed Feb. 20, 2002, and issued as U.S. Pat. No. 6,669,829 on Dec. 30, 2003, which is hereby incorporated by reference in its entirety.
