or
Bookmark and Share
Magnetic cell and magnetic memory
   
Document Number
US Patent 7042758
Issued Date
May 9, 2006
Link
Inventors
Haneda; Shigeru (Kanagawa-Ken,JP)
Nakamura; Shiho (Kanagawa-Ken,JP)
Oosawa; Yuuichi (Kanagawa-Ken,JP)
Map
Abstract
It is possible to provide a magnetic cell having a high developing rate of MR characteristics and a reduced fluctuation without causing element falling-down and a magnetic memory having the same. A magnetic cell includes: a lower electrode; an electrically conductive pillar formed on the lower electrode; a magnetoresistance effect film having at least two ferromagnetic layers formed on the electrically conductive pillar and an intermediate layer provided between the ferromagnetic layers; an upper electrode formed on the magnetoresistance effect film; a support layer formed from at least one metal directly on a side face of the electrically conductive pillar or via an insulating layer; and a current diffusion preventing layer provided between the support layer and the lower electrode, wherein a height of the electrically conductive pillar, a thickness of the current diffusion preventing layer, and a thickness of the support layer satisfy relationships of >>.times. ##EQU00001## where h represents the height of the electrically conductive pillar, t1 represents the thickness of the current diffusion preventing layer, t2 represents the thickness of the support layer, and L (nm) represents a length of a short side of the electrically conductive pillar.
Tags:
Description:
Amusing 0%
Clever 0%
Complex 0%
Efficient 0%
Historic 0%
Important 0%
Innovative 0%
Interesting 0%
Practical 0%
Simple 0%
Number of Claims:
20
Comments:
no comments yet
Owner
Published
May 9, 2006
Application Number
10/943,835
Filed
September 20, 2004
US Classification
365/158   365/171
Int'l Classification
G11C   7/00   (20060101)  
Examiner
Priority Data
Sep 29, 2003 [JP] 2003-338099
USPTO Field of Search
365/158   365/171   365/145  
Related Patents
7494724 - Magnetoresistance effect element, its manufacturing method, magnetic reproducing element and magnetic memory - Owned by Kabushiki Kaisha Toshiba (Tokyo,JP)

A method of manufacturing a magnetoresistance effect element includes forming an insulating layer on a first ferromagnetic layer, forming an aperture reaching the first ferromagnetic layer by thrusting a needle from the top surface of the insulating layer, and depositing a ferromagnetic material to form a second ferromagnetic layer overlying the insulating layer which buries the aperture. The aperture can have an opening width not larger than 20 nm. A current flowing between the first ferromagnetic layer and the needle can be monitored, and thrusting of the needle an be interrupted when the current reaches a predetermined value.

Claims
Description
About| FAQs| Terms & Disclaimer| Link to Us| Contact Us